NL2017268B1 - Three dimensional thermoacoustic device composed of nanoporous material and the method to fabricate such a device - Google Patents

Three dimensional thermoacoustic device composed of nanoporous material and the method to fabricate such a device Download PDF

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NL2017268B1
NL2017268B1 NL2017268A NL2017268A NL2017268B1 NL 2017268 B1 NL2017268 B1 NL 2017268B1 NL 2017268 A NL2017268 A NL 2017268A NL 2017268 A NL2017268 A NL 2017268A NL 2017268 B1 NL2017268 B1 NL 2017268B1
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layer
nanoporous material
providing
dielectric layer
electrical
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NL2017268A
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Yi Hengqian
Hermannus Poelma Regnerus
Wilhelminus Van Zeijl Hendrikus
qi zhang Guo
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Univ Delft Tech
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Priority to PCT/NL2017/050506 priority patent/WO2018026267A1/en
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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R23/00Transducers other than those covered by groups H04R9/00 - H04R21/00
    • H04R23/002Transducers other than those covered by groups H04R9/00 - H04R21/00 using electrothermic-effect transducer

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Acoustics & Sound (AREA)
  • Signal Processing (AREA)
  • Micromachines (AREA)
  • Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)

Abstract

The present invention is in the field of a three dimensional thermoacoustic device composed of nanoporous material and the method to fabricate such a device, as well specific uses of said device, which device may have an improved sound 5 pressure level (SPL), a flat frequency response, and a high thermoacoustic efficiency.

Description

Title Three dimensional thermoacoustic device composed of na-noporous material and the method to fabricate such a device
FIELD OF THE INVENTION
The present invention is in the field of a three dimensional thermoacoustic device composed of nanoporous material and the method to fabricate such a device.
BACKGROUND OF THE INVENTION
In a historical perspective for sound producing devices horns occupied the audio market for more than 40 years until a good performance standard electrodynamic loudspeaker was first built in the 1920's. In a next generation electrostatic loudspeakers were invented in the 1960's, which had a better sound performance. More recent a so-called distributed mode loudspeaker is designed in 1990's. Figure 1 shows this historical development of commercial speakers. Details of this figure can be found on the internet, such as edisontechcenter, audioholics, and upv.es. Electrodynamic loudspeakers are widely used nowadays in various audio systems, sound boxes and headphones, and, after replacing the horns, have ruled the market for more than 90 years. Other types of design, such as electrostatic loudspeakers, flat panel electrostatic loudspeakers, and distributed mode loudspeakers (DML) joined the market afterwards, but never surpassed the electrodynamic speakers in terms of numbers. Over all these years improvements were only made in terms of design for these electrodynamic loudspeakers, and not in terms of physics behind the speakers. An electrodynamic speaker still consists of a movable diaphragm and a magnet coil assembly which is driven by an electric source to create vibrations/expansions in the air which are perceived as sound by the human ear.
In an alternative approach in 1917, a first thermoacoustic device to serve as a loudspeaker was designed by H. D. Arnold and B. Crandall. The thermo-phone, as they called it, was formed mainly by a 0.7 ym thin platinum strip and was driven by an alternating electric current. Later a combination of thermoacoustic sound emission with micro-fabrication and a novel porous silicon material was made. Varieties of thermoacoustic loudspeaker designs emerged after 2008, including de signs with Al suspended wires, Au nanowires, silver meshes, graphene, reduced graphene oxide(RGO), etc.
Comparing with conventional electrodynamic loudspeakers a use of the thermoacoustic effect for sound generation has clear advantages. It is noted that inside a thermoacoustic sound source there is no moving diaphragm. Diaphragms are typically considered to be fragile, so in contrast a thermoacoustic device would have an improved robustness. For the thermoacoustic device the sound wave is not produced by mechanical movement, no voice coil nor magnet is needed for that purpose. Thus thermoacoustic loudspeakers and the like have a simple structure, can be free of a magnet, require no assembly after fabrication, and production processes thereof are in principle at least to some extent compatible with semiconductor processes. Recent development of micro-fabrication and materials have sparkled a renewed interest in the thermoacoustic loudspeaker.
Prior art thermoacoustic designs focus on employing planar thin film heaters, in which the electrical current is parallel to a substrate thereof. As a consequence of the planar design 50% of the air expansion is directed towards substrate which is considered to limit the thermoacoustic performance e.g. in terms of efficiency reflected in emission of sound/pressure waves. A schematic of a planar 2D heater is shown in Figure 3A. Examples of such devices can be found in Wei, et al. in "Ice-Assisted Transfer of Carbon Nanotube Arrays.", Nano Letters, 2015. 15(3): p. 1843-1848, Xiao, et al. in Nano Lett., 2008. 8(12): p. 4539, and Xiao, et al. in "High frequency response of carbon nanotube thin film speaker in gases.", J. Applied Physics, 2011. 110(8): p. 084311.
The frequency response of these 2D planar thin film heating designs is insufficient at low frequencies and excessive at high frequencies, which is found to degrade the fidelity of sound. Moreover, the prior art of thermoacoustic devices require fabrication approaches that are not compatible with standard cleanroom fabrication technology. For example, the fabrication of CNT thin film or thin yarn requires spinning of the CNT fibers, assembly and transfer steps, which steps are not compatible with automated cleanroom fabrication steps and not scalable for mass production. In addition the prior art metal film based thermoacoustic sound sources have a low sound pressure level (SPL). Also all existing CNT, metal film and wire designs are fragile and occupy a large chip area.
The present invention relates to a thermoacoustic device composed of nanoporous material and a method to fabricate such a device, which overcomes one or more of the above disadvantages, without jeopardizing functionality and advantages.
