MY130862A - Preparation of fractionated novolak resins by a novel extraction technique - Google Patents

Preparation of fractionated novolak resins by a novel extraction technique

Info

Publication number
MY130862A
MY130862A MYPI99004871A MYPI9904871A MY130862A MY 130862 A MY130862 A MY 130862A MY PI99004871 A MYPI99004871 A MY PI99004871A MY PI9904871 A MYPI9904871 A MY PI9904871A MY 130862 A MY130862 A MY 130862A
Authority
MY
Malaysia
Prior art keywords
solvent
water
soluble organic
alkane
water soluble
Prior art date
Application number
MYPI99004871A
Inventor
Stanley F Wanat
M Dalil Rahman
John J Kokoszka
Balaji Narasimhan
Original Assignee
Az Electronic Materials Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Az Electronic Materials Japan filed Critical Az Electronic Materials Japan
Publication of MY130862A publication Critical patent/MY130862A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)

Abstract

THE PRESENT INVENTION PROVIDES A PROCESS FOR PRODUCING A FILM FORMING NOVOLAK RESIN, WHICH PROCESS COMPRISES: A) CONDENSING FORMALDEHYDE, PARA FORMALDEHYDE OR FORMALIN WITH ONE OR MORE PHENOLIC COMPOUNDS, IN THE PRESENCE OF AN ACID CATALYST AND THEREBY PRODUCING A NOVOLAK RESIN; B) ADDING A WATER SOLUBLE ORGANIC POLAR SOLVENT AND A PHOTORESIST SOLVENT TO THE NOVOLAK RESIN REACTION MIXTURE FROM STEP A), AT A RATIO OF PHOTORESIST SOLVENT TO WATER SOLUBLE ORGANIC POLAR SOLVENT OF FROM ABOUT 10/90 TO 70/30; C) FEEDING THE MIXTURE FROM STEP B) INTO A LIQUID/LIQUID CENTRIFUGE AT A FEED RATE OF FROM ABOUT 0.03875 TO 387.5 LITERS PER MINUTE (LITERS/MIN.) (0.01 TO 100 GALLONS PER MINUTE (GAL./MIN.)) AND AT A TEMPERATURE OF FROM ABOUT 0°C UP TO A MAXIMUM TEMPERATURE THAT IS LESS THAN THE BOILING POINT OF THE LOWER BOILING SOLVENT IN THE MIXTURE FROM STEP B), AND FEEDING A SUBSTANTIALLY PURE C5-C8 ALKANE, WATER OR AROMATIC HYDROCARBON SOLVENT INTO A SEPARATE LIQUID/LIQUID CENTRIFUGE INLET PORT AT A FEED RATE OF FROM ABOUT 0.03875 TO 387.5 LITERS/MIN. (0.01 TO 100 GAL./MIN.), ATA A RATIO OF WATER SOLUBLE ORGANIC POLAR SOLVENT/PHOTORESIST SOLVENT FROM STEP B) TO C5-C8 ALKANE, WATER OR AROMATIC SOLVENT, OF FROM ABOUT 5:1 TO ABOUT 0.5:, D) ROTATING THE LIQUID/LIQUID CENTRIFUGE CONTAINING THE MIXTURE FROM STEP C) AT A SPEED OF AT LEAST 500 RPM AND THEREBY SEPARATING AND COLLECTING A TWO-PHASE SYSTEM, FROM 2 SEPARATE OUTLEET SPORTS INTO TWO CONTAINERS, WHEREIN THE HEAVICR PHASE (H) CONTAINS THE HIGHER MOLECULAR WEIGHT NOVOLAK RESIN FRACTION, IN THE WATER SOLUBLE ORGANIC POLAR SOLVENT AND THE PHOTORESISTS SOLVENT WITH A MINOR AMOUNT OF THE C5-C8 ALKANE, WATER OR AROMATIC HYDROCARBON SOLVENT, AND THE LIGHTER PHASE (L) CONTAINS: 1) THE LOWER MOLECULAR WEIGHT NOVOLAK RESIN FRACTION, 2)C5-C8 ALKANE, WATER OR AROMATIC HYDROCARBON SOLVENT, 3) WATER SOLUBLE ORGANIC POLAR SOLVENT, AND 4) PHOTORESIST SOLVENT; E) AS THE LIGHTER PHASE (L) OF THE TWO-PHASE SYSTEM OF STEP D) IS COLLECTED IT MAY SEPARATE INTO TWO PHASES, THE LIGHTER OF THESE TWO SECOND PHASES CONTAINING THE C5-C8 ALKANE, WATER OR THE AROMATIC HYDROCARBON SOLVENT AND A MINOR AMOUNT OF THE WATER SOLUBLE ORGANIC SOLVENT AND ABOUT 15-20OF THE PHOTORESIST SOLVENT, THE HEAVIER OF THESE TWO SECOND PHASES CONTAINING LOW MOLECULAR WEIGHT NOVOLAK OLIGOMERS AND UNREACTED PHENOLIC COMPOUNDS, DISSOLVED IN THE WATER SOLUBLE ORGANIC POLAR SOLVENT AND THE PHOTORESITS SOLVENT WITH ABOUT 10-15OF THE C5-C8 ALKANE, WATER OR AROMATIC HYDROCARBON; AND F) SUBSTANTIALLY REMOVING THE RESIDUAL C5-C8, WATER OR AROMATIC HYDROCARBON SOLVENT FROM THE HEAVIER PHASE (H) FROM STEP D), AND LEAVING THE NOVOLAK RESIN IN THE PHOTORESIST SOLVENT. THE RESIN SOLUTION MAY THEN BE UPON DEMAND FOR THE PREPARATION OF PHOTORESISTS.
MYPI99004871A 1998-11-12 1999-11-09 Preparation of fractionated novolak resins by a novel extraction technique MY130862A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US19076398A 1998-11-12 1998-11-12

