MY141430A - Laser lithography light source with beam delivery - Google Patents
Laser lithography light source with beam deliveryInfo
- Publication number
- MY141430A MY141430A MYPI20023233A MY141430A MY 141430 A MY141430 A MY 141430A MY PI20023233 A MYPI20023233 A MY PI20023233A MY 141430 A MY141430 A MY 141430A
- Authority
- MY
- Malaysia
- Prior art keywords
- production line
- laser
- line machine
- light source
- lithography
- Prior art date
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
THE PRESENT INVENTION PROVIDES A MODULAR HIGH REPETITION RATE ULTRAVIOLET GAS DISCHARGE LASER LIGHT SOURCE FOR A PRODUCTION LINE MACHINE. THE SYSTEM INCLUDES AN ENCLOSED AND PURGED BEAM PATH FOR DELIVERY THE LASER BEAM TO A DESIRED LOCATION SUCH AS THE ENTRANCE PORT OF THE PRODUCTION LINE MACHINE. IN PREFERRED EMBODIMENTS, THE PRODUCTION LINE MACHINE IS A LITHOGRAPHY MACHINE AND TWO SEPARATE DISCHARGE CHAMBERS ARE PROVIDED, ONE OF WHICH IS A PART OF A MASTER OSCILLATOR PRODUCING A VERY NARROW BAND SEED BEAM WHICH IS AMPLIFIED IN THE SECOND DISCHARGE CHAMBER. THIS MOPA SYSTEM IS CAPABLE OF OUTPUT PULSE ENERGIES APPROXIMATELY DOUBLE THE COMPARABLE SINGLE CHAMBER LASER SYSTEM WITH GREATLY IMPROVED BEAM QUALITY. A PULSE STRETCHER MORE THAN DOUBLES THE OUTPUT PULSE LENGTH RESULTING IN A REDUCTION IN PULSE POWER (MJ/NS) AS COMPARED TO PRIOR ART LASER SYSTEMS. THIS PREFERRED EMBODIMENT IS CAPABLE OF PROVIDING ILLUMINATION AT A LITHOGRAPHY SYSTEM WAFER PLANE WHICH IS APPROXIMATELY CONSTANT THROUGHOUT THE OPERATING LIFE OF THE LITHOGRAPHY SYSTEM, DESPITE SUBSTANTIAL DEGRADATION OF OPTICAL COMPONENTS.
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/943,343 US6567450B2 (en) | 1999-12-10 | 2001-08-29 | Very narrow band, two chamber, high rep rate gas discharge laser system |
US10/000,991 US6795474B2 (en) | 2000-11-17 | 2001-11-14 | Gas discharge laser with improved beam path |
US10/006,913 US6535531B1 (en) | 2001-11-29 | 2001-11-29 | Gas discharge laser with pulse multiplier |
US10/036,727 US6865210B2 (en) | 2001-05-03 | 2001-12-21 | Timing control for two-chamber gas discharge laser system |
US10/036,676 US6882674B2 (en) | 1999-12-27 | 2001-12-21 | Four KHz gas discharge laser system |
US10/141,216 US6693939B2 (en) | 2001-01-29 | 2002-05-07 | Laser lithography light source with beam delivery |
Publications (1)
Publication Number | Publication Date |
---|---|
MY141430A true MY141430A (en) | 2010-04-30 |
Family
ID=44256721
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI20023233 MY141430A (en) | 2001-08-29 | 2002-08-29 | Laser lithography light source with beam delivery |
Country Status (1)
Country | Link |
---|---|
MY (1) | MY141430A (en) |
-
2002
- 2002-08-29 MY MYPI20023233 patent/MY141430A/en unknown
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