MXPA99011324A - Mild, rinse-off antimicrobial liquid cleansing compositions - Google Patents

Abstract

The present invention relates to a rinse-off antimicrobial cleansing composition comprising from about 0.1%to about 5.0%by weight of the cleansing composition, of an antimicrobial active;from about 9%to about 14%by weight of the cleansing composition, of an anionic surfactant, wherein at least about 67%of the anionic surfactant is selected from the group consisting of Class A surfactants, Class C surfactants, and mixtures thereof, wherein the ratio of Class A surfactant to Class C is from about 4:1 to about 1.5:1, and wherein the total anionic surfactant comprises less than about 50%of the ammonium counter cation salt;from about 4%to about 8%by weight of the cleansing composition, of a proton donating agent having a Biological Activity Index, Z, of greater than about 0.75;a mildness enhancing agent selected from the group consisting of from about 20%to about 70%by weight of the anionic surfactant, of a mildness enhancing cosurfactant;from about 0.1%to about 1.0%by weight of the cleansing composition, of a mildness enhancing polymer;and mixtures thereof;and from about 69.4%to about 84.9%by weight of the cleansing composition, of water;wherein the composition is adjusted to a pH of greater than about 3.5 and less than about 4.5. The invention also encompasses methods for cleansing, removing germs and decreasing the spread of transient Gram negative and Gram positive bacterial using the rinse-off antimicrobial cleansing compositions described herein.

Description

CLEANING COMPOSITIONS SMOOTH ANTIMICROBIAL LIQUID LIQUIDS TECHNICAL FIELD The present invention relates to personal cleansing, rinse-off compositions that provide improved antimicrobial effectiveness. Specifically, the personal cleansing compositions of the invention provide residual effectiveness not previously seen against transient gram-negative bacteria, improved residual effectiveness against gram-positive bacteria and improved immediate germ reduction during use.

BACKGROUND OF THE INVENTION Human health is impacted by many microbial entities. Inoculation by viruses and bacteria causes a wide variety of diseases and conditions. Media attention to cases of food poisoning, streptococcal infections and the like is increasing the public's awareness of microbial issues. It is well known that washing hard surfaces, food (eg fruits or vegetables) and skin, especially hands, with antimicrobial or non-medicated soap, can remove many viruses and bacteria from washed surfaces. The removal of viruses and bacteria is due to the surfactant activity of the soap and the mechanical action of the washing process. Therefore, it is known and recommended that people wash frequently to reduce the spread of viruses and bacteria. The bacteria found on the skin can be divided into two groups: resident and transient bacteria. Resident bacteria are gram-positive bacteria that are established as permanent microcolonies on the surface and outer layers of the skin and play an important role, helping to prevent the colonization of other bacteria and more harmful fungi. Transient bacteria are bacteria that are not part of the normal resident flora of the skin, but can be deposited when the contaminated material transported by air falls on the skin or when the contaminated material is brought into physical contact with it. Transient bacteria are typically divided into two subclasses: gram positive and gram negative. Gram-positive bacteria include pathogens such as Staphylocossu aureus, Streptococcus pyogenes and Clostridium botulinum. Gram-negative bacteria include pathogens such as Salmonella, Escherochia coli, Klebsiella, Hoemophilus, Pseudomonas aeruginosa, Proteus and Shigella dysenteriae. The gram negative bacterium is generally distinguished from the gram positive by an additional protective cell membrane which generally results in the gram negative bacterium being less susceptible to topical antibacterial actives.

Antimicrobial cleaning products have been marketed in a variety of forms for some time. The forms include deodorant soaps, hard surface cleaners and surgical disinfectants. These traditional rinsing antimicrobial products have been formulated to provide bacteria removal during washing. Antimicrobial soaps have also been shown to provide residual effectiveness against gram-positive bacteria, but limited residual effectiveness against gram-negative bacteria. By residual effectiveness it is understood that the growth of the bacteria on a surface is controlled for a period after the washing / rinsing process. For example, antibacterial soap, when used regularly in manual washing, has been found to provide a residual effectiveness (reduction of 1.0 log to 1.5 log, ie, a reduction of 90 to 97%) against gram-positive bacteria after 2 to 5 hours. That is, the skin washed with antibacterial soap was tested 2 to 5 hours later, to be contaminated with only 3 to 10% of the number of gram-positive bacteria compared to the skin washed with a placebo soap, depending on the protolocal test and bacteria tested. Also, Dial and Safeguard liquid soaps, when used in handwashing, were found to reduce the amount of bacteria on the skin from 1.5g (97%) to about 2.5 log (99.7%) as measured by the standard tests Health Care Personal Handwash Tests (HCPHWT). That is to say, the skin washed with these soaps was only contaminated with 0.3% to 35 of the number of bacteria compared with the previous wash. The antimicrobial liquid cleaners are described in the patents of E.U.A. Nos. 4,847,072, Bissertt et al., Issued July 1, 1989, 4,939,284, Degenhardt, issued July 3, 1990 and 4,820,698, Degenhardt, issued April 1, 1989, all of which are incorporated herein by reference. The previously marketed formulations of Head & Dandruff Shampoo; Shoulders®, marketed until 1994, contained anionic surfactants, antibacterial actives and citric acid as a pH adjuster. Head & Shoulders® controlled the Pityrosorum ovale fungus that produces dandruff. PCT Application WO 92/18100, Keegan et al, published October 29, 1992 ("Keeganr") and PCT Application WO 95/32705, Fujiwara et al, published December 7, 1995 ("Fujiwara" ) teaches liquid cleansers for the skin that contain mild surfactants, antibacterial agents and acid compounds to regulate pH, which provides improved hostility against germs. However, the use of low levels of acidic compounds therein results in compositions that do not provide the undissociated acid required to give improved antimicrobial benefits. This situation is faced in Keegan and Fujiwara by the presence of mild surfactants, including non-ionic surfactants. Some of these antibacterial products, especially hard surface cleaners and surgical disinfectants, use high levels of alcohol and / or surfactants that have been shown to dry and irritate skin tissues. Ideal personal cleansers should gently cleanse the skin, cause little or no irritation, and not leave the skin or hair extremely dry after frequent use and preferably should provide a moisturizing benefit to the skin. U.S. Patent No. 3,141,821, issued to Compeau, on July 21, 1964 and Irgasan DP 300 / Triclosan®) technical literature from Ciba-Giegy, Inc., "Basic Formulation for Hand Disinfection 89/42/01" expose antibacterial skin cleansing compositions that could provide effectiveness improved antibacterial utilizing certain anionic surfactants, antimicrobial actives and acids. However, the selection of highly active surfactants results in personal cleansing compositions that dry and roughen the skin. Given the severe health impacts caused by bacteria such as Salmonella, Eschenchia coli and Shigella, it would be highly desirable to formulate antimicrobial cleansing compositions that provide residual effectiveness against gram-negative bacteria, residual effectiveness against gram-positive bacteria and improved immediate germ reduction and that are gentle to the skin. Existing products for the consumer have been unable to achieve residual effectiveness of gram-negative bacteria and softness. Applicants have discovered that rinsing antimicrobial cleaning compositions that provide such antimicrobial smoothness and effectiveness can be formulated using known antibacterial active agents in combination with specific organic and / or inorganic acids as proton donor agents, and specific anionic surfactants, all of which are deposited on the foot !. The deposited proton donor agent and the apionic surfactant improve the selected active, to provide a new level of hostility to the bacteria that contacts the skin.

