NL140491B - Werkwijze ter bereiding van een mengsel dat siliciumtetrafluoride en waterdamp omvat. - Google Patents

Werkwijze ter bereiding van een mengsel dat siliciumtetrafluoride en waterdamp omvat.

Info

Publication number
NL140491B
NL140491B NL63302996A NL302996A NL140491B NL 140491 B NL140491 B NL 140491B NL 63302996 A NL63302996 A NL 63302996A NL 302996 A NL302996 A NL 302996A NL 140491 B NL140491 B NL 140491B
Authority
NL
Netherlands
Prior art keywords
preparing
water vapor
mixture containing
containing silicon
silicon tetrafluoride
Prior art date
Application number
NL63302996A
Other languages
English (en)
Original Assignee
Cities Service Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cities Service Co filed Critical Cities Service Co
Publication of NL140491B publication Critical patent/NL140491B/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C01B33/184—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane by hydrolysis of tetrafluoride
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/02—Amorphous compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Silicon Compounds (AREA)
NL63302996A 1963-01-17 1963-12-31 Werkwijze ter bereiding van een mengsel dat siliciumtetrafluoride en waterdamp omvat. NL140491B (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US252153A US3273963A (en) 1963-01-17 1963-01-17 Process for generating silicon tetrafluoride

Publications (1)

Publication Number Publication Date
NL140491B true NL140491B (nl) 1973-12-17

Family

ID=22954818

Family Applications (1)

Application Number Title Priority Date Filing Date
NL63302996A NL140491B (nl) 1963-01-17 1963-12-31 Werkwijze ter bereiding van een mengsel dat siliciumtetrafluoride en waterdamp omvat.

Country Status (4)

Country Link
US (1) US3273963A (nl)
DE (1) DE1442999B1 (nl)
GB (1) GB1009564A (nl)
NL (1) NL140491B (nl)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3369863A (en) * 1965-04-15 1968-02-20 Wellman Incandescent Furn Co Process for the manufacture of a fluosilicate of a metal
GB1151746A (en) * 1965-12-27 1969-05-14 Matsushita Electronics Corp A method for the Deposition of Silica Films
US3625749A (en) * 1966-04-06 1971-12-07 Matsushita Electronics Corp Method for deposition of silicon dioxide films
US3511603A (en) * 1967-12-27 1970-05-12 Ethyl Corp Preparation of hydrogen fluoride
US3520679A (en) * 1969-02-17 1970-07-14 Atomic Energy Commission Method for removing silica from siliceous materials
US3645684A (en) * 1970-07-01 1972-02-29 Cities Service Co Fractionation of silica aerosols
US3969485A (en) * 1971-10-28 1976-07-13 Flemmert Goesta Lennart Process for converting silicon-and-fluorine-containing waste gases into silicon dioxide and hydrogen fluoride
US4714604A (en) * 1986-08-13 1987-12-22 The Dow Chemical Company Method of separating HF and SiF4 from HCl
FR2820821B1 (fr) * 2001-02-13 2003-08-29 Soitec Silicon Insulator Techn Procede de dosage d'elements dans un substrat pour l'optique, l'electronique ou l'optoelectronique
DE102006061910A1 (de) * 2006-12-21 2008-06-26 I-Sol Ventures Gmbh Reinigung von Silica
BRPI0813442A8 (pt) * 2007-06-19 2015-12-01 Zakrytoe Aktsionernoe Obschestvo Solar Si Método para produção de silício policristalino a partir de uma solução de ácido hidrosilicofluorídrico, e instalação para produção de silício policristalino a partir de uma solução de ácido fluorosilícico na forma de um pó com partículas de formato esférico
KR101140076B1 (ko) * 2007-08-23 2012-04-30 오브스체스트보 에스 오그라니체노이 오트베츠트벤노스츄 ＇솔라르 씨＇ 다결정 실리콘 제조 방법
DE102013104398A1 (de) * 2013-04-30 2014-10-30 Spawnt Private S.À.R.L. Verfahren zur Herstellung von Siliziumtetrafluorid

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2535036A (en) * 1946-09-03 1950-12-26 Cabot Godfrey L Inc Manufacture of finely divided silica
US2631083A (en) * 1952-01-19 1953-03-10 Cabot Godfrey L Inc Production of calcium fluoride and silica
US2819151A (en) * 1954-03-02 1958-01-07 Flemmert Gosta Lennart Process for burning silicon fluorides to form silica
US2833628A (en) * 1954-06-09 1958-05-06 Grace W R & Co Manufacture of silicon tetrafluoride
US2861872A (en) * 1955-03-30 1958-11-25 Columbian Carbon Method for generating silicon tetrafluoride
DE1047756B (de) * 1956-02-07 1958-12-31 Cabot Godfrey L Inc Verfahren zur Herstellung von amorphem, feinteiligem Siliciumdioxyd
BE609721A (fr) * 1960-11-03 1962-02-15 Goesta Lennart Flemmert Méthode de récupération du bioxyde de silicium finement divisé obtenu en faisant réagir en phase gazeuse des composés de silicium et de fluor avec de l'eau

Also Published As

Publication number Publication date
DE1442999B1 (de) 1970-08-27
GB1009564A (en) 1965-11-10
US3273963A (en) 1966-09-20

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