NL150528B - PROCEDURE FOR MANUFACTURE OF TWISTLESS OR ALMOST TWISTLESS YARN AND THE YARN OBTAINED BY USING THIS PROCESS. - Google Patents

PROCEDURE FOR MANUFACTURE OF TWISTLESS OR ALMOST TWISTLESS YARN AND THE YARN OBTAINED BY USING THIS PROCESS.

Info

Publication number
NL150528B
NL150528B NL747406030A NL150528DA NL150528B NL 150528 B NL150528 B NL 150528B NL 747406030 A NL747406030 A NL 747406030A NL 150528D A NL150528D A NL 150528DA NL 150528 B NL150528 B NL 150528B
Authority
NL
Netherlands
Prior art keywords
twistless
yarn
procedure
manufacture
yarn obtained
Prior art date
Application number
NL747406030A
Other languages
Dutch (nl)
Original Assignee
Hollandse Signaalapparaten Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL150528B publication Critical patent/NL150528B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Printing Plates And Materials Therefor (AREA)
NL747406030A 1949-05-14 PROCEDURE FOR MANUFACTURE OF TWISTLESS OR ALMOST TWISTLESS YARN AND THE YARN OBTAINED BY USING THIS PROCESS. NL150528B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEP42777A DE832546C (en) 1949-05-14 1949-05-14 Light-sensitive layers for reproduction technology

Publications (1)

Publication Number Publication Date
NL150528B true NL150528B (en)

Family

ID=7378888

Family Applications (1)

Application Number Title Priority Date Filing Date
NL747406030A NL150528B (en) 1949-05-14 PROCEDURE FOR MANUFACTURE OF TWISTLESS OR ALMOST TWISTLESS YARN AND THE YARN OBTAINED BY USING THIS PROCESS.

Country Status (5)

Country Link
US (1) US2687958A (en)
DE (1) DE832546C (en)
FR (1) FR1018953A (en)
GB (1) GB676665A (en)
NL (1) NL150528B (en)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE540601A (en) * 1950-12-06
US3003873A (en) * 1953-12-23 1961-10-10 Rca Corp Color kinescopes and methods of making the same
GB763288A (en) * 1954-06-16 1956-12-12 Kodak Ltd Improvements in photo mechanical processes and materials therefor
DE955928C (en) * 1954-06-18 1957-01-10 Kalle & Co Ag Process for the photomechanical production of metal printing forms using diazosulfonates as light-sensitive substances
DE949383C (en) * 1954-08-26 1956-09-20 Kalle & Co Ag Light-sensitive metal foil for the production of printing plates, which is made light-sensitive with diazosulfonates
US2852379A (en) * 1955-05-04 1958-09-16 Eastman Kodak Co Azide resin photolithographic composition
US2990281A (en) * 1956-12-17 1961-06-27 Monsanto Chemicals Photosensitive resinous compositions and photographic elements
BE571292A (en) * 1956-12-28
BE563723A (en) * 1957-01-04
US2996381A (en) * 1957-07-02 1961-08-15 Kalvar Corp Photographic materials and procedures for using same
NL103360C (en) * 1957-08-03 1962-07-16
US2982648A (en) * 1958-06-09 1961-05-02 Gen Aniline & Film Corp Process of producing a master plate for offset printing and the master plate so produced
NL256473A (en) * 1959-10-03
US3114651A (en) * 1960-07-22 1963-12-17 American Cyanamid Co Water insolubilization of acrylamido polymers with a salt of trivalent chromium
US3118765A (en) * 1960-08-26 1964-01-21 Litho Chemical And Supply Co I Lithographic product comprising lightsensitive diazido stilbene sulfonic acid salt
BE615056A (en) * 1961-03-15
US3227555A (en) * 1961-10-02 1966-01-04 Eastman Kodak Co Raw striping process for sonotrack dispersions
US3375113A (en) * 1962-09-21 1968-03-26 Scott Paper Co Sensitizing planographic plates for photo-lithography
US3255007A (en) * 1963-03-19 1966-06-07 Keuffel & Esser Co Diazotype reproduction materials
US3469981A (en) * 1963-03-19 1969-09-30 Keuffel & Esser Co Diazotype reproduction materials
US3287128A (en) * 1963-04-22 1966-11-22 Martin Mariatta Corp Lithographic plates and coatings
US3348948A (en) * 1964-03-11 1967-10-24 Litho Chemical & Supply Co Inc Presensitized deep etch lithographic plates
US3850646A (en) * 1970-03-24 1974-11-26 H Wagner Light sensitive photographic element
US3715210A (en) * 1971-02-19 1973-02-06 Howson Algraphy Ltd Lithographic printing plates
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition
US4131466A (en) * 1972-03-05 1978-12-26 Somar Manufacturing Co., Ltd. Photographic method of making relief member with negative dye image
JPS515935B2 (en) * 1972-04-17 1976-02-24
US3900325A (en) * 1972-06-12 1975-08-19 Shipley Co Light sensitive quinone diazide composition with n-3-oxohydrocarbon substituted acrylamide
US4194912A (en) * 1973-10-29 1980-03-25 Rca Corporation Water based photoresist
JPS51149021A (en) * 1974-12-28 1976-12-21 Fuji Yakuhin Kogyo Kk Water soluble photosensitive resin composition
US4211563A (en) * 1978-02-13 1980-07-08 Rca Corporation Aqueous photoresist of casein and N-methylol acrylamide
US4158566A (en) * 1978-02-13 1979-06-19 Rca Corporation Aqueous photoresist comprising casein and methylol acrylamide
JPS56101144A (en) * 1980-01-16 1981-08-13 Kimoto & Co Ltd Photosensitive material and its developing method
US4247615A (en) * 1980-03-06 1981-01-27 Eastman Kodak Company Continuous-tone dyed diazo imaging process
US4264706A (en) * 1980-03-12 1981-04-28 Eastman Kodak Company Dichromated hydrophilic colloid-latex copolymer compositions
JPH01128064A (en) * 1987-11-12 1989-05-19 Chisso Corp Photocurable resin composition

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE332468A (en) * 1922-11-18
US1628279A (en) * 1924-05-28 1927-05-10 Kalle & Co Ag Sensitive layer on alpha suitable base and process of making same
BE365001A (en) * 1928-11-03
US2184288A (en) * 1937-06-14 1939-12-26 Du Pont Photographic and printing media
BE447449A (en) * 1941-12-13
US2461023A (en) * 1944-10-25 1949-02-08 Gen Aniline & Film Corp Photographic silver halide emulsions
US2522771A (en) * 1944-11-03 1950-09-19 Gen Aniline & Film Corp Photographic silver halide emulsions

Also Published As

Publication number Publication date
FR1018953A (en) 1953-01-15
DE832546C (en) 1952-02-25
GB676665A (en) 1952-07-30
US2687958A (en) 1954-08-31

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