NL138775B - Werkwijze ter bereiding van fijnverdeeld sio2 met een gemiddelde deeltjesdiameter van 2-200mmu door sif4 in de gasfase met stoom te hydrolyseren. - Google Patents

Werkwijze ter bereiding van fijnverdeeld sio2 met een gemiddelde deeltjesdiameter van 2-200mmu door sif4 in de gasfase met stoom te hydrolyseren.

Info

Publication number
NL138775B
NL138775B NL61271020A NL271020A NL138775B NL 138775 B NL138775 B NL 138775B NL 61271020 A NL61271020 A NL 61271020A NL 271020 A NL271020 A NL 271020A NL 138775 B NL138775 B NL 138775B
Authority
NL
Netherlands
Prior art keywords
200mmu
sif4
hydrolyzing
steam
preparation
Prior art date
Application number
NL61271020A
Other languages
English (en)
Dutch (nl)
Original Assignee
Flemmert Goesta Lennart
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Flemmert Goesta Lennart filed Critical Flemmert Goesta Lennart
Publication of NL138775B publication Critical patent/NL138775B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C01B33/184—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane by hydrolysis of tetrafluoride
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Silicon Compounds (AREA)
NL61271020A 1960-11-03 1961-11-03 Werkwijze ter bereiding van fijnverdeeld sio2 met een gemiddelde deeltjesdiameter van 2-200mmu door sif4 in de gasfase met stoom te hydrolyseren. NL138775B (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE1058360 1960-11-03

Publications (1)

Publication Number Publication Date
NL138775B true NL138775B (nl) 1973-05-15

Family

ID=20292553

Family Applications (1)

Application Number Title Priority Date Filing Date
NL61271020A NL138775B (nl) 1960-11-03 1961-11-03 Werkwijze ter bereiding van fijnverdeeld sio2 met een gemiddelde deeltjesdiameter van 2-200mmu door sif4 in de gasfase met stoom te hydrolyseren.

Country Status (5)

Country Link
US (1) US3203759A (fr)
BE (1) BE609721A (fr)
DE (1) DE1208741B (fr)
GB (1) GB935605A (fr)
NL (1) NL138775B (fr)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3273963A (en) * 1963-01-17 1966-09-20 Columbian Carbon Process for generating silicon tetrafluoride
GB1151746A (en) * 1965-12-27 1969-05-14 Matsushita Electronics Corp A method for the Deposition of Silica Films
US3625749A (en) * 1966-04-06 1971-12-07 Matsushita Electronics Corp Method for deposition of silicon dioxide films
US3661519A (en) * 1970-07-01 1972-05-09 Cities Service Co Hydrolysis of silicon tetrafluoride
US3645684A (en) * 1970-07-01 1972-02-29 Cities Service Co Fractionation of silica aerosols
US3969485A (en) * 1971-10-28 1976-07-13 Flemmert Goesta Lennart Process for converting silicon-and-fluorine-containing waste gases into silicon dioxide and hydrogen fluoride
US4036938A (en) * 1975-08-28 1977-07-19 Reed Richard S Production of high purity hydrogen fluoride from silicon tetrafluoride
US4151078A (en) * 1976-10-07 1979-04-24 The Dow Chemical Company Removing oil from water
SE431196B (sv) * 1980-12-12 1984-01-23 Flemmert Goesta Lennart Sett att genom hydrolys av kiseltetrafluorid i en laga framstella finfordelad kiseloxid
SE431197B (sv) * 1980-12-12 1984-01-23 Flemmert Goesta Lennart Sett att genom hydrolys av kiseltetrafluorid i en laga framstella hogaktiv kiseldioxid med en partikelstorlek av 5-50 nm
US5037557A (en) * 1989-09-12 1991-08-06 General Electric Company Treated silica for oil absorption
US6468490B1 (en) 2000-06-29 2002-10-22 Applied Materials, Inc. Abatement of fluorine gas from effluent
US6689252B1 (en) 1999-07-28 2004-02-10 Applied Materials, Inc. Abatement of hazardous gases in effluent
US6824748B2 (en) * 2001-06-01 2004-11-30 Applied Materials, Inc. Heated catalytic treatment of an effluent gas from a substrate fabrication process
US7569193B2 (en) 2003-12-19 2009-08-04 Applied Materials, Inc. Apparatus and method for controlled combustion of gaseous pollutants
US7736599B2 (en) 2004-11-12 2010-06-15 Applied Materials, Inc. Reactor design to reduce particle deposition during process abatement
WO2007053626A2 (fr) 2005-10-31 2007-05-10 Applied Materials, Inc. Reacteur de moderation de process
CN102234117B (zh) * 2010-05-05 2015-11-25 刘基扬 一种含可水解卤原子的物质的水解方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB535213A (en) * 1939-05-04 1941-04-02 Pittsburgh Plate Glass Co Preparation of titanium dioxide
US2437334A (en) * 1944-11-23 1948-03-09 Standard Oil Dev Co Controlling chemical reactions
US3130008A (en) * 1949-11-23 1964-04-21 Cabot Corp Method of preparing metallic oxides by hydrolysis of metallic halides
DE900339C (de) * 1951-07-05 1953-12-21 Degussa Verfahren und Vorrichtung zur Herstellung von kolloidaler Kieselsaeure in Aerogelform
US2631083A (en) * 1952-01-19 1953-03-10 Cabot Godfrey L Inc Production of calcium fluoride and silica
US2791490A (en) * 1952-04-29 1957-05-07 Du Pont Method and means for commingling and reacting fluid substances
US2819151A (en) * 1954-03-02 1958-01-07 Flemmert Gosta Lennart Process for burning silicon fluorides to form silica
DE1047756B (de) * 1956-02-07 1958-12-31 Cabot Godfrey L Inc Verfahren zur Herstellung von amorphem, feinteiligem Siliciumdioxyd
US3105742A (en) * 1960-03-16 1963-10-01 Pittsburgh Plate Glass Co Process for producing titanium oxide pigments

Also Published As

Publication number Publication date
GB935605A (en) 1963-08-28
BE609721A (fr) 1962-02-15
US3203759A (en) 1965-08-31
DE1208741B (de) 1966-01-13

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Legal Events

Date Code Title Description
NL80 Information provided on patent owner name for an already discontinued patent

Owner name: FLEMMERT

V4 Discontinued because of reaching the maximum lifetime of a patent