NL2012220A - Lithographic apparatus and device manufacturing method. - Google Patents

Lithographic apparatus and device manufacturing method. Download PDF

Info

Publication number
NL2012220A
NL2012220A NL2012220A NL2012220A NL2012220A NL 2012220 A NL2012220 A NL 2012220A NL 2012220 A NL2012220 A NL 2012220A NL 2012220 A NL2012220 A NL 2012220A NL 2012220 A NL2012220 A NL 2012220A
Authority
NL
Netherlands
Prior art keywords
substrate
controller
position measurement
signal
area
Prior art date
Application number
NL2012220A
Other languages
English (en)
Inventor
Henrikus Herman Marie Cox
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2012220A publication Critical patent/NL2012220A/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
    • G05B19/402—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for positioning, e.g. centring a tool relative to a hole in the workpiece, additional detection means to correct position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Manufacturing & Machinery (AREA)
  • Automation & Control Theory (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)

Claims (1)

  1. Een lithografieinrichting omvattende: een belichtinginrichting ingericht voor het leveren van een stralingsbundel; een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel; een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op een doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de projectieinrichting.
NL2012220A 2013-02-08 2014-02-06 Lithographic apparatus and device manufacturing method. NL2012220A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201361762654P 2013-02-08 2013-02-08
US201361762654 2013-02-08

Publications (1)

Publication Number Publication Date
NL2012220A true NL2012220A (en) 2014-08-11

Family

ID=50070556

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2012220A NL2012220A (en) 2013-02-08 2014-02-06 Lithographic apparatus and device manufacturing method.

Country Status (4)

Country Link
US (1) US9977341B2 (nl)
JP (1) JP6243927B2 (nl)
NL (1) NL2012220A (nl)
WO (1) WO2014122223A1 (nl)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105706001B (zh) * 2013-10-30 2017-10-03 Asml荷兰有限公司 在光刻术中的物体定位
US9195860B1 (en) * 2014-01-10 2015-11-24 Seagate Technology Llc Adaptively combining waveforms
EP3570110A1 (en) * 2018-05-16 2019-11-20 ASML Netherlands B.V. Estimating a parameter of a substrate

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1784852A2 (en) 2004-08-26 2007-05-16 Philips Intellectual Property & Standards GmbH Lamp with reflective coating
US7379156B2 (en) 2004-12-29 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7657334B2 (en) 2005-09-16 2010-02-02 Asml Netherlands B.V. Lithographic apparatus and control method
TWI416269B (zh) * 2006-08-31 2013-11-21 尼康股份有限公司 Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method
TWI596656B (zh) 2006-09-01 2017-08-21 尼康股份有限公司 Moving body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, element manufacturing method, and correction method
NL1036662A1 (nl) 2008-04-08 2009-10-09 Asml Netherlands Bv Stage system and lithographic apparatus comprising such stage system.
US8488106B2 (en) 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method

Also Published As

Publication number Publication date
JP2016513276A (ja) 2016-05-12
WO2014122223A1 (en) 2014-08-14
JP6243927B2 (ja) 2017-12-06
US20160004172A1 (en) 2016-01-07
US9977341B2 (en) 2018-05-22

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Legal Events

Date Code Title Description
WDAP Patent application withdrawn

Effective date: 20150106