NL2010565A - Lithography apparatus and device manufacturing method. - Google Patents

Lithography apparatus and device manufacturing method. Download PDF

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Publication number
NL2010565A
NL2010565A NL2010565A NL2010565A NL2010565A NL 2010565 A NL2010565 A NL 2010565A NL 2010565 A NL2010565 A NL 2010565A NL 2010565 A NL2010565 A NL 2010565A NL 2010565 A NL2010565 A NL 2010565A
Authority
NL
Netherlands
Prior art keywords
substrate
stroke stage
long
driver modules
short
Prior art date
Application number
NL2010565A
Other languages
English (en)
Inventor
Antonius Franciscus Groot
Sander Christiaan Broers
Theodorus Petrus Maria Cadee
Christiaan Alexander Hoogendam
Yang-Shan Huang
Jeroen Boeij
Erik Roelof Loopstra
Johannes Petrus Martinus Vermeulen
Bastiaan Lambertus Ven
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2010565A publication Critical patent/NL2010565A/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Claims (1)

1. Een lithografieinrichting omvattende: een belichtinginrichting ingericht voor het leveren van een stralingsbundel; een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel; een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op een doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de proj ectieinrichting.
NL2010565A 2012-04-26 2013-04-03 Lithography apparatus and device manufacturing method. NL2010565A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261638867P 2012-04-26 2012-04-26
US201261638867 2012-04-26

Publications (1)

Publication Number Publication Date
NL2010565A true NL2010565A (en) 2013-10-29

Family

ID=50116203

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2010565A NL2010565A (en) 2012-04-26 2013-04-03 Lithography apparatus and device manufacturing method.

Country Status (1)

Country Link
NL (1) NL2010565A (nl)

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Legal Events

Date Code Title Description
WDAP Patent application withdrawn

Effective date: 20150410