NL130248C - - Google Patents

Info

Publication number
NL130248C
NL130248C NL130248DA NL130248C NL 130248 C NL130248 C NL 130248C NL 130248D A NL130248D A NL 130248DA NL 130248 C NL130248 C NL 130248C
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL130248C publication Critical patent/NL130248C/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/71—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
NL130248D 1959-01-21 NL130248C (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK36769A DE1118606B (de) 1959-01-21 1959-01-21 Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen

Publications (1)

Publication Number Publication Date
NL130248C true NL130248C (pt)

Family

ID=7220794

Family Applications (2)

Application Number Title Priority Date Filing Date
NL130248D NL130248C (pt) 1959-01-21
NL247588D NL247588A (pt) 1959-01-21

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL247588D NL247588A (pt) 1959-01-21

Country Status (7)

Country Link
US (2) US3184310A (pt)
BE (1) BE586713A (pt)
CH (1) CH390053A (pt)
DE (1) DE1118606B (pt)
FR (1) FR1260028A (pt)
GB (1) GB935250A (pt)
NL (2) NL247588A (pt)

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DE3127754A1 (de) * 1981-07-14 1983-02-03 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
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JPS62123444A (ja) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
US4737437A (en) * 1986-03-27 1988-04-12 East Shore Chemical Co. Light sensitive diazo compound, composition and method of making the composition
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JP2552891B2 (ja) * 1988-01-26 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5290656A (en) * 1988-05-07 1994-03-01 Sumitomo Chemical Company, Limited Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound
JP2552900B2 (ja) * 1988-06-07 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5861229A (en) * 1988-07-07 1999-01-19 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound
CA1337626C (en) * 1988-07-07 1995-11-28 Haruyoshi Osaki Radiation-sensitive positive resist composition
US5456995A (en) * 1988-07-07 1995-10-10 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition
JP2715480B2 (ja) * 1988-10-13 1998-02-18 住友化学工業株式会社 ポジ型レジスト用組成物
EP0384892A1 (de) * 1989-02-23 1990-08-29 Ciba-Geigy Ag Photoresist-Zusammensetzungen
US5200293A (en) * 1989-02-23 1993-04-06 Ciba-Geigy Corporation Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound
JPH087433B2 (ja) * 1989-04-19 1996-01-29 日本ゼオン株式会社 ポジ型レジスト組成物
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US5256521A (en) * 1989-09-19 1993-10-26 Ocg Microelectronic Materials, Inc. Process of developing a positive pattern in an O-quinone diazide photoresist containing a tris-(hydroxyphenyl) lower alkane compound sensitivity enhancer
US5215856A (en) * 1989-09-19 1993-06-01 Ocg Microelectronic Materials, Inc. Tris-(hydroxyphenyl) lower alkane compounds as sensitivity enhancers for o-quinonediazide containing radiation-sensitive compositions and elements
JP2571136B2 (ja) * 1989-11-17 1997-01-16 日本ゼオン株式会社 ポジ型レジスト組成物
JPH061377B2 (ja) * 1989-12-28 1994-01-05 日本ゼオン株式会社 ポジ型レジスト組成物
DE4134526A1 (de) * 1990-10-18 1992-05-14 Toyo Gosei Kogyo Kk Positive photoresist-zusammensetzung und mustererzeugungsverfahren unter verwendung dieser zusammensetzung
US5300396A (en) * 1990-11-28 1994-04-05 Hoechst Celanese Corporation Process of making naphthoquinone diazide esters using lactone solvents
US5260162A (en) * 1990-12-17 1993-11-09 Khanna Dinesh N Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers
EP0525185B1 (en) * 1991-01-11 1997-07-16 Sumitomo Chemical Company Limited Positive resist composition
DE4137325A1 (de) * 1991-11-13 1993-05-19 Hoechst Ag Lichtempfindliches gemisch auf der basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches material
US5362599A (en) * 1991-11-14 1994-11-08 International Business Machines Corporations Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds
JP3391471B2 (ja) * 1992-02-25 2003-03-31 住友化学工業株式会社 ポジ型レジスト組成物
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JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
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JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
JP3278306B2 (ja) 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
US5618932A (en) * 1995-05-24 1997-04-08 Shipley Company, L.L.C. Photoactive compounds and compositions
US5514515A (en) * 1995-05-24 1996-05-07 Shipley Company, L.L.C. Photoactive compounds having a heterocyclic group used in photoresist compositions
US7285422B1 (en) 1997-01-23 2007-10-23 Sequenom, Inc. Systems and methods for preparing and analyzing low volume analyte array elements
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JP4219435B2 (ja) * 1997-12-15 2009-02-04 東京応化工業株式会社 ポリフェノールジエステル化物の製造方法およびポジ型感光性組成物
JP4179579B2 (ja) * 2000-05-08 2008-11-12 東洋合成工業株式会社 １，２−ナフトキノンジアジド系感光剤の製造方法
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JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP2007070694A (ja) * 2005-09-07 2007-03-22 Konica Minolta Medical & Graphic Inc 帯状アルミニウム板の陽極酸化処理方法、平版印刷版材料用支持体及び陽極酸化処理装置
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JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
CN101855026A (zh) 2007-11-14 2010-10-06 富士胶片株式会社 干燥涂布膜的方法和制造平版印刷版前体的方法
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
EP2302456B1 (en) * 2008-07-16 2015-09-02 Nissan Chemical Industries, Ltd. Positive resist composition;patttern forming method; microlens and planarization film therefrom; solid-state imaging device, liquid crystal display device and led display device comprising the same
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
KR101146622B1 (ko) * 2009-08-31 2012-05-16 금호석유화학 주식회사 감광성 화합물 및 이를 포함하는 감광성 조성물
CN105082725B (zh) 2009-09-24 2018-05-04 富士胶片株式会社 平版印刷版原版
US8608878B2 (en) * 2010-09-08 2013-12-17 Ensign-Bickford Aerospace & Defense Company Slow burning heat generating structure
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB537952A (en) * 1940-01-03 1941-07-14 Eastman Kodak Co Improvements in and relating to colour-forming developers and processes of colour development
NL78797C (pt) * 1949-07-23
BE508016A (pt) * 1950-12-23
AT182606B (de) * 1951-04-13 1955-07-25 Hans Dr Ing Deckel Photographischer Objektivveschluß mit einem Blitzlicht-Gleichstimmer
BE526866A (pt) * 1953-03-11
BE539176A (pt) * 1954-09-08

Also Published As

Publication number Publication date
US3184310A (en) 1965-05-18
BE586713A (pt)
DE1118606B (de) 1961-11-30
US3188210A (en) 1965-06-08
NL247588A (pt)
GB935250A (en) 1963-08-28
CH390053A (de) 1965-03-31
FR1260028A (fr) 1961-05-05

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