BRIEF DESCRIPTION OF THE INVENTION The present invention relates to a rinsable antimicrobial cleaning composition comprising 0.1 to 5.0%, by weight of the cleaning composition, of an antimicrobial active; from about 9% to about 14% by weight of the cleaning composition, of an anionic surfactant; wherein at least about 67% of the anionic surfactant is selected from the group consisting of Class A surfactants, Class C surfactants and mixtures thereof, wherein the ratio of the surfactant of Class A to the surfactant of Class C is from about 4: 1 to about 1.5: 1, and wherein the total anionic surfactant comprises less than about 50% of the counterion salt of ammonium; from about 4% to about 8% by weight of the cleaning composition of a proton donor agent having a biological activity index, Z mayof of about 0.75; from about 20% to about 70% by weight of the anionic surfactant, of a mildness enhancing co-surfactant; from about 69.4% to about 84.9% by weight of the cleaning composition, of water; wherein the composition is adjusted to a pH of more than about 3.5 to less than about 4.5. The present invention also relates to methods for cleaning, reducing the number of germs on the skin and reducing the dispersion of transient gram-negative and gram-positive bacteria using the rinse-off antimicrobial cleaning compositions described herein.

DETAILED DESCRIPTION OF THE INVENTION The rinsing antimicrobial cleaning compositions of the present invention are very effective in cleaning surfaces, especially the skin, provide residual antimicrobial effectiveness against transient gram-negative bacteria, provide residual antimicrobial effectiveness against gram-positive bacteria, germ reduction and are gentle on the skin. The term "rinsable" is used herein to mean that the compositions of the present invention are used in a context whereby the composition is finally enrobed or washed from the treated surface (e.g., skin or hard surfaces) and either after or during the application of the product.

The term "antimicrobial cleansing composition" is used herein to mean a composition suitable for application to a surface for the purpose of removing dirt., oil and the like that also controls the growth and viability of gram-negative and gram-positive bacteria. Preferred embodiments of the present invention are cleansing compositions suitable for use on human skin. The compositions of the present invention may also be useful for the treatment of acne. As used in the present "acne treatment" it means to prevent, slow and / or stop the acne formation process in mammalian skin. The compositions of the invention may also be useful to provide an essentially immediate (ie acute) visual improvement in the appearance of the skin after application of the composition to the skin. More particularly, the compositions of the present invention are useful for regulating skin diseases, including the regulation of visible and / or tactile discontinuities of the skin, including but not limited to visible and / or tactile discontinuities in the texture of the skin. and / or color, more specifically discontinuities associated with skin aging. Such discontinuities can be induced or caused by internal and / or external factors. Extrinsic factors include ultraviolet radiation (e.g., from sun exposure), environmental contamination, wind, heat, low humidity, harsh surfactants, abrasives, and the like. Intrinsic factors include chronological aging and other biochemical changes from within the skin. The regulation of skin diseases includes regulating skin disease prophylactically and / or therapeutically. As used herein, prophylactically regulating skin disease includes removing layers, minimizing and / or avoiding visible and / or tactile discontinuities in the skin. As used herein, regulating skin disease therapeutically includes improving, for example, decreasing, minimizing and / or outgrowing such discontinuities. The regulation of skin disease involves improving the appearance and / or sensation of the skin, for example, causing a smoother or more uniform appearance and / or feeling. As used herein, regular skin disease includes regular signs of aging. "Regulating signs of skin aging" includes prophylactically and / or therapeutically regulating one or more of such signals (similarly, regulating a given signal of aging of the skin, for example, lines, wrinkling or pores, which includes prophylactically regular and / or therapeutically regulate that signal). "Signs of skin aging" include, but are not limited to, all visibly and tactilely perceptible manifestations as well as any other macros or micro effects due to aging of the skin. Such signals can be induced or caused by intrinsic factors or extrinsic factors, for example, chronological aging and / or damage by the environment. These signals may result from procedures that include, but are not limited to, the development of texture discontinuities such as wrinkles, including fine surface wrinkles and coarse deep wrinkles, skin lines, baldness, rashes, large pores (e.g., associated with attached structures such as sweat gland ducts, sebaceous gland, or hair follicles), scaly, lamellate consistency and / or other forms of skin disharmony or roughness, loss of skin elasticity (loss and / or inactivation of functional skin elastin) , softening (including swelling in the eye and jaw area), loss of skin firmness, loss of skin tension, loss of skin recovery from deformation, change of color (including circles under the eye), rashes, paleness, hyperpigmented skin regions such as age spots and freckles, keratosis, abnormal differentiation, hyperkeratinization, elastosis, decomposition of collagen, and other histological changes in the stratum corneum, dermis, epidermis, the cutaneous system of skin (for example, telangiectasia or spider vessels), and underlying tissues, especially those close to the skin. All percentages and ratios used herein, unless otherwise indicated, are by weight and all measurements made at 25 ° C, unless otherwise designated. The invention herein may comprise, consist of or consist essentially of, the essential as well as optional ingredients and components described therein. 1. - INGREDIENTS The rinsing antimicrobial compositions of the present invention consist of an antimicrobial active, an anionic surfactant, a proton donor agent and water. These components are selected so as to satisfy the efficiency and softness requirements that are defined below for the compositions herein. The selection of each component necessarily depends on the selection of each of the other components. For example, if a weak acid is selected as the proton donating agent, then to achieve an effective composition, either a more biologically active (but possibly less gentle) surfactant should be employed and / or a high level of Acid within the prescribed scale should be used and / or a particularly effective active and / or a higher level of deposition should be employed within the prescribed scale. Similarly, if a mild but ineffective surfactant is employed, then a stronger acid and / or a high acid level and / or a high level of deposition aid may be necessary to achieve an effective composition. If a hard surfactant is used, then a mildness agent or a lipophilic skin moisturizing ingredient may have to be used as the deposition aid. Each of these ingredients is described in detail in the following manner. Tables 1 and 2 summarize the formulation preferences that are required to achieve this balance.

