NL181957C - METHOD FOR PREPARING A LIQUID FOR TREATING A PHOTOPARDISABLE LAYER COATED AND METHOD FOR SIMULTANEOUS DEVELOPMENT AND PRESERVATION WITH SUCH A FLUID PREPARED. - Google Patents

METHOD FOR PREPARING A LIQUID FOR TREATING A PHOTOPARDISABLE LAYER COATED AND METHOD FOR SIMULTANEOUS DEVELOPMENT AND PRESERVATION WITH SUCH A FLUID PREPARED.

Info

Publication number
NL181957C
NL181957C NL7508674A NL7508674A NL181957C NL 181957 C NL181957 C NL 181957C NL 7508674 A NL7508674 A NL 7508674A NL 7508674 A NL7508674 A NL 7508674A NL 181957 C NL181957 C NL 181957C
Authority
NL
Netherlands
Prior art keywords
photopardisable
preservation
treating
preparing
liquid
Prior art date
Application number
NL7508674A
Other languages
Dutch (nl)
Other versions
NL7508674A (en
NL181957B (en
Original Assignee
Hoechst Co American
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Co American filed Critical Hoechst Co American
Publication of NL7508674A publication Critical patent/NL7508674A/en
Publication of NL181957B publication Critical patent/NL181957B/en
Application granted granted Critical
Publication of NL181957C publication Critical patent/NL181957C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL7508674A 1974-07-22 1975-07-21 METHOD FOR PREPARING A LIQUID FOR TREATING A PHOTOPARDISABLE LAYER COATED AND METHOD FOR SIMULTANEOUS DEVELOPMENT AND PRESERVATION WITH SUCH A FLUID PREPARED. NL181957C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US49084874A 1974-07-22 1974-07-22
US54518775A 1975-01-29 1975-01-29

Publications (3)

Publication Number Publication Date
NL7508674A NL7508674A (en) 1976-01-26
NL181957B NL181957B (en) 1987-07-01
NL181957C true NL181957C (en) 1987-12-01

Family

ID=27050209

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7508674A NL181957C (en) 1974-07-22 1975-07-21 METHOD FOR PREPARING A LIQUID FOR TREATING A PHOTOPARDISABLE LAYER COATED AND METHOD FOR SIMULTANEOUS DEVELOPMENT AND PRESERVATION WITH SUCH A FLUID PREPARED.

Country Status (8)

Country Link
JP (1) JPS5136302A (en)
AU (1) AU500711B2 (en)
BR (1) BR7504643A (en)
DE (1) DE2530502C2 (en)
FR (1) FR2280107A1 (en)
GB (1) GB1515174A (en)
IT (1) IT1040993B (en)
NL (1) NL181957C (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1090189A (en) * 1976-05-03 1980-11-25 American Hoechst Corporation Lithographic plate finisher comprising a solvent phase and an aqueous phase containing tapioca dextrin
DE2809774A1 (en) * 1978-03-07 1979-09-13 Hoechst Ag METHOD AND DEVELOPER SOLUTION FOR DEVELOPING EXPOSED LIGHT-SENSITIVE COPY LAYERS
JPS54136002U (en) * 1978-03-13 1979-09-20
JPS54136001U (en) * 1978-03-14 1979-09-20
JPS54169501U (en) * 1978-05-19 1979-11-30
FR2428863A1 (en) * 1978-06-15 1980-01-11 Martino Peter Automatic printing plate processor - has roller and squeegee drive to transport plate horizontally through processing soln.
JPS5543526A (en) * 1978-09-22 1980-03-27 Toray Ind Inc Continuous washing-out device for photosensitive resin plate
DE3100259A1 (en) * 1981-01-08 1982-08-05 Hoechst Ag, 6000 Frankfurt METHOD AND DEVELOPER MIXTURE FOR DEVELOPING EXPOSED NEGATIVE DIAZONIUM SALT LAYERS
DE3346979A1 (en) * 1983-12-24 1985-07-04 Merck Patent Gmbh, 6100 Darmstadt DEVELOPER FOR POSITIVE PHOTO RESISTS
DE3439597A1 (en) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt DEVELOPER FOR EXPOSED REPRODUCTION LAYERS, AND METHOD FOR THE PRODUCTION OF PRINTING FORMS AND USE OF THE DEVELOPER
DE3713329A1 (en) * 1986-04-30 1987-11-05 Basf Ag Method and device for washing exposed printing plates
JP2626992B2 (en) * 1988-05-10 1997-07-02 富士写真フイルム株式会社 Developer composition for photosensitive lithographic printing plate and developing method
JPH039362A (en) * 1989-06-07 1991-01-17 Sanyo Kokusaku Pulp Co Ltd Photosensitive film developing machine
US5316892A (en) * 1992-07-23 1994-05-31 Eastman Kodak Company Method for developing lithographic printing plates
US5279927A (en) * 1992-07-23 1994-01-18 Eastman Kodak Company Aqueous developer for lithographic printing plates with improved desensitizing capability
US5380623A (en) * 1992-12-17 1995-01-10 Eastman Kodak Company Aqueous developer for lithographic printing plates which provides improved oleophilicity
EP0602736B1 (en) * 1992-12-17 1997-11-05 Eastman Kodak Company Aqueous developer for lithographic printing plates which exhibits reduced sludge formation
ATE527581T1 (en) * 2005-03-29 2011-10-15 Fujifilm Corp METHOD FOR PRODUCING A LITHOGRAPHIC PRINTING FORM
JP2007223216A (en) 2006-02-24 2007-09-06 Fujifilm Corp Treating method of original plate of lithographic printing plate, plate checking method, image quality controlling method and water solution for dyeing used for the methods
EP2194429A1 (en) 2008-12-02 2010-06-09 Eastman Kodak Company Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates
EP2196851A1 (en) 2008-12-12 2010-06-16 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties
EP2293144B1 (en) * 2009-09-04 2012-11-07 Eastman Kodak Company Method of drying lithographic printing plates after single-step-processing
WO2018099916A1 (en) 2016-12-01 2018-06-07 Agfa Nv Method of making a lithographic printing plate precursor containing a diazonium compound
CN108345188A (en) * 2017-12-29 2018-07-31 江苏乐彩印刷材料有限公司 A kind of CTP plates developer solution