SUMMARY OF THE INVENTION
The present invention relates in a first aspect to a method of producing a three dimensional thermoacoustic device 100 according to claim 1. The present method is found to be compatible with mass production processes; a production capacity of 148 devices per 4 inch wafer was already achieved. The present device is improved e.g. in terms of a more efficient exchange of heat with ambient air due to the use of vertically aligned nanoporous material, which provides a large surface area to volume ratio; the term "vertically" in this respect relates to (in a vertical direction) aligned nanoporous material which at least partially extends in a vertical direction, such as from 10-170 degrees with respect to a (surface of the) substrate (slightly upwards), and preferably from 20-160 degrees, more preferably from 30-150 degrees, even more preferably from 45-135 degrees, such as from 50-130 degrees or from 60-120 degrees, and typically from 70-110 degrees, such as from 80-100 degrees, such as 90 degrees (perpendicular to the substrate and hence fully vertical); an ability to lithographically pattern the nanoporous material in 3D microstructures providing a tremendous design freedom; a control of a direction of the pressure wave using different geometrical designs or using integrated speaker arrays is possible; the speaker arrays are capable of operating separately, sequentially, in phase-shift mode, in parallel mode, in frequency scan mode, in spatial scan mode, in spatial distribution mode, in intensity mode, in pulsed mode, variations thereof, and combinations thereof. In addition it is also possible to use at least one frequency, such as harmonic frequencies; a flat frequency response in the range of 1kHz to 20kHz is produced, which is now considered possible due to an absence of mechanical moving components which suffer from (mechanical) resonance modes; it provides better sound fidelity as compared to existing speakers; a more equalized frequency response over the range of 1kHz to 20kHz which is considered due to the 3D microstructure and high surface area to volume ratio; a scalable and suitable method for mass production is provided.
In the method a substrate 10 is provided, such as made of a (semi-) conducting metal, glass, a ceramics, preferably Si, such as in the form of a wafer. On the substrate a first dielectric layer 21 is applies, such as by deposition, , such as a thermal oxide layer, a LPCVD layer, or a PECVD layer; the dielectric layer provides thermal isolation and electrical isolation; a typical thickness of the layer 21 is 0.1-5 ym, preferably 0.2-3 ym, more preferably 0.5-2 ym, such as 1.0-1.53 ym; the layer is thick enough to provide thermal and electrical isolation, but need not be too thick.
On the dielectric layer at least one bottom conducting layer 31 is applies, such as by deposition,; in view of further process steps, such as formation of the nanoporous material, the bottom conducting layer is made of material with a high enough melt temperature, such as above 700 K (427 °C), preferably above 750 K (477 °C), such as above 800 K (527 °C). Suitable materials are Ti, W, Cu, Au, preferably Ti and Cu, whereas A1 is considered less suited in view of its melting point. Some materials are provided with a protective layer (e.g. 82) in view of e.g. further etching (see e.g. fig. 5a). Optionally a sealing layer 84 is provided on the top conducting layer, e.g. to protect the layer in view of patterning and especially in view of etching, such as a 0.05 ym to lym SiC layer by PECVD (see fig. 5a). The conducting layer may be deposited using PVD, PECVD, sputtering, and the like; a typical thickness of the layer 31 is 0.1-5 ym, preferably 0.2-3 ym, more preferably 0.5-2 ym, such as 1.0-1.5 ym; the layer is thick enough to provide good electrical conductance, but need not be too thick, on the bottom conducting layer a second dielectric layer 22 is applies, such as by deposition,, such as a TetraEthyl OrthoSilicate (Si(OC2H5)4) (TEOS) layer; this second dielectric layer functions partly as a sacrificial layer as most of it is removed such as etched away in further process steps; the second dielectric layer 22 may be provided by spinning or PECVD; the layer 22 is relatively thick, such as 1-50 ym, preferably 2-30 ym, more preferably 5-20 ym, such as 10-15 ym; the thickness of the layer is considered to depend largely on the nanostructures provided in later process steps. The dielectric layer is then provided with at least one receiving space; thereto a lithographic step, such as an I-line step, if performed, in order to provided well defined microscopic/nano-scopic receiving spaces; these receiving spaces typically have a well-defined geometry, e.g. in view of a height and cross-section thereof; the second dielectric layer is etched through towards the bottom contact layer; for etching a dry etch process may be used; an example of such a dry etch process is DRIE. In the at least one receiving space vertically aligned electrically conductive nanoporous material 41 is provided; in view of further process steps the material is nanoporous, i.e. has at least some porosity wherein porous volumes are in the microscopic and/or nanoscopic scale; the porous volume is typically from 10-98% of the total volume of the receiving space, preferably 20-95%, more preferably 30-90%, such as 50-75%; more importantly, the present method provides accurate control of the porosity of the porous material, such as by providing thin film (nanoscale) conformal coatings, such as by ALD and LPCVD. In view of the thermoacoustic properties of the device the present nanoporous material is also electrically conductive as well as thermally conductive; as special feature is that the nanoporous material is aligned in a vertical direction, i.e. typically perpendicular to the substrate; the nanoporous material is grown in electrical/thermal contact with the bottom conducting layer; in an example the nanoporous material relates to carbon nanotubes which may be grown using an Fe-catalyst, and typically at a temperature of about 825 K (~550 °C). In between a first receiving space comprising vertically aligned nanoporous material and a second receiving space comprising vertically aligned nanoporous material some dielectric material 22 is (still) present. This dielectric material is in a later stage etched away, such as by using a dry etching procedure which is found to prevent damaging of the porous material; also in view thereof the vertically aligned material is nanoporous and therewith allows gas species which are capable of etching to pass through the nanoporous material . On the nanoporous material and remaining dielectric material 22 a top conducting layer 32 is applies, such as by deposition, , such as by sputtering, by PVD, and the like; the top conducting layer is in electrical and thermal contact with the nanoporous material; a typical thickness of the layer 32 is 0.1-10 ym, preferably 0.2-5 ym, more preferably 0.5-4 ym, such as 1.0-2.5 ym; the layer is thick enough to provide good electrical and thermal conductance and a low thermal capacity as well as to provide a good (conformal) sealing of the nanoporous material underneath, but need not be too thick; suitable materials are Ti, W, Cu, Au, Al, Ni, preferably Ti, A1 and Cu; some may have pin holes in the top layer, which can cause bubbling in photoresist in a later stage of lithography; therefore, optionally an extra layer is applied to seal the pin holes, this extra layer can be removed easily; an example is a 0.5-5 ym SiCy layer, e.g. TEOS. The top conducting layer is then patterned, typically using alignment markers in order to have a further pattern coincide with an earlier pattern; the pattern provides openings in the top metal layer wherein the openings and remaining dielectric material 22 coincide, possible apart from some dielectric material in between adjacent and closely packed vertically aligned nanoporous materials 42; here it is noted that the receiving spaces, and as a consequence vertically aligned nanoporous material, may be distributed evenly (in an horizontal plane) over/in the dielectric material 22, or may be distributed unevenly (see e.g. fig. 3b) such as in groups of two; the top conducting layer may be etched by plasma dry etching, such as by CI2 or HBr plasma, typically at a low pressure (133-1330 Pa, (1-10 Torr, e.g. 5 Torr)); in a further step the dielectric material 22 is removed, such as by etching with HF vapor, typically at a low pressure (133-1330 Pa, (1-10 Torr)), to create freed space 61 in between the nanoporous material without damaging said nanoporous material (the present nanoporous material, such as CNT, was analyzed with Raman spectroscopy before and after being exposed to HF vapor and it showed no deterioration in ma terial quality, such as crystal quality), therewith providing at least one 3D-structure; at the same time the top conducting layer interconnects adjacent vertically aligned nanoporous material. A horizontal distance between freed spaces is from 100 nm upwards to 1 mm. A distance between adjacent c.q. individual carbon nanotubes is found to be about 20-50 nm; typically at least a few CNT's are present in a free space. By varying the size of the freed space and/or space occupied by the nanoporous material and/or dimensions of the nanoporous material (width/height) characteristics of the thermoacoustic device may be tuned; for instance for a certain application frequency (single frequency or a band of frequencies) an optimized performance can be achieved by tuning size and shape of the opening; likewise a volume may tuned, and thereby e.g. the heat capacity. The top conducting layer may further be provided with a masking layer underneath, such as SiC or SiN with a thickness of 0.2-5 ym. This masking layer can be used to reduce the gap width between the nanoporous material and second sacrificial dielectric layer.
