NL1032792A1 - Optische interferometer. - Google Patents

Optische interferometer.

Info

Publication number
NL1032792A1
NL1032792A1 NL1032792A NL1032792A NL1032792A1 NL 1032792 A1 NL1032792 A1 NL 1032792A1 NL 1032792 A NL1032792 A NL 1032792A NL 1032792 A NL1032792 A NL 1032792A NL 1032792 A1 NL1032792 A1 NL 1032792A1
Authority
NL
Netherlands
Prior art keywords
optical interferometer
interferometer
optical
Prior art date
Application number
NL1032792A
Other languages
English (en)
Other versions
NL1032792C2 (nl
Inventor
Greg C Felix
John Bockman
Original Assignee
Agilent Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agilent Technologies Inc filed Critical Agilent Technologies Inc
Publication of NL1032792A1 publication Critical patent/NL1032792A1/nl
Priority to NL1035300A priority Critical patent/NL1035300C/nl
Application granted granted Critical
Publication of NL1032792C2 publication Critical patent/NL1032792C2/nl

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02049—Interferometers characterised by particular mechanical design details
    • G01B9/02051—Integrated design, e.g. on-chip or monolithic
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/15—Cat eye, i.e. reflection always parallel to incoming beam
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer
NL1032792A 2005-11-03 2006-11-01 Optische interferometer. NL1032792C2 (nl)

Priority Applications (1)

Application Number Priority Date Filing Date Title
NL1035300A NL1035300C (nl) 2005-11-03 2008-04-16 Optische interferometer.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/266,542 US20070109552A1 (en) 2005-11-03 2005-11-03 Optical interferometer
US26654205 2005-11-03

Publications (2)

Publication Number Publication Date
NL1032792A1 true NL1032792A1 (nl) 2007-05-10
NL1032792C2 NL1032792C2 (nl) 2008-04-25

Family

ID=37982787

Family Applications (2)

Application Number Title Priority Date Filing Date
NL1032792A NL1032792C2 (nl) 2005-11-03 2006-11-01 Optische interferometer.
NL1035300A NL1035300C (nl) 2005-11-03 2008-04-16 Optische interferometer.

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL1035300A NL1035300C (nl) 2005-11-03 2008-04-16 Optische interferometer.

Country Status (5)

Country Link
US (1) US20070109552A1 (nl)
JP (1) JP2007127643A (nl)
CN (1) CN1959336A (nl)
DE (1) DE102006032267A1 (nl)
NL (2) NL1032792C2 (nl)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8149494B1 (en) 2007-09-07 2012-04-03 The United States Of America As Represented By The Secretary Of The Navy Two-photon absorption switch having which-path exclusion and monolithic mach-zehnder interferometer
WO2019009399A1 (ja) 2017-07-06 2019-01-10 浜松ホトニクス株式会社 ミラーユニット及び光モジュール
FR3089019B1 (fr) * 2018-11-23 2021-02-19 Kylia Dispositif de ligne à retard optique fixe ou variable
CN112666137A (zh) * 2020-12-02 2021-04-16 中国科学院合肥物质科学研究院 一种基于fp干涉仪的lif测量荧光信号窄带滤光系统及方法
US11906770B2 (en) * 2021-10-21 2024-02-20 KLA Corporal Monolithic optical retarder
CN114545645B (zh) * 2022-02-28 2023-09-26 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） 一种潜望式集成光路的装调方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB778782A (en) * 1954-10-06 1957-07-10 Ass Elect Ind Improvements in optical apparatus for examining transparent objects by interferometry
US4987567A (en) * 1988-11-21 1991-01-22 Gte Laboratories Incorporated Optical wavelength multiplexer/demultiplexer and demultiplexer/remultiplexer
US7139080B2 (en) * 1998-09-18 2006-11-21 Zygo Corporation Interferometry systems involving a dynamic beam-steering assembly
US7224466B2 (en) * 2003-02-05 2007-05-29 Agilent Technologies, Inc. Compact multi-axis interferometer
US7317539B2 (en) * 2004-08-23 2008-01-08 Asml Netherlands B.V. Polarizing beam splitter device, interferometer module, lithographic apparatus, and device manufacturing method
US7330493B2 (en) * 2005-06-01 2008-02-12 Pavilion Integration Corporation Method, apparatus and module using single laser diode for simultaneous pump of two gain media characteristic of polarization dependent absorption

Also Published As

Publication number Publication date
NL1032792C2 (nl) 2008-04-25
CN1959336A (zh) 2007-05-09
NL1035300A1 (nl) 2008-06-12
US20070109552A1 (en) 2007-05-17
NL1035300C (nl) 2010-03-09
JP2007127643A (ja) 2007-05-24
DE102006032267A1 (de) 2007-05-16

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Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20071221

PD2B A search report has been drawn up
V1 Lapsed because of non-payment of the annual fee

Effective date: 20100601