NL2024767A - Object positioner device, stage support, lithographic apparatus, object inspection apparatus, method for adapting an object positioner device, device manufacturing method - Google Patents

Object positioner device, stage support, lithographic apparatus, object inspection apparatus, method for adapting an object positioner device, device manufacturing method Download PDF

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Publication number
NL2024767A
NL2024767A NL2024767A NL2024767A NL2024767A NL 2024767 A NL2024767 A NL 2024767A NL 2024767 A NL2024767 A NL 2024767A NL 2024767 A NL2024767 A NL 2024767A NL 2024767 A NL2024767 A NL 2024767A
Authority
NL
Netherlands
Prior art keywords
stage
support
base frame
positioning plane
stage support
Prior art date
Application number
NL2024767A
Other languages
English (en)
Dutch (nl)
Inventor
Scholts Marcel
Ruben Boeije Joshua
Hubertus Antonius Van De Rijdt Johannes
Hendrik Everhardus Aldegonda Muijderman Johannes
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2024767A publication Critical patent/NL2024767A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
NL2024767A 2019-03-01 2020-01-28 Object positioner device, stage support, lithographic apparatus, object inspection apparatus, method for adapting an object positioner device, device manufacturing method NL2024767A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP19160192 2019-03-01

Publications (1)

Publication Number Publication Date
NL2024767A true NL2024767A (en) 2020-09-04

Family

ID=65657321

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2024767A NL2024767A (en) 2019-03-01 2020-01-28 Object positioner device, stage support, lithographic apparatus, object inspection apparatus, method for adapting an object positioner device, device manufacturing method

Country Status (3)

Country Link
CN (1) CN113544587A (fr)
NL (1) NL2024767A (fr)
WO (1) WO2020177949A1 (fr)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6020964A (en) 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
SG2010050110A (en) 2002-11-12 2014-06-27 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7292317B2 (en) * 2005-06-08 2007-11-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing substrate stage compensating
DE102005043569A1 (de) 2005-09-12 2007-03-22 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
JP4485550B2 (ja) * 2007-07-30 2010-06-23 住友重機械工業株式会社 反力処理装置
US10209634B2 (en) * 2015-03-03 2019-02-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2018296A (en) * 2016-03-03 2017-09-07 Asml Netherlands Bv Vibration isolator, lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
WO2020177949A1 (fr) 2020-09-10
CN113544587A (zh) 2021-10-22

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