In a second aspect the present invention provides a three dimensional thermoacoustic device 100 according to claim 10. The thermoacoustic device is considered to utilize the 3D nanoporous microstructures to produce sound; the thermoacoustic device is considered to convert electrical energy into thermal energy which in turn is converted into acoustic waves, and these waves are perceived as sound by the human ear. The thermoacoustic device is a sandwiched structure composed of a bottom interconnecting layer, a middle layer comprising nanoporous material and a top conductive layer. Both the top, bottom and moreover, the middle nanoporous layers may be used to exchange energy with the environment. When the energy is in the form of heat the device is considered to function as a thermoacoustic transducer. Therein (i) a vertical 3D thermoacoustic heater 200 is present, the heater comprising at least one sandwiched structure 300, such as one being formed by the above method, wherein the sandwiched structure comprises a substrate 10, at least one bottom electrical conducting element 31 adapted for interconnection, an electrical conductive intermediate layer 41 comprising vertically aligned na noporous material, in said intermediate layer freed space 61, therewith forming at least one 3D-nanoporous material element 42, and at least one top electrical conductive element 32 adapted for interconnection, an electrical input 37 for providing an electrical current, and an electrical output 38/ the electrical input 37, at least one top electrical conducting element 32, wherein the top conducting element may be formed of a metal or of the conductive nanoporous material wherein two adjacent vertically aligned nanoporous materials may form a continuous structure, at least one 3D-nanoporous material element 42, at least one bottom electrical conducting element 31, and electrical output 38 provide at least one electrically conductive path; and an electrical power supply 90, typically an AC supply, for driving the at least one sandwiched structure by providing power thereto; typically the power supply is operated at a frequency of 10 Hz-500 kHz, preferably 15 Hz-300 kHz, more preferably 20 Hz-100 kHz, such as 40 Hz-20 kHz, i.e. in a sound range that can typically be perceived by human beings, optionally including at least one harmonic series thereof; it is noted that in principle also higher frequencies, such as ultrasound frequencies, e.g. 300 kHz-lOMHz, such as 1-5 MHz, could be generated, such as for other applications; the power supply typically uses a current of 0.1 mA-lA, preferably 1-500 mA, more preferably 10-250 mA, such as 50-100 mA, a low voltage of 0.01-10 V, preferably 0.1-5 V, more preferably 0.5-3 V, such as 1-2 V; it is found that in view of the present layout a frequency as provided is typically doubled; such may be "corrected" e.g. by providing a DC bias to remove said doubling.
In a third aspect the present invention relates to a use of the present device such as a sensor, such as a gas sensor, such as an oxygen sensor, an actuator, a MEMS, a micro reactor, a micro evaporator, a micro thruster, in a nanofiltration device, in a microphone, in a microheater, and in a capacitor. For instance, in a microheater a much better control of bubble generation is achieved, as bubbles in the present device are of a size equal to or smaller than a distance of two adjacent nanoporous structures; the bubbles typically disturb micro-heating significantly.
In a fourth aspect the present invention relates to a use of the present device for providing at least one of a sound pressure level (SPL) of 37 dB or more normalized to a 1W input power at 3kHz at a distance of 3 cm, a flat frequency response, and a high thermoacoustic efficiency.
It is noted that some of the steps may be performed in a different sequence, and/or at a later or earlier stage.
Thereby the present invention provides a solution to one or more of the above mentioned problems.
Advantages of the present invention are detailed throughout the description.
DETAILED DESCRIPTION OF THE INVENTION
The present invention relates in a first aspect to a method according to claim 1, with e.g. reference to figs. 3 and 5.
In an exemplary embodiment of the present method the openings 71 are symmetrical, such as hexagonal, circular, ellipsoidal, square, rectangular, triangular, octagonal, or multigonal, preferably hexagonal. The hexagonal openings are found to provide a more mechanically stable device. At an edge of the present device the openings, and likewise vertically aligned nanoporous material, may form part of said symmetrical element, such as a half thereof.
