MY185671A - Rure-containing sputtering target, rure-containing layer, and method of preparing the same - Google Patents
Rure-containing sputtering target, rure-containing layer, and method of preparing the sameInfo
- Publication number
- MY185671A MY185671A MYPI2018001993A MYPI2018001993A MY185671A MY 185671 A MY185671 A MY 185671A MY PI2018001993 A MYPI2018001993 A MY PI2018001993A MY PI2018001993 A MYPI2018001993 A MY PI2018001993A MY 185671 A MY185671 A MY 185671A
- Authority
- MY
- Malaysia
- Prior art keywords
- rure
- sputtering target
- preparing
- same
- containing layer
- Prior art date
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Powder Metallurgy (AREA)
- Magnetic Record Carriers (AREA)
Abstract
The present invention includes a RuRe-containing sputtering target, a RuRe- containing layer and a method of preparing the same. The RuRe-containing sputtering target comprises ruthenium, rhenium, and carbon. Based on a total amount of the RuRe-containing sputtering target, an amount of rhenium is from 0.1 wt % to 45 wt%, an amount of carbon is from 0.003 wt% to 0.01 wt%, and an amount of ruthenium is the rest. By controlling the composition of the RuRe-containing sputtering target, the composition of a RuRe-containing layer formed by the RuRe-containing sputtering target can be controlled. Therefore, the present invention can accomplish the objects of promoting the crystallinity of the ruthenium (002) and refining the crystal grain. (Figure 1A)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106146026A TWI663264B (en) | 2017-12-27 | 2017-12-27 | Rure-containing sputtering target, rure-containing membrane, and method of preparing the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY185671A true MY185671A (en) | 2021-05-29 |
Family
ID=67304100
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2018001993A MY185671A (en) | 2017-12-27 | 2018-11-19 | Rure-containing sputtering target, rure-containing layer, and method of preparing the same |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6657355B2 (en) |
| MY (1) | MY185671A (en) |
| TW (1) | TWI663264B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113084150B (en) * | 2021-03-24 | 2023-08-25 | 河南东微电子材料有限公司 | Preparation method of ruthenium cobalt rhenium alloy powder |
-
2017
- 2017-12-27 TW TW106146026A patent/TWI663264B/en active
-
2018
- 2018-10-15 JP JP2018194196A patent/JP6657355B2/en active Active
- 2018-11-19 MY MYPI2018001993A patent/MY185671A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP6657355B2 (en) | 2020-03-04 |
| TW201928082A (en) | 2019-07-16 |
| JP2019116682A (en) | 2019-07-18 |
| TWI663264B (en) | 2019-06-21 |
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