NL144090B - PHOTO MASK. - Google Patents
PHOTO MASK.Info
- Publication number
- NL144090B NL144090B NL6909925A NL6909925A NL144090B NL 144090 B NL144090 B NL 144090B NL 6909925 A NL6909925 A NL 6909925A NL 6909925 A NL6909925 A NL 6909925A NL 144090 B NL144090 B NL 144090B
- Authority
- NL
- Netherlands
- Prior art keywords
- photo mask
- photo
- mask
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US74220368A | 1968-07-03 | 1968-07-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
NL6909925A NL6909925A (en) | 1970-01-06 |
NL144090B true NL144090B (en) | 1974-11-15 |
Family
ID=24983884
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL6909925A NL144090B (en) | 1968-07-03 | 1969-06-27 | PHOTO MASK. |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS4919902B1 (en) |
BE (1) | BE735518A (en) |
DE (1) | DE1933034B2 (en) |
FR (1) | FR2012223A1 (en) |
GB (1) | GB1277037A (en) |
NL (1) | NL144090B (en) |
SE (1) | SE349874B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3815978A (en) * | 1972-06-20 | 1974-06-11 | Ibm | Durable see-through photoresist mask |
-
1969
- 1969-06-27 NL NL6909925A patent/NL144090B/en not_active IP Right Cessation
- 1969-06-27 SE SE918569A patent/SE349874B/xx unknown
- 1969-06-30 DE DE19691933034 patent/DE1933034B2/en active Pending
- 1969-07-02 BE BE735518D patent/BE735518A/xx not_active IP Right Cessation
- 1969-07-02 GB GB3341069A patent/GB1277037A/en not_active Expired
- 1969-07-02 JP JP5186469A patent/JPS4919902B1/ja active Pending
- 1969-07-02 FR FR6922330A patent/FR2012223A1/fr not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
FR2012223A1 (en) | 1970-03-13 |
NL6909925A (en) | 1970-01-06 |
DE1933034A1 (en) | 1970-02-05 |
JPS4919902B1 (en) | 1974-05-21 |
BE735518A (en) | 1969-12-16 |
DE1933034B2 (en) | 1971-06-24 |
GB1277037A (en) | 1972-06-07 |
SE349874B (en) | 1972-10-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
V1 | Lapsed because of non-payment of the annual fee | ||
NL80 | Abbreviated name of patent owner mentioned of already nullified patent |
Owner name: WESTERN ELECTRI |