A. ANTIMICROBIAL ACTIVE The rinse-resistant antimicrobial cleaning compositions of the present invention comprise from 0.1% to about 5.0%, preferably from 0.1% to about 2.0%, and more preferably from 0.1% to about 1.0% by weight of an antimicrobial active. Non-cationic actives are required in order to avoid interaction with the anionic surfactants of the invention. Examples of non-cationic antimicrobial agents that are useful in the present invention are given below. Pyrithione, especially the zinc complex (ZPT) Octopirox® Dimethyldimethylolhydantoin (Glydant®) Methylchloroisothiazolinone / methylisothiazolinone (Katon CG®) Sodium sulphite Sodium bisulphite Imidazolidinylurea (Germall 1 15®) Diazolidinylurea (Germali II®) Benzyl alcohol 2-Bromo- 2-Nitropropane-1,3-dil (Bronopol®) Formalin (formaldehyde) Iodopropenyl Butylcarbamate (Polifase P100®) Chloroacetamide Methanamine Methyldibromonitrile-Glutaronitrile (1,2-Dibromo-2,4-dicyanobutane or Tektamer®) Glutaraldehyde 5-bromine -5-nitro-1, 3-dioxane (Bronidox®) Phenethyl alcohol o-Phenylphenol / o-phenylphenol sodium Sodium hydroxymethylglycinate (Suttocide A®) Bicyclic polymethoxyoxazolidine (Nuosept C @) Dimetoxan 10 Timersal Dichlorobenzyl alcohol Captan Chlorphenenesin Dichlorophene 15 Chlorbutanoi Glyceryl aurate Halogenated diphenyl ethers 2,4,4'-Trichloro-2'-hydroxy-diphenyl ether (Triclosan® or TCS) 2,2'-dihydroxy-5) 5'-dibromo-difen ether Ilic 20 Phenolic compounds Phenol 2-methyphenol 3-methylphenol 4-methylphenol 4-ethylphenol 2,4-dimethylphenol 2,5-dimethylphenol 3,4-dimethylphenol 2,6-dimethylphenol 4-n-propylphenol 4-n-butylphenol 4-n -Amyphenol 10 4-tert-Amylphenol 4-n-hexylphenol 4-n-Heptyphenol Mono- and poly-alkyl aromatic halophenols p-chlorophenol 15 Methyl p-chlorophenol Ethyl p-chlorophenol n-propii p-chlorophenol n-butyl p-chlorophenol n-amyl p-chlorophenol 20 sec-amyl p-chlorophenol n-hexyl p-chlorophenol Ciciohexyl p-chlorophenol n-heptyl p-chlorophenol n-octyl p-chlorophenol o-chlorophenol Methyl o-chlorophenol Ethyl o-chlorophenol n-propyl or -chlorophenol n-butyl o-chlorophenol n-amyl o-chloropheno-tert-amyl o-ciorophenol n-hexyl o-chloropheno-10 n-heptyl o-chlorophenol o-benzyl p-chlorophenolo-benzyl-m-methyl p-chlorophenol o- benzyl-m, m-dimethyl p-chlorophenol or phenylethyl p-chlorophenol or phenylethyl-m-methyl p-chlorophenol 3-methyl p-chlorophenol 3,5-dimethyl p-chlorophenol 6-ethyl-3-methyl p- chlorophenol 6-n-propyl-3-me p-chlorophenol 6-iso-propyl-3-methyl p-chlorophenol 20 2-ethyl-3,5-dimethyl p-chlorophenol 6-sec-butyl-3-methyl p-chlorophenol 2-iso-propyl-3,5 -dimethyl p-chlorophenol 6-diethylmethyl-3-methyl p-chlorophenol 6-iso-propyl-2-ethyl-3-methyl p-ciorophenol 2-sec-amyl-3,5-dimethyl p-chlorophenol 2-diethylmethyl-3,5-dimethyl p-chlorophenol 6-sec-octi! -3-metii p-chlorophenol p-chloro-m-cresol p-bromophene Methyl p-bromophenol Ethyl p-bromophenol n-propyl p-bromophenol n-butyl p-bromophenol n-amyl p-bromophenol sec -amil- p-bromophenol n-hexyl p-bromophenol Ciciohexyl p-bromophene o-bromophenol ter-amyl o-bromophenol n-hexyl o-bromophenol n-propii-m, m-dimethyl o-bromophenol 2-Phenylphenol 4-chloro-2-methylphenol 4-chloro-3-methylphenol 4-chloro-3,5-dimethylphenol 2,4-dichloro-3,5-dimethylphenol 3,4,5,6-terabromo-2-methylphenol -methyl-2-pentylphenol 4-isopropyl-3-methylphenol Para-chloro-meta-xylene (PCMX) Chlorotimol Phenoxyethanol Phenoxysopropanol 5-chloro-2-hydroxydiphenylmethane Resorcinol and its derivatives Resorcinol Methylresorcinol Ethylresorcinol n-propylresorcinol n-butylresorcinol n-amylresorcinol n-hexylresorcinol n-heptylresorcinol n-octylresorcinol n-nonilresorcinol phenylresorcinol Bencilresorcinol Phenylethylresorcinol Phenylpropylresorcinol p-chlorobenzylresorcinol 5-chloro 2,4-dihydroxydiphenylmethane 4'-chloro 2,4 -d? hydroxydiphenylmethane 5-bromo-2,4-dihydroxydiphenylmethane 4'-bromo-2,4-dihydroxydiphenylmethane Bisphenol-2,2'-methylene-bis (4-chlorophenol) 2,2'-methylene-bis (3,4,6-trichlorophenol) compounds ) 2,2'-methylene bis (4-chloro-6-bromophene) Bis (2-hydroxy-3,5-dichlorophenyl) sulfide Bis (2-hydroxy-5-chlorobenzyl) sulphide Benzoic esters (Parabens) Metiiparaben Propylparaben Butylparaben Ethylparaben Isopropylparaben Isobutylparaben Benziparaben Methylparaben sodium Propylparaben sodium Halogenated carbanils 3,4,4'-trichlorcarbanilides (Triclocarban® or TCC) 3-trifluoromethyl-4,4'-dichlorocarbanilide 3, 3 ', 4-trichlorocarbanilide Another class of antibacterial agents, which are useful in the present invention are the so-called "natural" antibacterial actives, referred to as natural essential oils. These assets derive their names from their natural occurrence in plants. The antibacterial assets of typical natural essential oils include oils of anise, lemon, orange, rosemary, wintergreen, thymus, lavender, clavero, hops, tea tree, citronella, wheat, barley, lemon, cedar leaf, cedar wood, cinnamon , grass pulguera, geranium, sandalwood, violet, cranberry, eucalyptus, verbena, pepper, benzoin gum, basil, fennel, fir, balm, menthol, Ocmea oríganum, Hydastis carradensis, Berberidaceae daceae, Ratanhiae and Curcuma longa. Also included in this list of natural essential oils are the key chemical components of vegetable oils that have been found to provide antimicrobial benefit. These chemicals include, but are not limited to anethole, catecholane, camphene, carbacola, eugenol, eucalyptol, ferulic acid, farnesol, inoquitioi, propolene, limonene, menthol, methyl salicylate, timoi, terpiniol, verbenone, berberine, ratanhiae extract, Cariophelene oxide, citronellic acid, curcumin, nerolidol and genarioi. Additional active agents are antibacterial metal salts. This class generally includes salts of metals in groups 3b-7b, 8 and 3a-5a. Specifically they are the aluminum, zirconium, zinc, silver, gold, copper, lanthanum, tin, mercury, bismuth, seleneo, strontium, yttrium, cerium, praseodymium, neodymium, promised, samarium, europium, gadolinium, terbiumium, dysprosium salts , holmium, erbium, thulium, ytterbium, lutetium and mixtures thereof. Preferred antimicrobial agents for use herein are the broad spectrum active agents selected from the group consisting of Triclosan®, Triclocarban®, Octopirox®, PCMX, ZPT, natural essential oils and their key ingredients, and mixtures thereof. The most preferred antimicrobial actives for use in the present invention is Triciosan®.