In an exemplary embodiment of the present method the nanoporous material 41 has an electrical conductance o of >103 (S/m) at 20 °C, preferably >104 (S/m), more preferably >105 (S/m); even more preferably >106 (S/m), such as >107 (S/m) (according to ISO 14237) . The nanoporous material 41 preferably has a specific heat of 300-900 J/kgK, more preferably 400-800 J/kgK, such as 500-750 J/kgK; the specific heat is preferably not too high and not too low in view of thermoacoustic properties. Also the top and bottom conductive layers preferably have similar electrical conductance and specific heat. In view thereof carbon or a carbon comprising material is very suited, such as carbon nanotubes with a specific heat of about 700 J/kgK; the characteristics of carbon nanotubes are found to at least partially resemble those of graphene. In an alternative approach nanoporous material may be coated with a 0.04-4 nm thick conducting layer, such as by ALD of a metal.
In an exemplary embodiment of the present method at least one of the bottom conducting layer 31 and top conducting layer 32 is provided with patterns. As such adjacent vertically aligned nanoporous material may be interconnected at a top side and/or at a bottom side; complex arrays may be formed in such a way; in addition the patterns for connection and openings 71 may partly or fully coincide.
In an exemplary embodiment the present method further comprises providing a conductive supporting layer 23 on the bottom conducting layer 31 (fig. 5a). The thickness of this supporting layer is typically from 5-500 nm, preferably 10-250 nm, more preferably 20-100 nm, such as 30-50 nm; it may be of a metal or metal comprising material, such as TiN; it may be provided by sputtering or PVD; it may also be provided in a same equipment as the bottom conducting layer and optional sacrificial layer. It may further be provided, typically in a later stage, with a catalyst, such as a Fe comprising catalyst .
In an exemplary embodiment the present method further comprises providing a sacrificial layer 81 (fig. 5a), optionally or typically on the conductive supporting layer 23. The thickness of this sacrificial layer is typically from 5-500 nm, preferably 10-250 nm, more preferably 20-100 nm, such as 30-50 nm; it may be of a metal or metal comprising material, such as Ti; it may be provided by sputtering or PVD; it may also be provided in a same equipment as the bottom conducting layer and supporting layer.
In an exemplary embodiment of the present method the substrate is provided with a back side dielectric layer 28 (fig. 5a). The back side dielectric layer may have a similar thickness as the first dielectric layer 21 and may be provided in a similar or the same way, such as at the same time.
In an exemplary embodiment of the present method the second dielectric layer 22 is partly applies, such as by deposition, on the first dielectric layer 21 (see e.g. fig. 5a, underneath 22). In other words no bottom conducting layer is present and the combined dielectric layers may be considered to form a wall surrounding an area comprising the at least one receiving space and nanoporous material. A top con ducting layer may still be provided at least partly on the second dielectric layer, e.g. in order to provide contact to an outside world and/or to an adjacent thermoacoustic heat-er/sandwiched structure, if applicable.
In an exemplary embodiment of the present method the second dielectric layer 22 is provided with a thermally and chemically stable masking layer 83 (see fig. 5a), such as SiC and SiN, for narrowing a gap between the nanoporous material and the second dielectric layer.
In an exemplary embodiment of the present method the nanoporous material is provided with at least one conformal layer, such as an dielectric layer, which may contribute to improved material properties and protection of the nanoporous material. The conformal layer may have a thickness of 0.1-20 nm.
In an exemplary embodiment of the present method the substrate is provided with a cavity (11)(fig. 3b). The cavity may incorporate most or all of the further elements partly or fully. The cavity may have perpendicular walls, with respect to the substrate, or wall provided under an oblique angle, such as an angle of 10-170 (almost "closed"- almost "open"=flat) degrees relative to the substrate.
In an exemplary embodiment of the present method at least one of the nanoporous material 41, openings 71, receiving space 51, top conducting layer 32, and bottom conducting layer 31 is patterned using lithography and/or e-beam. Typically various patterning steps are performed using alignment markers. In an example an I-line ASML PAS 5500 is used.
In a second aspect the present invention relates to a three dimensional thermoacoustic device according to claim 10. The present device has certain advantages such as that it is suitable for heterogeneous system integration, it is magnet free; it is free of vibration, it can be produced in a clean-room, in high volume production, it requires no assembly of multiple parts, it is light in weight, it is scalable and can be miniaturized, it has a flat frequency response, and it may have a wideband response, such as from audio frequency to ultrasonic. The device may be considered to have a series of structures, e.g. the present heaters 200, which in turn may comprise a number of sandwiched structures; likewise, e.g. in view of a current path, the device may be considered to relate to a meandering structure; as such a length of the current path may be varied, and hence the electrical resistance R, and as a consequence the output (W), such as by design, and therewith acoustical properties may be varied.
In an exemplary embodiment the present device is obtainable by the present method.
In an exemplary embodiment of the present device the nanoporous material has a ratio of surface area SA (m2) to volume V (m3) of > 104 m_1, preferably > 106 m_1. For CNT the ratio is found to be 9*106 m”1, based on calculations in combination with SEM measurements. The material is found to provide a tremendous device-to-environment interface. The 3D microstructures made of the nanoporous material are found to be extremely suitable for surface driven energy transfer and signal exchange mechanisms with an outside medium, typically a fluid such as air. A similar ratio is a surface area per gram, as may be determined by a BET method (Θ77 K, N2), e.g. by using a Horiba SA-9600. For carbon about 5 m2/g has been found, whereas for CNT about 20 m2/g is found. Such is found to be very beneficial in view of thermoacoustic properties.
In an exemplary embodiment of the present device the nanoporous material is selected from carbon comprising material, such as carbon nanotubes (CNT), and graphene. These materials are found to have good thermal and electrical characteristics and fit well within the present method and device.
In an exemplary embodiment of the present device at least one top electrical conductive elements 32 has at least one array of symmetrical openings, typically most or all elements 32 have such an array of symmetrical openings. The array typically covers at least a part and often most of the underlying vertically aligned nanoporous material; wherein the conducting layer is in contact with the nanoporous material, and the openings are provided above the free space 61; the array comprises typically 10“6-10 openings/pm2, such as 10”5-1 openings/pm2, e.g. 10”4-10“2 openings/pm2. A width of conducting lines surrounding said openings is typically from 1-200 pm, preferably from 2-100 pm, more preferably from 5-50 pm, such as from 10-40 pm, e.g. 20-30 pm.
