NL2004506C2 - Immersie - lithografiesysteem met gebruikmaking van een afgedichte waferbodem. - Google Patents

Immersie - lithografiesysteem met gebruikmaking van een afgedichte waferbodem. Download PDF

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Publication number
NL2004506C2
NL2004506C2 NL2004506A NL2004506A NL2004506C2 NL 2004506 C2 NL2004506 C2 NL 2004506C2 NL 2004506 A NL2004506 A NL 2004506A NL 2004506 A NL2004506 A NL 2004506A NL 2004506 C2 NL2004506 C2 NL 2004506C2
Authority
NL
Netherlands
Prior art keywords
immersion
lithography system
wafer bottom
sealed wafer
sealed
Prior art date
Application number
NL2004506A
Other languages
English (en)
Other versions
NL2004506A (nl
Inventor
Burn-Jeng Lin
Ching-Yu Chang
Original Assignee
Taiwan Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/670,860 external-priority patent/US8208116B2/en
Application filed by Taiwan Semiconductor Mfg filed Critical Taiwan Semiconductor Mfg
Priority to NL2004506A priority Critical patent/NL2004506C2/nl
Publication of NL2004506A publication Critical patent/NL2004506A/nl
Application granted granted Critical
Publication of NL2004506C2 publication Critical patent/NL2004506C2/nl

Links

NL2004506A 2006-11-03 2010-04-02 Immersie - lithografiesysteem met gebruikmaking van een afgedichte waferbodem. NL2004506C2 (nl)

Priority Applications (1)

Application Number Priority Date Filing Date Title
NL2004506A NL2004506C2 (nl) 2006-11-03 2010-04-02 Immersie - lithografiesysteem met gebruikmaking van een afgedichte waferbodem.

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
US86420406P 2006-11-03 2006-11-03
US86420406 2006-11-03
US11/670,860 US8208116B2 (en) 2006-11-03 2007-02-02 Immersion lithography system using a sealed wafer bath
US67086007 2007-02-02
NL1034411A NL1034411C (nl) 2006-11-03 2007-09-20 Immersie-lithografiesysteem met gebruikmaking van een afgedichte waferbodem.
NL1034411 2007-09-20
NL2004506 2010-04-02
NL2004506A NL2004506C2 (nl) 2006-11-03 2010-04-02 Immersie - lithografiesysteem met gebruikmaking van een afgedichte waferbodem.

Publications (2)

Publication Number Publication Date
NL2004506A NL2004506A (nl) 2010-06-09
NL2004506C2 true NL2004506C2 (nl) 2011-07-19

Family

ID=43243801

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2004506A NL2004506C2 (nl) 2006-11-03 2010-04-02 Immersie - lithografiesysteem met gebruikmaking van een afgedichte waferbodem.

Country Status (1)

Country Link
NL (1) NL2004506C2 (nl)

Also Published As

Publication number Publication date
NL2004506A (nl) 2010-06-09

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