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE510151A (en) * 1949-07-23
US3019105A (en) * 1957-02-28 1962-01-30 Harris Intertype Corp Treatment of diazo-sensitized lithographic plates
US3019106A (en) * 1959-06-30 1962-01-30 Algraphy Ltd Processing of pre-sensitised lithographic printing plates
US3091533A (en) * 1958-05-22 1963-05-28 Developer composition for a light
GB921529A (en) * 1958-07-04 1963-03-20 Algraphy Ltd Improvements in or relating to the processing of pre-sensitised lithographic printing plates
GB1102952A (en) * 1963-09-05 1968-02-14 Howson Ltd W H Processing of presensitized photolithographic printing plates
GB1188527A (en) * 1966-05-31 1970-04-15 Algraphy Ltd Development of Light-Sensitive Layers
GB1253026A (en) * 1967-09-08 1971-11-10
JPS5023324B1 (en) * 1971-04-05 1975-08-07
US3906536A (en) * 1971-07-27 1975-09-16 Robert C Graham Apparatus for processing printing plates precoated on both sides
JPS5032643B2 (en) * 1971-10-04 1975-10-23
US3771428A (en) * 1971-10-21 1973-11-13 Azoplate Corp Apparatus for processing two sides of a printing plate
BE793607A (en) * 1972-01-05 1973-07-02 Hoechst Co American APPARATUS FOR PROCESSING BOTH SIDES OF A PRINTING PLATE
JPS5343285B2 (en) * 1972-07-26 1978-11-18
DE2238414C3 (en) * 1972-08-04 1982-01-07 Polychrome Corp., 10702 Yonkers, N.Y. Device for developing offset printing plates
JPS4937704A (en) * 1972-08-10 1974-04-08
JPS4879006A (en) * 1973-01-04 1973-10-23

Also Published As

Publication number Publication date
DE2530502A1 (en) 1976-02-05
JPS5136302A (en) 1976-03-27
GB1515174A (en) 1978-06-21
DE2530502C2 (en) 1985-07-18
NL7508674A (en) 1976-01-26
AU500711B2 (en) 1979-05-31
AU8328175A (en) 1977-01-27
FR2280107A1 (en) 1976-02-20
NL181957B (en) 1987-07-01
IT1040993B (en) 1979-12-20
FR2280107B1 (en) 1977-12-16
BR7504643A (en) 1976-07-06

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
A85 Still pending on 85-01-01
SNR Assignments of patents or rights arising from examined patent applications

Owner name: HOECHST CELANESE CORPORATION

BK Erratum

Free format text: IN PAT.BUL.23/87,PAGES 2892 AND 2894:CORR.:HOECHST CELANESE CORPORATION TE SOMERVILLE CORRECTION TOPAMPHLET

V1 Lapsed because of non-payment of the annual fee