NL1032881A1 - Optisch monsterkarakteriseringssysteem. - Google Patents
Optisch monsterkarakteriseringssysteem.Info
- Publication number
- NL1032881A1 NL1032881A1 NL1032881A NL1032881A NL1032881A1 NL 1032881 A1 NL1032881 A1 NL 1032881A1 NL 1032881 A NL1032881 A NL 1032881A NL 1032881 A NL1032881 A NL 1032881A NL 1032881 A1 NL1032881 A1 NL 1032881A1
- Authority
- NL
- Netherlands
- Prior art keywords
- characterization system
- optical sample
- sample characterization
- optical
- sample
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
- G01B11/2513—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object with several lines being projected in more than one direction, e.g. grids, patterns
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4788—Diffraction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
- G01N2021/95615—Inspecting patterns on the surface of objects using a comparative method with stored comparision signal
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/291,246 US7440094B2 (en) | 2005-11-30 | 2005-11-30 | Optical sample characterization system |
US29124605 | 2005-11-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
NL1032881A1 true NL1032881A1 (nl) | 2007-05-31 |
NL1032881C2 NL1032881C2 (nl) | 2008-06-10 |
Family
ID=38087102
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL1032881A NL1032881C2 (nl) | 2005-11-30 | 2006-11-16 | Optisch monsterkarakteriseringssysteem. |
Country Status (5)
Country | Link |
---|---|
US (1) | US7440094B2 (nl) |
JP (1) | JP2007155721A (nl) |
KR (1) | KR20070056947A (nl) |
DE (1) | DE102006053794A1 (nl) |
NL (1) | NL1032881C2 (nl) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007023500A2 (en) * | 2005-08-26 | 2007-03-01 | Camtek Ltd. | Device and method for inspecting an object |
US20090157426A1 (en) * | 2007-12-12 | 2009-06-18 | Mckesson Financial Holdings Limited | Methods, apparatuses & computer program products for facilitating efficient distribution of data within a system |
US20100197508A1 (en) * | 2009-02-03 | 2010-08-05 | The Administrator of the National Aeronautics and Space Administration, United States of America | Integrated Universal Chemical Detector with Selective Diffraction Array |
US20110066446A1 (en) * | 2009-09-15 | 2011-03-17 | Arien Malec | Method, apparatus and computer program product for providing a distributed registration manager |
US20110218819A1 (en) * | 2010-03-02 | 2011-09-08 | Mckesson Financial Holdings Limited | Method, apparatus and computer program product for providing a distributed care planning tool |
US8805900B2 (en) | 2012-03-30 | 2014-08-12 | Mckesson Financial Holdings | Methods, apparatuses and computer program products for facilitating location and retrieval of health information in a healthcare system |
US20140152804A1 (en) * | 2012-12-05 | 2014-06-05 | Seagate Technology Llc | Sub-pixel imaging for enhanced pixel resolution |
US10510440B1 (en) | 2013-08-15 | 2019-12-17 | Change Healthcare Holdings, Llc | Method and apparatus for identifying matching record candidates |
US11114185B1 (en) | 2013-08-20 | 2021-09-07 | Change Healthcare Holdings, Llc | Method and apparatus for defining a level of assurance in a link between patient records |
JP6065875B2 (ja) * | 2014-06-02 | 2017-01-25 | 横河電機株式会社 | 偏光検査装置 |
JP6476617B2 (ja) * | 2014-07-04 | 2019-03-06 | 株式会社Sumco | 半導体基板表面の有機物汚染評価方法およびその利用 |
KR102272697B1 (ko) * | 2014-07-24 | 2021-07-02 | 삼성전자주식회사 | 분광 타원편광 측정 시스템과 방법 및 데이터 분석 장치와 방법 |
EP3502615A1 (en) | 2017-12-21 | 2019-06-26 | EpiGan NV | A wafer surface curvature determining system |
CN115356022B (zh) * | 2022-08-11 | 2023-10-20 | 无锡卓海科技股份有限公司 | 一种基于白光光源的薄膜应力测量装置及方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5410259B2 (nl) * | 1973-03-30 | 1979-05-02 | ||
US3879131A (en) * | 1974-02-06 | 1975-04-22 | Bell Telephone Labor Inc | Photomask inspection by real time diffraction pattern analysis |
JPS5953483B2 (ja) | 1978-01-27 | 1984-12-25 | 超エル・エス・アイ技術研究組合 | 鏡面の変形分布測定装置 |
US5264912A (en) * | 1992-02-07 | 1993-11-23 | Tencor Instruments | Speckle reduction track filter apparatus for optical inspection of patterned substrates |
US5361137A (en) * | 1992-08-31 | 1994-11-01 | Texas Instruments Incorporated | Process control for submicron linewidth measurement |
JPH10239038A (ja) * | 1997-02-26 | 1998-09-11 | Nikon Corp | 表面状態検査装置 |
US6512578B1 (en) | 1997-07-10 | 2003-01-28 | Nikon Corporation | Method and apparatus for surface inspection |
US6137570A (en) | 1998-06-30 | 2000-10-24 | Kla-Tencor Corporation | System and method for analyzing topological features on a surface |
US7317531B2 (en) | 2002-12-05 | 2008-01-08 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
JP4230674B2 (ja) | 2001-03-01 | 2009-02-25 | 株式会社日立製作所 | 欠陥検査装置およびその方法 |
US6864971B2 (en) * | 2001-03-27 | 2005-03-08 | Isoa, Inc. | System and method for performing optical inspection utilizing diffracted light |
JP3971943B2 (ja) * | 2002-03-26 | 2007-09-05 | アイエスオーエー、 インク | 光学的検査方法及び光学的検査システム |
-
2005
- 2005-11-30 US US11/291,246 patent/US7440094B2/en not_active Expired - Fee Related
-
2006
- 2006-11-15 DE DE102006053794A patent/DE102006053794A1/de not_active Withdrawn
- 2006-11-16 KR KR1020060113184A patent/KR20070056947A/ko not_active Application Discontinuation
- 2006-11-16 NL NL1032881A patent/NL1032881C2/nl not_active IP Right Cessation
- 2006-11-29 JP JP2006322234A patent/JP2007155721A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
NL1032881C2 (nl) | 2008-06-10 |
DE102006053794A1 (de) | 2007-08-02 |
KR20070056947A (ko) | 2007-06-04 |
US20070121105A1 (en) | 2007-05-31 |
JP2007155721A (ja) | 2007-06-21 |
US7440094B2 (en) | 2008-10-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AD1A | A request for search or an international type search has been filed | ||
RD2N | Patents in respect of which a decision has been taken or a report has been made (novelty report) |
Effective date: 20080207 |
|
PD2B | A search report has been drawn up | ||
V1 | Lapsed because of non-payment of the annual fee |
Effective date: 20100601 |