In an exemplary embodiment of the present device at least one interconnected series of n*m sandwiched structures are provided, wherein n and m are each independently ne [1, 106] , preferably ne [2, 105] , more preferably ne [5, 104] , even more preferably ne [10, 103] , such as ne [20, 102] , and m e [1, 106] preferably me [2, 105] , more preferably me [5, 104] , even more preferably me [10, 103] , such as me [20, 102]. So arrays comprising a relatively number of sandwiched structures may be provided, such as 9*24, as well as very small arrays.
In an exemplary embodiment the present device bottom conductive pads of the bottom conductive layer are protected by a SiC layer from corrosion and lift-off during the HF vapor etching of oxide sacrificial layer, which results in good quality bottom metal layer.
Various details of the present invention can be found in the MSc thesis of one of the present inventors, "THERMALLY DRIVEN SOUND SOURCE: APPLICATION OF CNT NANOFOAMS" by Hengqian Yi, TU Delft, to be published December 2016, which document and its contents is herewith incorporated by reference.
The invention is further detailed by the accompanying figures and examples, which are exemplary and explanatory of nature and are not limiting the scope of the invention. To the person skilled in the art it may be clear that many variants, being obvious or not, may be conceivable falling within the scope of protection, defined by the present claims.
FIGURES
Figure 1: The development of sound source, starting from late 19th century till now very little improvements are made in the sound source industry, nowadays people still rely on the old inventions. Figure 2: The working principle of a thermoacoustic chip and the energy transfer through Multiphysics domains .
Figure 3a-c: Illustration of the difference between 2D and 3D design, (a) Illustrates the 2D design and the less optimal orientation of acoustic emission.
The 2D design is composed of a conductive thin film and an underneath cavity inside a substrate. A suspension feature is added in order to reduce thermal loss by conduction through the substrate. The orientation of a heat wave is limited by the geometrical nature of the 2D thin film design.
The air expansion near the 2D thin film is in two directions: upward to the ambient which is desired, and downward into the cavity which is not desired. The suspension feature and thin film together give a more fragile property to such a 2D thin film design. (b)and (c) The present proposed 3D solution. Fig. 3b shows the principle of a 3D thermoacoustic design, wherein arrows show the air expansion orientation of such a 3D design.
The present 3D solution is considered to benefit from vertical nanoporous heaters and the openings and cavities to direct the air expansion to the desired orientation. Fig. 3c shows the components of the present 3D design. The device can be wire bonded, to drive in an electrical current through wires, wherein a current input is 37 and an output is 38. The device can be fabricated in a cavity 11, or on a planar substrate 10 surface. Element 21 is the first dielectric layer, 28 is the backside dielectric layer, 31 is the bottom conducting layer, 23 is the supporting layer. Further 22 is the second dielectric layer and 32 is the top conducting layer. 41 is the nanoporous material and 42 is the vertical aligned nanoporous element. 61 is the freed space after removing 22 by etching. 71 is the top opening in 32 through which element 61 can be formed by etching.
Figure 4a-b: A 3D model of the present CNT nanofoam design with hexagonal openings for sound emission, (a) Zig-Zag current created by vertically conducting CNT arrays, heating causes air expansion and result in sound emission from the openings. A cur rent 37 enters on a left top side, passes through the top conducting layer, then through the na-noporous material, then trough the bottom conducting layer, the enters an adjacent (b) Side view of applied materials in the design.
Figure 5a-e: The schematic of main process steps and its correlating SEM images.
Figure 6: The frequency response of SPL of the 2D planar design and the 3D vertical design, (a) shows a simulation result of a 2D planar design. On the left the SPL response of the device at an input power of 0.5 W over the frequency range from 1 kHz to 100 kHz at 3 different distance, 2 cm, 3 cm and 5 cm is shown. The right part of (a) shows the distribution of the SPL field in all directions in the surrounding environment, (b) shows the simulation result under the same conditions as (a) with the only change being to the present3D design geometry. It shows that a 3D design has a more flat response over wide range of frequencies .
Figure 7a-c: The fabrication result of the present processing approach.
Figure 8: The SPL frequency response of thermoacoustic sound source (this work). The SPL response is noisy as shown due to the low sound pressure detected is near the self-noise level of the Microphone . DETAILED DESCRIPTION OF THE FIGURES In the figures 100 three dimensional thermoacoustic device 200 3D thermoacoustic heater 300 sandwiched structure 10 substrate 11 substrate cavity 21 first dielectric layer 22 second dielectric layer 23 supporting layer 28 back side dielectric layer 31 bottom conducting layer/element 32 top conducting layer/element 37 electrical input 38 electrical output 41 vertically aligned nanoporous material 42 3D nanoporous material element 51 receiving space 61 freed space 71 etched opening 81 sacrificial layer 82 protective layer (for bottom conducting layer/element) 83 masking layer (on top of second dielectric layer) 84 Sealing layer (for top conducting layer/element) 90 electrical power supply SA Surface area (m2) V volume (m3)
The figures are further detailed in the description and examples below. EXAMPLES/EXPERIMENTS Thermoacoustic device
In an example of the present design, shown in fig. 3b and 3c, repetitive two CNT nanofoam comprising arrays are grown on an individual bottom contact pad with a gap in between said arrays, as shown in Figure 4. Thus the electrical connection between the two CNT arrays is bridged by the bottom metal pad. Between each two array units an electrical connection is achieved by a top metal layer. Hexagonal openings, designed for purpose of emitting pressure waves, are found to contribute to a uniform electrical current distribution and to provide mechanical robustness. High resolution and high efficiency lithography assisted patterning, such as I-line lithography, instead of e.g. laser patterning required in fabrication of CNT thin film based devices, is found to provide a large freedom on tailoring and adapting the present CNT nanofoam design into arbitrary formable shapes and the ability to achieve scalable micro/nano architectures.
Method of fabrication
The main process steps to construct the present CNT nanofoam architecture is presented in Figure 5 along with SEM images for each step.
Despite that functional devices with excellent characteristics have been obtained some room for improvement is considered. Schematics of the main challenges and corresponding SEM images are shown in Figure 5. To solve some of these challenges the above process flow is further optimized by including several further steps. In Figure 5 the simplified flow chart concerning the main optimized steps are illustrated.