B. ANIONIC SURGICAL AGENT The rinsing antimicrobial cleaning compositions of the present invention comprise from 4% to about 18% of an anionic surfactant. Without being limited by theory, it is believed that the anionic surfactant breaks the lipid in the cell membrane of the bacterium. The particular acid used herein reduces the negative charges on the cell wall of the bacterium, crosses the cell membrane, weakened by the surfactant, and acidifies the cytoplasm of the bacteria. The antimicrobial active can then pass more easily through the weakened cell wall, and more efficiently poison the bacteria. Non-limiting examples of ammonia foaming surfactants useful in the compositions of the present invention are described in McCutcheon's, Detergents and Emulsifiers, North American edition (1990), published by The Manufacturing Confectioner Publishing Co.; McCutcheon's, Functional Materials, North American Edition (1992); and in U.S. Patent No. 3,929,678 to Laughlin et al., of December 30, 1975, all of which are incorporated by reference. A wide variety of anionic surfactants are potentially useful herein. Non-limiting examples of anionic foaming surfactants include those selected from the group consisting of alkyl and alkyl ether sulphates, sulphated monoglycerides, sulphonated olefins, alkylarylsulfonates, primary and secondary alkanesulfonates, alkyl sulfosucinates, acryl taurates and acyl isethionates, alkyl glycerylether sulfonates, methyl sulfonated methyl esters, sulfonated fatty acids, alkyl phosphates, acyl glutamates, acyl sarcosinates, alkyl sulphoacetates, acylated peptides, herelic ethercarboxylates, acyl lactylates, fluoroanionic surfactants, and mixtures thereof. Mixtures of anionic surfactants can be used effectively in the present invention. Anionic surfactants for use in cleaning compositions include alkyl sulfates and alkyl ether sulfates. These materials have the respective formulas R10-S03M and R1 (CH2H0) x- O-SO3M, in which R is a saturated or unsaturated, branched or unbranched alkyl group of 8 to 24 carbon atoms, x is 1 to 10, and M is a water-soluble cation such as ammonium, sodium, potassium, magnesium, triethanolamine, diethanolamine and monoethanolamine. Alkyl sulphates are preferably made by sulfation of monohydric alcohols (having from 8 to 24 carbon atoms) using sulfur trioxide or other known sulfation technique. Alkyl ether sulfates are typically made as condensation products of ethylene oxide and monohydric alcohols (having from 8 to 24 carbon atoms) and then sulfated. These alcohols may be derived from fats, for example, coconut or tallow oils, or they may be synthetic. Specific examples of alkyl sulfates can be used in the cleaning compositions are sodium, ammonium, potassium, magnesium salts, TEA salts of lauryl sulfate or myristyl sulfate. Examples of alkyl ether sulfates that may be used include ammonium sulfate, sodium sulfate, magnesium sulfate, or laureth-3-sulfate from TEA. Another suitable class of anionic surfactants are the sulfated monoglycerides of the form R 1 CO-0-CH 2 -C (OH) H-CH 2-0-S0 3M, wherein R 1 is a saturated or unsaturated, branched or unbranched alkyl group of 8 to 24 carbon atoms, and M is a water-soluble cation such as ammonium, sodium, potassium, magnesium, triethanolamine, diethanolamine and monoethanolamine. These are typically made by the reaction of glycerin with fatty acids (having from 8 to 24 carbon atoms) to form a monogiiceride and the subsequent sulfation of this monoglyceride with sulfur trioxide. An example of a sulfated monoglyceride is sodium cocomonoglyceride sulfate.

