MY136595A - Very narrow band,two chamber, high rep rate gas discharge laser system - Google Patents
Very narrow band,two chamber, high rep rate gas discharge laser systemInfo
- Publication number
- MY136595A MY136595A MYPI20023234A MY136595A MY 136595 A MY136595 A MY 136595A MY PI20023234 A MYPI20023234 A MY PI20023234A MY 136595 A MY136595 A MY 136595A
- Authority
- MY
- Malaysia
- Prior art keywords
- pulse
- chamber
- laser system
- discharge
- master oscillator
- Prior art date
Links
Landscapes
- Lasers (AREA)
Abstract
AN INJECTION SEEDED MODULAR GAS DISCHARGE LASER SYSTEM CAPABLE OF PRODUCING HIGH QUALITY PULSED LASER BEAMS AT PULSE RATES OF ABOUT 4,000 HZ OR GREATER AND AT PULSE ENERGIES OF ABOUT 5MJ OR GREATER. TWO SEPARATE DISCHARGE CHAMBERS ARE PROVIDED, ONE OF WHICH IS A PART OF A MASTER OSCILLATOR (10) PRODUCING A VERY NARROW BAND SEED BEAM WHICH IS AMPLIFIED IN THE SECOND DISCHARGE CHAMBER. THE CHAMBERS CAN BE CONTROLLED SEPARATELY PERMITTING SEPARATE OPTIMIZATION OF WAVELENGTH PARAMETERS IN THE MASTER OSCILLATOR (10) AND OPTIMIZATION OF PULSE ENERGY PARAMETERS IN THE AMPLIFYING CHAMBER (12). A PREFERRED EMBODIMENT IN AN ARF EXCIMER LASER SYSTEM CONFIGURED AS A MOPA AND SPECIFICALLY DESIGNED FOR USE AS A LIGHT SOURCE FOR INTERGRATED CIRCUIT LITHOGRAPHY. IN THE PREFERRED MOPA EMBODIMENT, EACH CHAMBER COMPRISES A SINGLE TANGENTIAL FAN PROVIDING SUFFICIENT GAS FLOW TO PERMIT OPERATION AT PULSE RATES OF 4000 HZ OR GREATER BY CLEARING DEBRIS FROM THE DISCHARGE REGION IN LESS TIME THAN THE APPROXIMATELY 0.25MILLISECONDS BETWEEN PULSES. THE MASTER OSCILLATOR (10) IS EQUIPPED WITH A LINE NARROWING PACKAGE HAVING A VERY FAST TUNING MIRROR CAPABLE OF CONTROLLING CENTERLINE WAVELENGHT ON A PULSE-TO-PULSE BASIS AT REPETITION RATES OF 4000 HZ OR GREATER TO A PRECISION OF LESS THAN 0.2 PM.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/943,343 US6567450B2 (en) | 1999-12-10 | 2001-08-29 | Very narrow band, two chamber, high rep rate gas discharge laser system |
US10/006,913 US6535531B1 (en) | 2001-11-29 | 2001-11-29 | Gas discharge laser with pulse multiplier |
US10/012,002 US6625191B2 (en) | 1999-12-10 | 2001-11-30 | Very narrow band, two chamber, high rep rate gas discharge laser system |
Publications (1)
Publication Number | Publication Date |
---|---|
MY136595A true MY136595A (en) | 2008-10-31 |
Family
ID=41795371
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI20023234 MY136595A (en) | 2001-08-29 | 2002-08-29 | Very narrow band,two chamber, high rep rate gas discharge laser system |
Country Status (3)
Country | Link |
---|---|
AT (1) | ATE459117T1 (en) |
DE (1) | DE60235480D1 (en) |
MY (1) | MY136595A (en) |
-
2002
- 2002-08-28 AT AT02797839T patent/ATE459117T1/en not_active IP Right Cessation
- 2002-08-28 DE DE60235480T patent/DE60235480D1/en not_active Expired - Lifetime
- 2002-08-29 MY MYPI20023234 patent/MY136595A/en unknown
Also Published As
Publication number | Publication date |
---|---|
DE60235480D1 (en) | 2010-04-08 |
ATE459117T1 (en) | 2010-03-15 |
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