Method of CNT growth
The accurately patterned CNT growth within TEOS Oxide trenches mainly consists of 3 steps: catalyst deposition, lift-off and grow. A 0.1-10 nm, such as 5 nm, thin catalyst layer is applies, such as by deposition, on the wafer by evaporation, preferably comprising nanoparticles, such as Fe. The catalyst layer is preferably deposited on a conductive layer, such as a TiN or ZrN layer. On the catalyst, preferably on the nanoparticles, a well-controlled growth of nanoporous CNT is established. The photo-resist for masking the TEOS oxide is not removed after the dry-etching step. Thus during Fe deposition, an area of TEOS oxide is still covered by the photoresist. With the lift-off process unwanted Fe is removed together with the photo-resist; only the TiN supporting layer at the bottom of trenches is applies, such as by deposition, with Fe. The lift-off process is carried out in an ultrasonic bath in NMP. In this way the TEOS area is prevented from Fe contamination and after lift-off they are considered as clean to any further CMOS process. The CNT growth rate which under conditions of 5 nm Fe catalyst, 50 nm TiN supporting layer and 550 °C LPCVD method is around 1 ym/min during about 10 min.; therein a gas combination of N2, H2 and C2H2 was used; the tool is an AIXTRON Black Magic CVD System. The respective gas amounts are N2 : 200 ppm, H2 : 700 ppm, C2H2:50 ppm, the total pressure is 80 mbar. This growth rate is within a desirable range for reaching a target height, the height of the nanotubes can be well controlled. The total CNT growth time is approximately 10 min to reach the same height as the TEOS.
Results
To estimate the performance of the present design, inventors simulated a comparable 2D planar device and the present 3D vertical design. The two designs were simulated (using COMSOL) using the same material and physical boundary conditions for comparing the differences in their performance. In view of 2D and 3D designs the only change between the 2 models required in COMSOL was the geometry. The parameters regarding materials and thermoacoustic and solid interaction physics are the same used in the two comparative models.
The frequency response of sound pressure level (SPL) from 1 kHz to 100 kHz is plotted in Figure 6a-b. The curves (bottom) show a much more flat frequency response of the present 3D vertical design (in comparison to the 2D planar device (top)) over the whole spectrum that is simulated. The value of sound pressure level increased largely from low frequency to high frequency in the case of CNT thin film planar thermoacoustic sound source. And in the present design of CNT nanofoam vertical volume heater the SPL value is found to be more constant from low to high frequencies. It is noted that a smooth and flat response can result in better reproduction of the real sound and as such may be considered to be a requirement .
The present fabricated CNT nanofoam thermoacoustic (TA) device is shown in Figure 7a-c. The chip therein is wire bonded to a PCB for acoustic measurement. For fabricating the device, it may require only three layers of masks and each device may be fitted to a 6 x 6mm die on a 100 mm wafer. Some test structures are fabricated along the device as well. In fig. 7b a number of sandwiched elements 300 is shown, as well as a thermoacoustic heater 200.
With an input power of 32mW, the present TA chip produces a distinguishable sound. The measurement result of the SPL spectrum of the CNT nanofoam device is given in Figure 8.
The invention although described in detailed explanatory context may be best understood in conjunction with the accompanying examples and figures.
For the purpose of search the following section is added, which represents a translation of the claims into English . 1. Method of producing a three dimensional thermoacoustic device (100) comprising nanoporous material comprising the steps of providing a substrate (10), such as Si applying on the substrate a first dielectric layer (21), applying on the dielectric layer at least one bottom conducting layer (31) , applying a second dielectric layer (22) on the bottom conducting layer, such as TEOS, etching the second dielectric layer (22) thereby providing at least one receiving space (51), providing vertically aligned electrically conductive nanoporous material (41) in the receiving space (51), such as carbon nanotubes (CNT), applying a top conducting layer (32), optionally providing a sealing layer (84) on the top conducting layer, etching openings (71) in the top conducting layer, and removing dielectric material (22) to create freed space (61) in between the nanoporous material therewith providing at least one 3D-structure. 2. Method according to claim 1, wherein the openings (71) are symmetrical. 3. Method according to any of the preceding claims, wherein the nanoporous material (41) has an electrical conductance of >103 σ (S/m) at 20 °C, and/or wherein the nanoporous material (41) has a specific heat of 300-900 J/kgK. 4. Method according to claim 3, wherein at least one of the bottom conducting layer (31) and top conducting layer (32) is provided with patterns. 5. Method according to any of the preceding claims, further comprising providing a conductive supporting layer (23) on the bottom conducting layer (31). 6. Method according to any of the preceding claims, further comprising providing a sacrificial layer (81), optronally on the conductive supporting layer (23). 7. Method according to any of the preceding claims, wherein the substrate is provided with a back side dielectric layer (28), and/or wherein the second dielectric layer is partly applies, such as by deposition, on the first dielectric layer, and/or wherein the second dielectric layer is provided with a thermally and chemically stable masking layer (83), and/or wherein the nanoporous material is provided with at least one conformal layer, such as an dielectric layer, and/or wherein the bottom conducting layer is provided with a protecting layer (82). 8. Method according to any of the preceding claims, wherein the substrate is provided with a cavity (11). 9. Method according to any of the preceding claims, wherein at least one of the nanoporous material (41), openings (71), receiving space (51), top conducting layer (32), and bottom conducting layer (31) is patterned using lithography and/or e-beam. 10. Three dimensional thermoacoustic device (100) comprising (i) a vertical 3D thermoacoustic heater (200) comprising at least one sandwiched structure (300), the sandwiched structure comprising (iO) a substrate (10), (ia) at least one bottom electrical conducting element (31) adapted for interconnection, (ibl) an electrical conductive intermediate layer (41) comprising vertically aligned nanoporous material, (lb2) in said intermediate layer freed space (61), therewith forming at least one 3D-nanoporous material element (42), and (ic) at least one top electrical conductive element (32) adapted for interconnection, (ld) an electrical input (37), and (le) an electrical output (38), wherein the electrical input (37), at least one top electrical conducting element (32), at least one 3D-nanoporous material element (42), at least one bottom electrical conducting element (31), and electrical output (38) provide at least one electrically conductive path, and (ii) an electrical power supply (90) for driving the at least one sandwiched structure by providing power thereto . 11. Device according to claim 10, obtainable by a method according to any of claims 1-9. 12. Device according to claim 10 or 11, wherein the nanoporous material has a ratio of surface area SA (m2) to volume V (m3) of > 104 irf1. 13. Device according to any of claims 10-12, wherein the nanoporous material is selected from carbon comprising material, such as carbon nanotubes (CNT), and graphene. 14. Device according to any of claims 10-13, wherein at least one top electrical conductive element (32) has at least one array of symmetrical openings. 15. Device according to any of claims 10-13, wherein at least one interconnected series of n*m sandwiched structures are provided, wherein n and m are each independently ne [1, 106] , and me [1, 106] . 16. Use of a device according to any of claims 10-15 in a product, such as a sensor, such as a gas sensor, such as an oxygen sensor, an actuator, a MEMS, a micro reactor, a micro evaporator, a micro thruster, in a nanofiltration device, in a microphone, in a microheater, and in a capacitor . 17. Use of a device according to any of claims 10-15 for providing at least one of a sound pressure level (SPL) of at least 37 dB normalized to a 1W input power at 3kHz at a distance of 3 cm, a flat frequency response, and a high thermoacoustic efficiency.