Other suitable anionic surfactants include olefin suifonates of the form R1SO3M, of which R1 is a mono-olefin having from 12 to 24 carbon atoms, and M is a water-soluble cation such as ammonium, sodium, potassium, magnesium, triethanolamine, diethanolamine and monoethanolamine. These compounds can be produced by alpha-olefin sulfonation by means of non-complex sulfur trioxide, followed by neutralization of the acid reaction mixture under conditions such that any sultones which have been formed in the reaction are hydrolyzed to give the corresponding hydroxyalcanesulfonate. An example of a sulfonated olefin is C- | 4-C? 6 alpha olefinsulfonate. Other suitable anionic surfactants are the linear sulfoalkylbenzenesulfonates of the form R1-C6H4-SO3M, in which R1 is a saturated or unsaturated, branched or unbranched alkyl group of 8 to 24 carbon atoms, and M is a soluble cation in water such as ammonium, sodium, potassium, magnesium, triethanolamine, diethanoiamine and monoethanolamine. These are formed by the suifonation of linear alkylbenzene with sulfur trioxide. An example of this anionic surfactant is sodium dodecybenzenesulfonate. Another suitable anionic surfactant for this cleaning composition includes the primary or secondary alcansulfonates of the form R 1 SO 3 M, in which R 1 is a saturated or unsaturated, branched or unbranched alkyl chain of 8 to 24 carbon atoms, and M is a water-soluble cation such as ammonium, sodium, potassium, magnesium, triethanoiamine, diethanolamine and monoethanolamine. These are commonly formed by the suifonation of paraffins using sulfur dioxide in the presence of chlorine and ultraviolet light or another known method of suifonation. Suifonation can occur in the secondary or primary positions of the alkyl chain. An example of an alkan sulfonate useful herein is the C13-C17 alkali metal or ammonium paraffinsulfonates. Other suitable surface-active agents are alkyl sulfosuccinates, which include disodium N-octadecyl sulfosucinamate; diammonium lauryl sulfosuccinate; N- (1,2-dicarboxyethyl) -N-octadecylsulfosucinate tetrasodium; diamyl ester of sodium sulfosucinic acid; dihexyl ester of sodium sulfosuccinic acid; and dioctyl esters of sodium sulfosucinic acid. Also useful are taurates that are based on taurine, which is also known as 2-aminoethane-sulfonic acid. Examples of taurates include N-alkyltaurines such as that prepared by reacting dodecylamine with sodium isethionate according to the teaching of US Pat. No. 2,658,072 which is incorporated herein by reference in its entirety. Other examples based on taurine include the acyltaurines formed by the reaction of N-methyltaurine with fatty acids (having from 8 to 24 carbon atoms). Another class of anionic surfactants suitable for use in the cleaning composition are the acyl isethionates. The acylisethionates typically have the formula R1CO-O-CH2-CH2SOsM in which R1 is a saturated or unsaturated, branched or unbranched alkyl group having from 10 to 30 carbon atoms, and M is a cation. These are typically formed by the reaction of fatty acids (having from 8 to 30 carbon atoms) with a metal alkanoyl isethionate. Non-limiting examples of these acyl isethionates include ammonium cocoyl isethionate, sodium cocoyl isethionate, sodium lauroyl isethionate, and mixtures thereof. Still other suitable anionic surfactants are the alkyl glyceryl ether sulphonates of the form R1-CH (S04) -COOH in which R1 is a saturated or unsaturated, branched or unbranched alkyl group of 8 to 24 carbon atoms, and M is a water soluble cation such as ammonium, sodium, potassium, magnesium, triethanolamine, diethanoiamine and monoethanolamine. These can be formed by the reaction of epichlorohydrin and sodium disulfide with fatty alcohols (having from 8 to 24 carbon atoms) or other known methods. An example is sodium co-glyceryl sulphonate ether. Other suitable anionic surfactants include the sulfonated fatty acids of the form R1-CH (SO) -COOH and the sulfonated methyl esters of the form R1-CH (SO4) -CO-O-CH3, wherein R1 is a saturated or unsaturated, branched or unbranched alkyl group of 8 to 24 carbon atoms. These can be formed by the suifonation of fatty acids or methylalkyl esters (having from 8 to 24 carbon atoms) with sulfur trioxide or by another known suphonation technique. Examples include coconut fatty acid aifasulfonated and laurimethyl ester.

Other anionic materials include phosphates such as monoalkyl, dialkyl, and trialkyl phosphate salts formed by the reaction of phosphorus pentoxide with branched or unbranched monohydric alcohols having from 8 to 24 carbon atoms. These could also be formed by other known phosphating methods. An example of this class of surfactants is sodium monodilauryl phosphate. Other anionic materials include acyl glutamates corresponding to the formula R1CO-N (COOH) -CH2CH2-CO2M in which R1 is a saturated or unsaturated, branched or unbranched alkyl or alkenyl group, of 8 to 24 carbon atoms, M is a cation soluble in water. Non-limiting examples of which include sodium lauroiglutamate and sodium cocoiiglutamate. Other anionic materials include alkanoyl sarcosinates corresponding to the formula R1CON (CH3) -CH2CH2-CO2M in which R1 is a saturated or unsaturated, branched or unbranched alkyl or alkenylene group, of 10 to 20 carbon atoms, and M is a cation soluble in water. Non-limiting examples of which include sodium lauroyl sarcosinate, sodium cocoyl sarcosinate and lauroyl sarcosinate ammonium. Other anionic materials include the alkyl carboxylate ethers corresponding to the formula R1- (OCH2CH2) x-OCH2-C02M in which R1 is a saturated or unsaturated, branched or unbranched alkyl or alkenyl group of 8 to 24 carbon atoms, x is 1 to 10, and M is a water-soluble cation. Non-limiting examples of which include sodium laureth-carboxylate. Other anionic materials include acyl lactyiates corresponding to the formula RCO- [O-CH (CH3) -CO] x -CO2M wherein R1 is a saturated or unsaturated, branched or unbranched alkyl or alkenyl group of 8 to 24 atoms of carbon, x is 3, and M is a water-soluble cation.

Non-limiting examples of which include sodium cocoyl lactylate. Other anionic materials include the carboxylates, non-limiting examples of which include sodium lauroylcarboxylate, sodium cocoylcarboxylate, and ammonium lauroylcaboxylate. Fluoroanion surfactants can also be used. Any countercation, M, can be used on the anionic surfactant. Preferably the counter cation is selected from the group consisting of sodium, potassium, ammonium, monoethanolamine, diethanolamine, and triethanolamine. It has been found that ammonium provides higher levels of antimicrobial efficacy. However, it has been found to be less gentle than other cations. Therefore, in some embodiments, the levels of surfactant and proton donor agent can be adjusted according to the above, this is shown in Table 1. The surfactants mainly used in the compositions of the present invention can be grouped into four classes based on their softness and antimicrobial efficacy. The four classes of anionic surfactants are defined below.