Publications (1)

Publication Number Publication Date
MY130862A true MY130862A (en) 2007-07-31

Family

ID=22702665

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI99004871A MY130862A (en) 1998-11-12 1999-11-09 Preparation of fractionated novolak resins by a novel extraction technique

Country Status (9)

Country Link
US (1) US6121412A (en)
EP (1) EP1133715A2 (en)
JP (1) JP2003529621A (en)
KR (1) KR20010089450A (en)
CN (1) CN1330778A (en)
HK (1) HK1043407A1 (en)
MY (1) MY130862A (en)
TW (1) TWI223129B (en)
WO (1) WO2000033137A2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6297352B1 (en) * 1998-11-12 2001-10-02 Clariant Finance (Bvi) Limited Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge
EP1122607A1 (en) * 2000-02-07 2001-08-08 Shipley Company LLC High resolution photoresist compositions
US6512087B1 (en) * 2000-10-13 2003-01-28 Clariant Finance (Bvi) Limited Fractionation of resins using a static mixer and a liquid-liquid centrifuge
CN1205241C (en) * 2000-10-13 2005-06-08 科莱恩金融(Bvi)有限公司 Fractionation of resins using a static mixer and a liquid-liquid centrifuge
US6936680B2 (en) * 2000-12-12 2005-08-30 Chang Chun Plastics Co., Ltd. Method of producing novolak resin
KR100846085B1 (en) * 2001-10-31 2008-07-14 주식회사 동진쎄미켐 Positive photoresist composition for liquid crystal device
US20040206702A1 (en) * 2002-08-08 2004-10-21 Davidson James M. Use of an oxidizer to improve trace metals removal from photoresist and photoresist components
JP4727958B2 (en) * 2004-08-19 2011-07-20 旭有機材工業株式会社 Method for producing novolac type phenolic resin
JP4984067B2 (en) * 2007-07-23 2012-07-25 信越化学工業株式会社 Method for synthesizing polymer compound for photoresist composition
EP3938420B1 (en) 2019-03-11 2023-06-07 Von Roll Schweiz AG Curable epoxy composition and its use in prepregs and core filling
US11248089B2 (en) 2019-04-10 2022-02-15 The Boeing Company Polyanilines and methods thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5371169A (en) * 1992-09-28 1994-12-06 Hoechst Celanese Corporation Novolak resin mixtures
US5374693A (en) * 1992-12-29 1994-12-20 Hoechst Celanese Corporation Novolak resin blends for photoresist applications
US5521052A (en) * 1994-12-30 1996-05-28 Hoechst Celanese Corporation Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom
US5750632A (en) * 1994-12-30 1998-05-12 Clariant Finance (Bvi) Limited Isolation of novolak resin by low temperature sub surface forced steam distillation
US5739265A (en) * 1995-09-20 1998-04-14 Clariant Finance (Bvi) Ltd. Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
US5693749A (en) * 1995-09-20 1997-12-02 Hoechst Celanese Corporation Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
US5665517A (en) * 1996-01-11 1997-09-09 Hoechst Celanese Corporation Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom
US5853954A (en) * 1996-12-18 1998-12-29 Clariant Finance (Bvi) Limited Fractionated novolak resin and photoresist composition therefrom
TW475099B (en) * 1996-12-18 2002-02-01 Hoechst Celanese Corp Isolation of novolak resin without high temperature distillation and photoresist composition therefrom
US5910559A (en) * 1996-12-18 1999-06-08 Clariant Finance (Bvi) Limited Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom

Also Published As

Publication number Publication date
HK1043407A1 (en) 2002-09-13
WO2000033137A2 (en) 2000-06-08
CN1330778A (en) 2002-01-09
EP1133715A2 (en) 2001-09-19
TWI223129B (en) 2004-11-01
US6121412A (en) 2000-09-19
WO2000033137A3 (en) 2000-10-26
KR20010089450A (en) 2001-10-06
JP2003529621A (en) 2003-10-07

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