Claims (17)

1. Werkwijze voor het vervaardigen van een driedimensionale thermo-akoestische-inrichting (100) omvattende nanopo-reus materiaal omvattende de stappen van het verschaffen van een substraat (10), zoals Si, het aanbrengen op het substraat van een eerste di-elektrische laag (21), het aanbrengen op de diëlektrische laag van ten minste een onderste geleidende laag (31), het aanbrengen van een tweede diëlektrische laag (22) op de onderste geleidende laag, zoals TEOS, het etsen van de tweede diëlektrische laag (22) waardoor ten minste één opneemruimte (51) wordt verschaft, het verstrekken van verticaal uitgelijnd elektrisch geleidend nanoporeus materiaal (41) in de opneemruimte (51), zoals koolstof nanobuisjes (CNT), het aanbrengen van een bovenste geleidende laag (32), het eventueel het verschaffen van een afdichtende laag (84) op de bovenste geleidende laag, het etsen van openingen (71) in de bovenste geleidende laag, en het verwijderen van diëlektrisch materiaal (22) om vrijgekomen ruimte (61) tussen het nanoporeuze materiaal te maken om daarmee tenminste een 3D-structuur te verschaffen.A method of manufacturing a three-dimensional thermo-acoustic device (100) comprising a nanoporous material comprising the steps of providing a substrate (10) such as Si, applying a first dielectric layer to the substrate (21), applying to the dielectric layer at least one lower conductive layer (31), applying a second dielectric layer (22) to the lower conductive layer, such as TEOS, etching the second dielectric layer (22) providing at least one receiving space (51), providing vertically aligned electrically conductive nanoporous material (41) in the receiving space (51), such as carbon nanotubes (CNT), applying an upper conductive layer (32), optionally providing a sealing layer (84) on the upper conductive layer, etching openings (71) in the upper conductive layer, and removing dielectric material (22) to release freed space (61) between the nanoporous material to thereby provide at least a 3D structure. 2. Werkwijze volgens conclusie 1, waarbij de openingen (71) symmetrisch zijn.The method of claim 1, wherein the openings (71) are symmetrical. 3. Werkwijze volgens één der voorgaande conclusies, waarbij het nanoporeuze materiaal (41) een elektrische geleiding van > 103 o (S/m) bij 20 °C heeft, en/of waarbij het nanoporeuze materiaal (41) een soortelijke warmte van 300-900 J/kgK heeft.Method according to any one of the preceding claims, wherein the nanoporous material (41) has an electrical conductivity of> 103 o (S / m) at 20 ° C, and / or wherein the nanoporous material (41) has a specific heat of 300- 900 J / kgK. 4. Werkwijze volgens conclusie 3, waarbij ten minste één van de onderste geleidende laag (31) en bovenste geleidende laag (32) is voorzien van patronen.The method of claim 3, wherein at least one of the lower conductive layer (31) and upper conductive layer (32) is patterned. 5. Werkwijze volgens één der voorgaande conclusies, verder omvattende het verschaffen van een geleidende steunlaag (23) op de onderste geleidende laag (31).The method of any one of the preceding claims, further comprising providing a conductive backing layer (23) on the lower conductive layer (31). 6. Werkwijze volgens één der voorgaande conclusies, verder omvattende het verschaffen van een opofferingslaag (81), eventueel op de geleidende steunlaag (23).The method of any one of the preceding claims, further comprising providing a sacrificial layer (81), optionally on the conductive support layer (23). 7. Werkwijze volgens één der voorgaande conclusies, waarbij het substraat is voorzien van een diëlektrische ach-terzijdelaag (28), en/of waarbij de tweede diëlektrische laag gedeeltelijk wordt afgezet op de eerste diëlektrische laag, en/of waarbij de tweede diëlektrische laag is voorzien van een thermisch en chemisch stabiele maskerlaag (83), en/of waarbij het nanoporeuze materiaal is voorzien van ten minste een conforme laag, zoals een diëlektrische laag, en/of waarbij de onderste geleidende laag is voorzien van een beschermingslaag (82).A method according to any one of the preceding claims, wherein the substrate is provided with a dielectric reverse layer (28), and / or wherein the second dielectric layer is partially deposited on the first dielectric layer, and / or wherein the second dielectric layer is provided with a thermally and chemically stable mask layer (83), and / or wherein the nanoporous material is provided with at least one conforming layer, such as a dielectric layer, and / or wherein the lower conductive layer is provided with a protective layer (82). 8. Werkwijze volgens één der voorgaande conclusies, waarbij het substraat is voorzien van een holte (11).A method according to any one of the preceding claims, wherein the substrate is provided with a cavity (11). 