Class A - The first class of anionic surfactants are those that are considered mild, but which improve at least the antimicrobial efficacy. These include the group consisting of alkyl ether sulfates; acyl monoglyceryl sulphates; alkyl glyceryl ether sulfates; acyl isethionates; acyltaurates; alkyl sulfosuccinates; alkylsulfoacetates; sulfonated olefins; alkyl sulfates having a predominant chain length of C8, C10, C16 or C18; and mixtures thereof. Class B - The second class of surfactants are those that are considered mild, but which improve antimicrobial efficacy. These include the group consisting of primary and secondary alcansulfonates, alkyl sulfates having a predominant chain length of C14, and mixtures thereof. Class C - The third class of cationic surfactants are those that are considered rough but generally improve antimicrobial efficacy. These include the group consisting of alkylarylsulfonates, alkylsulfocarboxyiates, sulfonated fatty acids, aikyl phosphates, alkylsulfates having to have a predominant chain length of C12, and mixtures thereof. Specific examples of harsh surfactants are lauryl phosphate, laurylbenzenesuifonate, monoalkylaphosphate and lauryl sulfocarboxylate. It is beneficial to formulate compositions based on predominant mixtures of two of these classes while comprising at least about 67%, preferably at least about 80%, most preferably about 90% of the anionic surfactant present in the liquid antimicrobial compositions in the I presented. Different ratios of surfactants in the different classes result in the required formulation adjustments. These are summarized in Tables 1 and 2. Non-limiting examples of preferred anionic surfactants useful herein include those selected from the group consisting of sodium and ammonium alkyl sulfates and ether sulfates having chain lengths of predominantly 12 and 14 carbon atoms. , olefin sulphates having chain lengths of predominantly 14 and 16 carbon atoms, and paraffin sulfonates having chain lengths of 13 to 17 carbon atoms, and mixtures thereof. More preferred for use herein are ammonium sodium sodium lauryl sulfates, sodium ammonium myristyl sulfate, laureth-1, laureth-2, Iaureth-3, and laureth-4 sodium ammonium sulfates, C 14 -C 16 olefinsuifonates, C13-C17 paraffin sulfonates, and mixtures thereof. Nonionic surfactants from the group consisting of nonionic surfactants, cationic surfactants, amphoteric surfactants, and mixtures thereof, have now been found to reduce the benefits of residual effectiveness when used with anionic surfactants at high levels. This is most evident in the case of cationic and amphoteric surfactants where it is believed that these surfactants interfere (load-charge interaction) with the ability of the anionic surfactant to break down the lipid in the cell membrane. The ratio of the amount of these surfactants to the amount of anionic surfactant should be less than 1: 1, preferably less than 1: 2, and more preferably less than 1: 4. The rinsed antimicrobial cleaning compositions of the present invention preferably do not consist of hydrotropic sulfonates, particularly terpenoid salts, or mono- or binuclear aromatic compounds such as camphor sulfonate, toluene, xylene, eumeno and naphthene.

C. PROTON DONATION AGENT The rinse-off antimicrobial cleaning compositions of the present invention comprise from 2% to about 10%, based on the weight of the personal cleansing composition, of a proton donor agent. Preferred levels of proton donor agent are detailed in Tables 1 and 2. "Proton donating agent" means any acidic compound or mixture thereof, which results in an undissociated acid on the skin after use. The proton donor agents can be organic acids, including polymeric acids, mineral acids or mixtures thereof.

Organic Acids The proton donor agents that are organic acids remain at least partially undissolved in the pure composition and remain so when the compositions are diluted during washing and rinsing. The organic proton donor agents must have at least a pKa value of less than 5.5. These organic proton donor agents can be added directly to the composition in the acid form or can be formed by adding the conjugate base of the desired acid and a sufficient amount of a separate acid sufficiently strong to form the undissociated acid of the base. biological activity index of organic acids The preferred organic proton donor agents are selected based on their biological activity. This activity is represented by an index of biological activity, Z, which is defined as: Z = 1 + 0.25pKa1 + 0.42logP The index of biological activity combines the dissociation characteristics and the hydrophobicity of the acid. It is important that the non-dissociated proton donating agent of the composition is deposited on the skin to reduce the negative charge on the cell wall. The acid dissociation constant, pKai, is indicative of the chemical's proton donor capacity in relation to the pH of the medium to which it is incorporated. Although undissociated acid is most preferred in the composition, acids with higher pKa are generally more preferred for a given pH product. The octanol-water partition coefficient, P, represents the tendency of materials in solution to prefer oils or water. Essentially it is a measure of the hydrophobic nature of a material in solution: the higher the division coefficient, the more soluble in oil, and less soluble in water. Although it is desired that the acids dissolved in the compositions arise from aqueous cleaner on application, are deposited on the oil-based skin and remain during rinsing, organic acids with higher octanol-water partition coefficients are most preferred. Preferred organic proton donor agents of the rinsing antimicrobial cleansing compositions of the present invention have a biological activity index greater than about 0.75, preferably greater than about 1.0 more preferably greater than about 1.5 and more preferably greater than 2.0.

Mineral acids The proton donor agents that are mineral acids will not remain undissociated in the pure composition or when the compositions are diluted during washing and rinsing. Despite this, it has been discovered that mineral acids can be effective proton donors for use herein. Without being limited by theory, it is believed that the strong mineral acid acidifies the carboxylic and phosphatidyl groups in proteins of the skin cells, thereby providing undissociated acid in situ. These proton donor agents can only be added directly to the composition in the acid form.

It is critical to achieve the benefits of the invention that the undissociated acid of the proton donor agent (deposited or formed in situ) remains on the skin in the protonated form. Therefore, the pH of the non-rinsing antimicrobial compositions of the present invention must be adjusted to a sufficiently low level in order to form or deposit substantially non-destructive acid on the skin. The pH of the compositions should be adjusted and preferably regulated on the scale from about 3.5 to about 5.5; the preferred pH scales are shown in tables 1 and 2. A non-exclusive list of examples of organic acids that can be used as the proton donor agent are adipic acid, tartaric acid, citric acid, maleic acid, malic acid, succinic acid, glycolic acid, glutaric acid, benzoic acid, malonic acid, salicylic acid, gluconic acid, polyacrylic acid, its salts, and mixtures thereof. Especially preferred organic proton donor agents are the group consisting of malic acid, malonic acid, citric acid, succinic acid, and lactic acid, a non-exclusive list of examples of mineral acid to be used herein are hydrochloric, phosphoric, sulfuric and mixtures thereof.

D. WATER Rinsing antimicrobial cleaning compositions of the present invention comprise from about 35% to about 99.899%, preferably from about 45% to about 98%, more preferably from about 55% to about 97.5%, and more preferably about 65% to approximately 95.99% water. The solid stick embodiments of the present invention preferably comprise from about 2% to about 25%, most preferably from about 3% to about 20% and most preferably still from about 5% to about 15% water. The rinsing antimicrobial cleaning compositions of the present invention have an apparent or pure viscosity of about 500 cps at about 60,000 cps at 26.7 ° C, preferably at 5,000 to 30,000 cps. The term "viscosity", as used herein, refers to viscosity as measured by a Brookfield RVTDCP with a CP-41 spindle at 1 RPM for 3 minutes, unless otherwise indicated. The "pure" viscosity is the viscosity of the undiluted liquid cleaner.

