NL1036331A1 - Metrology apparatus, lithographic apparatus and method of measuring a property or a substrate. - Google Patents

Metrology apparatus, lithographic apparatus and method of measuring a property or a substrate. Download PDF

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Publication number
NL1036331A1
NL1036331A1 NL1036331A NL1036331A NL1036331A1 NL 1036331 A1 NL1036331 A1 NL 1036331A1 NL 1036331 A NL1036331 A NL 1036331A NL 1036331 A NL1036331 A NL 1036331A NL 1036331 A1 NL1036331 A1 NL 1036331A1
Authority
NL
Netherlands
Prior art keywords
substrate
property
radiation
metrology apparatus
measuring
Prior art date
Application number
NL1036331A
Other languages
Dutch (nl)
Inventor
Karel Diederick Van Der Mast
Nicolaas Antonius Allegondus Johannes Van Asten
Arie Jeffrey Den Boef
Marcus Adrianus Van De Kerkhof
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL1036331A1 publication Critical patent/NL1036331A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

A metrology apparatus is configured to measure a property of a substrate. The metrology apparatus includes an illumination system configured to condition a radiation beam, an objective lens configured to project radiation onto the substrate, a detector configured to detect radiation reflected from a surface of the substrate, and an image field selecting device in the path of the reflected radiation constructed and arranged to select an area of an image field associated with the substrate. The selected area corresponds with a predetermined portion of the substrate. The arrangement may enable selection of different shapes and sizes of targets on the substrate and may enable in-die measurement of selected parameters.
NL1036331A 2007-12-27 2008-12-18 Metrology apparatus, lithographic apparatus and method of measuring a property or a substrate. NL1036331A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US919207P 2007-12-27 2007-12-27

Publications (1)

Publication Number Publication Date
NL1036331A1 true NL1036331A1 (en) 2009-06-30

Family

ID=40433754

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1036331A NL1036331A1 (en) 2007-12-27 2008-12-18 Metrology apparatus, lithographic apparatus and method of measuring a property or a substrate.

Country Status (2)

Country Link
NL (1) NL1036331A1 (en)
TW (1) TWI398739B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114324258B (en) * 2021-12-28 2023-07-18 中国科学院光电技术研究所 Device and method for measuring photoresist characteristic parameters

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1209526B1 (en) * 2000-11-23 2004-09-15 ASML Netherlands B.V. Lithographic apparatus and integrated circuit device manufacturing method
JP4057937B2 (en) * 2003-03-25 2008-03-05 富士フイルム株式会社 Exposure equipment
US7230703B2 (en) * 2003-07-17 2007-06-12 Tokyo Electron Limited Apparatus and method for measuring overlay by diffraction gratings
US7791727B2 (en) * 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization

Also Published As

Publication number Publication date
TWI398739B (en) 2013-06-11
TW200935192A (en) 2009-08-16

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AD1A A request for search or an international type search has been filed