9. Werkwijze volgens één der voorgaande conclusies, waarbij ten minste één van het nanoporeuze materiaal (41), openingen (71), opneemruimte (51), bovenste geleidende laag (32), en onderste geleidende laag (31) gepatroneerd zijn gebruikmakend van lithografie en/of e-beam.The method of any preceding claim, wherein at least one of the nanoporous material (41), openings (71), receiving space (51), upper conductive layer (32), and lower conductive layer (31) are patterned using lithography and / or e-beam. 10. Driedimensionale thermo-akoestische-inrichting (100) omvattende (i) een verticale 3D thermo-akoestische verwarmer (200) omvattend ten minste één ingeklemde structuur (300), waarbij de ingeklemde structuur omvat (iO) een substraat (10), (ia) ten minste één onderste elektrisch geleidende element (31) ingericht voor interconnectie, (ibl) een elektrisch geleidende tussenlaag (41) die verticaal uitgelijnde nanoporeus materiaal omvat, (ib2) in de tussenlaag vrijgemaakte ruimte (61), daarmee ten minste een 3D-nanoporeus materiaalelement (42) vormend, en (ic) ten minste één top elektrisch geleidend element (32) ingericht voor interconnectie, (id) een elektrische ingang (37) en (ie) een elektrische uitgang (38) , waarbij de elektrische ingang (37), ten minste een bovenste elektrisch geleidende element (32), ten minste een 3D-nanoporeus materiaal element (42), ten minste één onderste elektrisch geleidend element (31), en elektrische uitgang (38) ten minste één elektrisch geleidend pad verschaffen, en (ii) een elektrische voeding (90) voor het aandrijven van de ten minste ene ingeklemde structuur door het daaraan verschaffen van vermogen.A three-dimensional thermo-acoustic device (100) comprising (i) a vertical 3D thermo-acoustic heater (200) comprising at least one clamped structure (300), the clamped structure comprising (iO) a substrate (10), ( ia) at least one lower electrically conductive element (31) arranged for interconnection, (ib1) an electrically conductive intermediate layer (41) comprising vertically aligned nanoporous material, (ib2) space (61) in the interlayer exposed space, with at least one 3D - nanoporous material element (42), and (ic) at least one top electrically conductive element (32) arranged for interconnection, (id) an electrical input (37) and (ie) an electrical output (38), the electrical input (37), at least one upper electrically conductive element (32), at least one 3D nanoporous material element (42), at least one lower electrically conductive element (31), and electrical output (38) at least one electrically conductive path, and (ii) an electrical supply (90) for driving the at least one clamped structure by providing power thereto. 11. Inrichting volgens conclusie 10, verkrijgbaar door een werkwijze volgens één der conclusies 1-9.Device as claimed in claim 10, obtainable by a method as claimed in any of the claims 1-9. 12. Inrichting volgens conclusie 10 of 11, waarbij het nanoporeus materiaal een verhouding van specifiek oppervlak SA (m2) tot volume V (m3) van > 104 m_1 heeft.The device according to claim 10 or 11, wherein the nanoporous material has a ratio of specific surface area SA (m2) to volume V (m3) of> 104 m -1. 13. Inrichting volgens één van de conclusies 10-12, waarbij het nanoporeus materiaal is gekozen uit koolstof omvattende materialen, zoals koolstofnanobuisjes (CNT) en gra-feen.The device of any one of claims 10-12, wherein the nanoporous material is selected from carbon-containing materials, such as carbon nanotubes (CNT) and graphene. 14. Inrichting volgens één van de conclusies 10-13, waarbij ten minste één top elektrisch geleidende element (32) ten minste één reeks symmetrische openingen heeft.The device of any one of claims 10-13, wherein at least one top electrically conductive element (32) has at least one set of symmetrical openings. 15. Inrichting volgens één van de conclusies 10-13, waarbij ten minste een verbonden reeks van n*m ingeklemde structuren zijn verschaft, waarbij n en m elk onafhankelijk ne[l,106], en me[l,106] zijn.The device of any one of claims 10-13, wherein at least one connected series of n * m clamped structures are provided, wherein n and m are each independently n 1, 106, and me, 1, 106. 16. Toepassing van een inrichting volgens één van de conclusies 10-15 in een product, zoals een sensor, zoals een gassensor, zoals een zuurstof sensor, een actuator, een MEMS, een microreactor, een microverdamper, een microthruster, in een nanofiltratie-inrichting, in een microfoon, in een micro-verwarmer, en in een condensator.Use of a device according to any of claims 10-15 in a product, such as a sensor, such as a gas sensor, such as an oxygen sensor, an actuator, a MEMS, a microreactor, a micro-evaporator, a micothruster, in a nanofiltration device, in a microphone, in a micro-heater, and in a capacitor. 17. Gebruik van een inrichting volgens één van de conclusies 10-15 voor het verschaffen van ten minste één van een geluidsdrukniveau (SPL) van ten minste 37 dB genormaliseerd naar een 1W ingangsvermogen bij 3 kHz op een afstand van 3 cm, een vlakke frequentierespons, en een hoge thermo- efficiëntie.Use of a device according to any of claims 10-15 for providing at least one of a sound pressure level (SPL) of at least 37 dB normalized to a 1W input power at 3 kHz at a distance of 3 cm, a flat frequency response , and a high thermo-efficiency.
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012205193A (en) * 2011-03-28 2012-10-22 Yamaha Corp Thermoacoustic device
US20140140545A1 (en) * 2012-11-20 2014-05-22 Hon Hai Precision Industry Co., Ltd. Thermoacoustic device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012205193A (en) * 2011-03-28 2012-10-22 Yamaha Corp Thermoacoustic device
US20140140545A1 (en) * 2012-11-20 2014-05-22 Hon Hai Precision Industry Co., Ltd. Thermoacoustic device

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PHILLIP LEE ET AL: "Patternable pyrolyzed carbon microspeaker", MICRO ELECTRO MECHANICAL SYSTEMS (MEMS), 2010 IEEE 23RD INTERNATIONAL CONFERENCE ON, IEEE, PISCATAWAY, NJ, USA, 24 January 2010 (2010-01-24), pages 1135 - 1138, XP031655131, ISBN: 978-1-4244-5761-8 *
WENWEN FEI ET AL: "Low-voltage Driven Graphene Foam Thermoacoustic Speaker", SMALL, vol. 11, no. 19, 1 May 2015 (2015-05-01), DE, pages 2252 - 2256, XP055363771, ISSN: 1613-6810, DOI: 10.1002/smll.201402982 *

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