E. PREFERRED OPTIONAL INGREDIENTS Smoothness improving agents In order to achieve the required mildness of the present invention, optional ingredients may be added to improve softness to the skin. These ingredients include cationic and non-ionic polymers, co-surfactants, humectants and mixtures thereof. Polymers useful herein include polyethylene glycols, polypropylene glycols, hydrolyzed yield proteins, hydrolyzed milk proteins, hydrolyzed keratin proteins, guar hydroxypropyltrimonium chloride, polytemporaries, silicone polymers and mixtures thereof. Polymers, preferably cationic polymers, are preferably included in the compositions herein at a level of from about 0.1% to about 1%, preferably from about 0.2% to about 1% and most preferably still from about 0.2% to about 0.6% by weight of the rinse-off antimicrobial cleaning composition of the composition. Surfactant coagents useful herein include nonionic surfactants such as the Genapol® 24 series of ethoxylated alcohols, POE (20) sorbitan monooleate (Tween® 80), polyethylene glycol cocoate and P! Uronic® propylene oxide / block polymers. ethylene oxide, and amphoteric surfactants such as alkylbetaines and alkylsultains. When used, the softness enhancing surfactant coagents comprise from about 20% to about 70% by weight of the anionic surfactant, of the mildness enhancing co-surfactant, from about 20% to about 70% by weight of the agent anionic surfactant, of the mildness enhancing co-surfactant, from about 0.1% to about 1.0% by weight of the antimicrobial cleaning composition, of the softness enhancing polymer, and mixtures thereof.

F.- OTHER OPTIONAL INGREDIENTS The compositions of the present invention may consist of a wide range of optional ingredients. The CTFA Internationai Cosmetic Ingredient Dictionary, Sixth Edition, 1995, which is incorporated by reference herein in its entirety, discloses a wide variety of non-limiting cosmetic and pharmaceutical ingredients commonly used in the skin care industry, which are suitable for use in the compositions of the present invention. Non-limiting examples of functional classes of ingredients are described on page 537 of this reference. Examples of these functional classes include: abrasives, anti-acne agents, cake antifouling agents, antioxidants, blenders, biological additives, volumetric agents, chelating agents, chemical additives, colorants, cosmetic astringents, cosmetic bioisides, denaturants, drug astringents, emulsifiers, external analgesics, film formers, fragrance components, humectants, oating agents, plastisers, preservatives, propellants, reducing agents, skin whitening agents, skin conditioning agents (emollients, humectants, various, and occlusives), skin protectants, solvents, foam boosters, hydrotropes, solubilizing agents, suspending agents (non-surfactants), sunscreen agents, ultraviolet light absorbers, and viscosity increasing agents (aqueous and non-aqueous). Examples of other functional classes of materials useful herein that are well known to one skilled in the art include solubilizing, sequestering, and keratolytic agents, and the like.

TABLE 1 Niéveles and preferred scales for antimicrobial cleansing compositions TABLE 2 Niéveles and preferred scales for antimicrobial cleaning compositions II. METHODS OF MANUFACTURING RINSEABLE ANTIMICROBIAL COMPOSITIONS The rinse-resistant antimicrobial compositions for personal cleansing of the present invention are made by art-recognized techniques for the various non-rinsable product forms.

III. METHODS FOR USING THE RINSING ANTIMICROBIAL COMPOSITION The rinse-off antimicrobial personal cleansing compositions of the present invention are useful for reducing the number of germs on the skin and controlling the dispersion of gram-negative and gram-positive bacteria over time. Typically, an adequate or effective amount of the composition is applied to the area to be treated. Alternatively, a suitable amount of the topical composition can be applied through intermediate application to a fabric, sponge, pad, cotton ball, cushion or other application device. Generally, an effective amount of product to be used will depend on the needs and habits of use of the individual. Typical amounts of the present compositions useful for cleaning are in the range of about 0.1 mg / cm2 to about 10 mg / cm2, preferably from about 0.3 mg / cm2 to about 3 mg / cm2 of skin area to be cleaned.

EXAMPLES The following examples further describe and demonstrate embodiments within the scope of the present invention. In the following examples, all the ingredients are listed to an active honey. The examples are given solely for the purpose of illustration and should not be considered as limitations of the present invention, since many variations thereof are possible without departing from the spirit and scope of the invention. The ingredients are identified by the chemical name or CTFA.

Procedure to make the examples of hand-held soap All water except 5% by weight is added to the mixing tank. Surfactants are added to the mixing tank. The materials are heated to 68.8 ° C ± 5.6 ° C and mixed until dissolved. It is cooled to less than 37.7 ° C and acid and antibacterial active and perfumes are added. Mix until the materials dissolve, the pH is adjusted to the target with a required pH regulator (NaOH or acid sodium salt), water is added to complete the product.

Procedure for making examples 1-4 of shower gel for shower. Wetting oils and coagents surfactants and heat ingredients are added at 54.4-60 ° C until they dissolve (this step can be omitted for products that do not contain oils). In another container, primary surfactants, acid, pH regulating salt, preservatives, viscosity detergency builder (salt) and polymer are added. Heat to 54.4-60 ° C until dissolved. The two mixtures are combined (or a single mixture is used if no oils are present), when both are at 54.4-60 ° C, then cooling is started. When the mixture is below 46.1 ° C, antibacterial active and perfume is added. The final pH is adjusted using NaOH or remaining buffer salt. The remaining water is added to complete the product.

Procedure to make example 5 shower gel for shower In a container surfactants, acid, pH regulating salt, preservatives, viscosity improvers (sai) and polymer are added. Heat to 54.4-60 ° C until dissolved. The mixture is cooled to 46.1 ° C, antibacterial active, perfume, dye and petrolatum are added. The final pH is adjusted using NaOH or remaining buffer salt. The remaining water is added to complete the product.

Procedure to make the bar example The ingredients can be processed to form bars using conventional soap line equipment, for example, the processing can be carried out as follows: first the surfactants are added to the mixer. The acid is then added and enough water is incorporated in such a way that the mixer mixture is a smooth fluid and has a manageable viscosity under agitation. The pH is adjusted to the target with the required base (NaOH). The temperature of the mixture is adjusted to a scale of 71.1-93.3 ° C. Next, dextrin is added to the mixture. Agitation is applied to the mixer and heated to achieve a uniform composition again on the aforementioned temperature scale. The resulting mixture is pumped and dispersed on a conventional cooling roller, where the composition solidifies. It is cut into flakes, the flakes are transported to an amalgamator, where perfume and active or heat-sensitive components can be incorporated. The amalgamated flakes are processed through a mill and extruder. It is stamped on the desired bar shape.

Procedure for making the shampoo examples All except 5% by weight of water is added to the mixing tank. Surfactants are added to the mixing tank. The materials are heated to 68.8 ° C ± 5.6 ° C and mixed until dissolved. It is cooled to less than 37.7 ° C and acid and antibacterial active and perfumes are added. Mix until the materials dissolve. The pH is adjusted to the target with a required pH regulator (sodium salt of acid), water is added to complete the product.

