NL168954C - PROCESS FOR MANUFACTURING REPRODUCTIONS. - Google Patents

PROCESS FOR MANUFACTURING REPRODUCTIONS.

Info

Publication number
NL168954C
NL168954C NLAANVRAGE6913291,A NL6913291A NL168954C NL 168954 C NL168954 C NL 168954C NL 6913291 A NL6913291 A NL 6913291A NL 168954 C NL168954 C NL 168954C
Authority
NL
Netherlands
Prior art keywords
reproductions
manufacturing
manufacturing reproductions
Prior art date
Application number
NLAANVRAGE6913291,A
Other languages
Dutch (nl)
Other versions
NL168954B (en
NL6913291A (en
Original Assignee
Staley Mfg Co A E
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Staley Mfg Co A E filed Critical Staley Mfg Co A E
Publication of NL6913291A publication Critical patent/NL6913291A/xx
Publication of NL168954B publication Critical patent/NL168954B/en
Application granted granted Critical
Publication of NL168954C publication Critical patent/NL168954C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0525—Patterning by phototackifying or by photopatterning adhesive
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0562—Details of resist
    • H05K2203/0585—Second resist used as mask for selective stripping of first resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/13—Moulding and encapsulation; Deposition techniques; Protective layers
    • H05K2203/1333—Deposition techniques, e.g. coating
    • H05K2203/1355—Powder coating of insulating material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
NLAANVRAGE6913291,A 1969-02-05 1969-08-29 PROCESS FOR MANUFACTURING REPRODUCTIONS. NL168954C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US79684769A 1969-02-05 1969-02-05

Publications (3)

Publication Number Publication Date
NL6913291A NL6913291A (en) 1970-08-07
NL168954B NL168954B (en) 1981-12-16
NL168954C true NL168954C (en) 1982-05-17

Family

ID=25169217

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE6913291,A NL168954C (en) 1969-02-05 1969-08-29 PROCESS FOR MANUFACTURING REPRODUCTIONS.

Country Status (12)

Country Link
US (1) US3637385A (en)
JP (1) JPS4910699B1 (en)
BE (1) BE738204A (en)
BR (1) BR6911982D0 (en)
CA (1) CA932200A (en)
DE (1) DE1944311C3 (en)
ES (1) ES371051A1 (en)
FR (1) FR2030300A1 (en)
GB (1) GB1296709A (en)
IL (1) IL32856A0 (en)
LU (1) LU59383A1 (en)
NL (1) NL168954C (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3928039A (en) * 1970-03-13 1975-12-23 Ciba Geigy Ag Method for modifying vesicular images
US3676145A (en) * 1970-09-21 1972-07-11 Staley Mfg Co A E Predetermined chemical reactions in photographic imagewise configuration
US3676146A (en) * 1970-09-21 1972-07-11 Staley Mfg Co A E Controlling predetermined chemical reactions in photographic image-wise configuration
US3718466A (en) * 1971-07-12 1973-02-27 Staley Mfg Co A E Magnetic development
US4234626A (en) * 1978-02-01 1980-11-18 E. I. Du Pont De Nemours And Company Producing printed circuits by conjoining metal powder images
US4292394A (en) * 1978-11-13 1981-09-29 E. I. Du Pont De Nemours And Company Process for preparing multicolor toned images on a single photosensitive layer
US4304843A (en) * 1978-11-22 1981-12-08 E. I. Du Pont De Nemours And Company Dry toner with improved toning uniformity
US4215193A (en) * 1978-11-22 1980-07-29 E. I. Du Pont De Nemours And Company Dry toner process with improved toning uniformity for color developing an imaged tacky and nontacky surface
EP0022188B1 (en) * 1979-06-18 1984-10-03 EASTMAN KODAK COMPANY (a New Jersey corporation) Co-initiator compositions for photopolymerization containing 3-acyl-substituted coumarins, photopolymerizable composition and photographic element
US4355055A (en) * 1980-02-25 1982-10-19 E. I. Du Pont De Nemours And Company Use of prolonged tack toners for the preparation of multilayer electric circuits
US4303698A (en) * 1980-02-25 1981-12-01 E. I. Du Pont De Nemours And Company Use of prolonged tack toners for the preparation of electric circuits
US4460427A (en) * 1981-09-21 1984-07-17 E. I. Dupont De Nemours And Company Process for the preparation of flexible circuits
US4411980A (en) * 1981-09-21 1983-10-25 E. I. Du Pont De Nemours And Company Process for the preparation of flexible circuits
US4894314A (en) * 1986-11-12 1990-01-16 Morton Thiokol, Inc. Photoinitiator composition containing bis ketocoumarin dialkylamino benzoate, camphorquinone and/or a triphenylimidazolyl dimer
DE3913117A1 (en) * 1989-04-21 1990-10-25 Du Pont Deutschland METHOD FOR PRODUCING ELECTRICALLY CONDUCTIVE PATTERNS
US5204210A (en) * 1990-12-07 1993-04-20 Xerox Corporation Method for the direct patterning of diamond films
DE69114142T2 (en) * 1991-12-24 1996-04-18 Fenzi Spa Anti-corrosive formulation for the metallic coating on mirrors and the like and process for their production.
IT1254545B (en) * 1992-03-23 1995-09-25 FORMULATION FOR THE CORROSION PROTECTION OF METAL FILMS OF MIRRORS AND SIMILAR AND PRODUCTION PROCESS OF THE SAME
ID19337A (en) * 1996-12-26 1998-07-02 Ajinomoto Kk INTER-PLATIN ADHESIVE FILM FOR MANUFACTURING BOARDS OF MOLD PLATED CABLES AND MANY MOLD PLATE CABLES USING THIS FILM
EP1327642A4 (en) * 2000-09-20 2006-07-19 Taiyo Ink Mfg Co Ltd Carboxylated photosensitive resin, alkali-developable photocurable/heat-curable composition containing the same, and cured article obtained therefrom

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2445948A (en) * 1944-12-04 1948-07-27 Gen Mills Inc Hydroxyphosphatides
US3178283A (en) * 1961-05-04 1965-04-13 Gen Aniline & Film Corp Production of photographic polymeric images by heat development

Also Published As

Publication number Publication date
CA932200A (en) 1973-08-21
BR6911982D0 (en) 1973-01-18
IL32856A0 (en) 1969-11-12
NL168954B (en) 1981-12-16
BE738204A (en) 1970-03-02
DE1944311A1 (en) 1970-09-10
ES371051A1 (en) 1972-05-01
DE1944311B2 (en) 1975-03-06
FR2030300A1 (en) 1970-11-13
JPS4910699B1 (en) 1974-03-12
GB1296709A (en) 1972-11-15
US3637385A (en) 1972-01-25
LU59383A1 (en) 1970-01-09
DE1944311C3 (en) 1975-12-11
NL6913291A (en) 1970-08-07

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee