NL2018184A - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method Download PDF

Info

Publication number
NL2018184A
NL2018184A NL2018184A NL2018184A NL2018184A NL 2018184 A NL2018184 A NL 2018184A NL 2018184 A NL2018184 A NL 2018184A NL 2018184 A NL2018184 A NL 2018184A NL 2018184 A NL2018184 A NL 2018184A
Authority
NL
Netherlands
Prior art keywords
substrate
detector
grating
projection
actuator
Prior art date
Application number
NL2018184A
Other languages
English (en)
Dutch (nl)
Inventor
Richard Pongers Willem
Petrus Reijnders Marinus
Antonius Andreas Teunissen Paulus
Andreas Wilhelmus Hubertus Knarren Bastiaan
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2018184A publication Critical patent/NL2018184A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G01B11/254—Projection of a pattern, viewing through a pattern, e.g. moiré

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2018184A 2016-03-07 2017-01-17 Lithographic apparatus and device manufacturing method NL2018184A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP16159030 2016-03-07

Publications (1)

Publication Number Publication Date
NL2018184A true NL2018184A (en) 2017-09-12

Family

ID=55484930

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2018184A NL2018184A (en) 2016-03-07 2017-01-17 Lithographic apparatus and device manufacturing method

Country Status (3)

Country Link
NL (1) NL2018184A (zh)
TW (1) TWI627512B (zh)
WO (1) WO2017153069A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7060695B2 (ja) 2018-01-17 2022-04-26 エーエスエムエル ネザーランズ ビー．ブイ． スキャン信号の特徴診断
CN109341554B (zh) * 2018-12-24 2020-09-04 上海集成电路研发中心有限公司 一种测量膜厚的装置及方法
JP7180745B2 (ja) * 2019-02-21 2022-11-30 株式会社ニコン 面位置検出装置、露光装置、基板処理システム、およびデバイス製造方法
TWI724642B (zh) * 2019-11-20 2021-04-11 墨子光電有限公司 微製像設備及其加工方法
WO2023160972A1 (en) * 2022-02-28 2023-08-31 Asml Netherlands B.V. Height measurement sensor

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100972640B1 (ko) * 2008-05-07 2010-07-30 선문대학교 산학협력단 모아레를 이용한 3차원 측정장치의 기준격자 획득방법 및장치
US20100231881A1 (en) 2009-03-13 2010-09-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2013036076A2 (ko) * 2011-09-09 2013-03-14 주식회사 인스펙토 투영격자의 진폭을 적용한 3차원 형상 측정장치 및 방법
US9228827B2 (en) * 2013-06-10 2016-01-05 Taiwan Semiconductor Manufacturing Co., Ltd. Flexible wafer leveling design for various orientation of line/trench

Also Published As

Publication number Publication date
TWI627512B (zh) 2018-06-21
WO2017153069A1 (en) 2017-09-14
TW201734666A (zh) 2017-10-01

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