Procedure for making the above examples All except 5% by weight of water is added to the mixing tank. Surfactants are added to the mixing tank. The materials are heated to 68.8 ° C ± 5.6 ° C and mixed until dissolved. It cools to less than 37.7 ° C, acid and perfume are added. Mix until the materials dissolve. The pH is measured and adjusted to the target with a required pH regulator (NaOH or acid sodium sai), water is added to complete the product.

Claims (14)

NOVELTY OF THE INVENTION CLAIMS

1 .- A rinsing antimicrobial cleaning composition characterized because it comprises: a. from 0.1% to 5.0% by weight of the cleaning composition, of an antimicrobial active; b. from 9% to 14% by weight of the cleaning composition of an anionic surfactant, wherein at least 67% of the anionic surfactant is selected from the group consisting of class A surfactants, class C surfactants and mixtures thereof. same, wherein the ratio of the surfactant of class A to class C is from 4: 1 to 1.5: 1, and wherein the total anionic surfactant comprises less than 50% of the counterion salt of ammonium; c. from 4% to 8% by weight of the cleaning composition and a proton donor agent having a biological activity index Z greater than 0.75; d. a softness improving agent selected from the group consisting of 20% to 70% by weight of the anionic surfactant, of a smoothness promoting surfactant coagent; from 0.1% to 1.0% by weight of the cleaning composition of a softness-promoting polymer; and mixtures thereof; and e. from 69.4% to 84.9% by weight of the cleaning composition, of water; wherein the composition is adjusted to a pH greater than 3.5 and less than 4.5.

2. A rinse-off antimicrobial cleaning composition comprising: a. from 0.1% to 5.0% by weight of the cleaning composition of an antimicrobial active; b. from 8% to 12% by weight of the cleaning composition of an anionic surfactant, wherein at least 67% of the anionic surfactant is selected from the group consisting of class A surfactants, class C surfactants, and mixtures of them, wherein the ratio of the class A surfactants to class C surfactants is from 5: 1 to 2: 1, and wherein the anionic surfactant comprises more than 50% of the counter-cation salt of ammonium; c. from 4% to 10% by weight of the cleaning composition, and a proton donor agent having a biological activity index, Z, greater than 0.75; d. a softness improving agent selected from the group consisting of 20% to 70% by weight of the anionic surfactant of a mildness improving surfactant coagent; from 0.1% to 1.0% by weight of the cleaning composition of a softness improving polymer; and mixtures thereof; and e. from 72.4% to 86.1% by weight of the cleaning composition, of water; wherein the composition is adjusted to a pH greater than 3.5 and less than 5.0. 3.- A rinsing antimicrobial cleansing composition further characterized because it comprises: a. from 0.1% to 5.0% by weight of the cleaning composition of an antimicrobial active; b. from 6% to 10% by weight of the cleaning composition of an anionic surfactant, wherein at least 67% of the anionic surfactant is selected from the group consisting of class A surfactants, Ciase C surfactants, and mixtures thereof. the same, wherein the ratio of the class A surfactants to class C surfactants is from 1.5: 1 to 1: 1.5; c. from 4% to 10% by weight of the cleaning composition, and a proton donor agent having an activity index of length, Z, greater than 0.75 where less than 50% of the proton donor agent is succinic acid; d. a softness improving agent selected from the group consisting of 20% to 70% by weight of the anionic surfactant of a mildness improving surfactant coagent; from 0.1% to 1.0% by weight of the cleaning composition of a softness improving polymer; and mixtures thereof; and e. from 75.4% to 88.1% by weight of the cleaning composition, of water; wherein the composition is adjusted to a pH greater than 3.5 and less than 4.5. 4.- A rinsing antimicrobial cleansing composition further characterized because it comprises: a. from 0.1% to 5.0% by weight of the cleaning composition of an antimicrobial active; b. from 4% to 18% by weight of the cleaning composition, of an anionic surfactant, wherein at least 67% of the anionic surfactant is selected from the group consisting of class B surfactants, class C surfactants, and mixtures thereof, wherein the ratio of the surfactant of class B to class C is from 100: 0 to 1: 2; c. from 2% to 8% by weight of the cleaning composition, of a proton donor agent having a biological activity index, Z, greater than 0.75; d. from 69.4% to 84.9% by weight of the cleaning composition, of water; wherein the composition is adjusted to a pH greater than

3.5 and less than

4.5.

5. - A rinsing antimicrobial cleansing composition further characterized because it comprises: a. from 0.1% to 5.0% by weight of the cleaning composition, of an antimicrobial active; b. from 4% to 18% by weight of the cleaning composition, of an anionic surfactant, wherein at least 67% of the anionic surfactant is selected from the group consisting of class A surfactants, class B surfactants, and mixtures thereof, wherein the ratio of the surfactant of class A to class B is from 100: 0 to 1: 2; c. from 2% to 8% by weight of the cleaning composition, of a proton donor agent having a biological activity index, Z, greater than 075; d. from 63.4% to 92.9% by weight of the cleaning composition, of water; wherein the composition is adjusted to a pH greater than 3.5 and less than 4.5.

6. A rinse-off antimicrobial cleaning composition according to claim 4 or claim 5, further comprising a mildness improving agent selected from the group consisting of 20% to 70% by weight of the anionic surfactant, of a surfactant co-surfactant, smoothness; 0.1% to 1.0% by weight of the cleaning composition, of a softness improving polymer, and mixtures thereof.

7. A rinse antimicrobial cleaning composition according to any of claim 1, claim 2, or claim 3, further characterized in that the softness improving agent comprises from 0.2% to 0.6% by weight of the cleaning composition, of an improving polymer of softness and from 20% to 50% by weight of the anionic surfactant, of a mildness improving surfactant coagent.

8. A rinse-off antimicrobial cleaning composition according to claim 1, further characterized in that the ratio of the surfactant of class A to the surfactant of Ciase C is from 3: 1 to 1.5: 1.

9. A rinsing antimicrobial cleaning composition according to claim 2, further characterized in that the ratio of the surfactant of class A to the surfactant of class C is from 4: 1 to 2: 1.

10. A rinse-off antimicrobial cleaning composition according to any of the preceding claims, further characterized in that the antimicrobial activity is selected from the group consisting of Triciosan®, Triclocarban®, Olctopirox®, PCMX, ZPT, natural essential oils and their key ingredients , and mixtures thereof.

11. A rinse antimicrobial cleaning composition according to any of the preceding claims, further characterized in that the proton donor agent is an organic acid having a biological activity index, Z, greater than 1.5.

12. A rinse antimicrobial cleaning composition according to any of the preceding claims, further characterized in that the ratio of the amount of non-anionic surfactants to the amount of anionic surfactants is less than 1: 1.

13. - The use of a safe and effective amount of the composition according to any of the preceding claims for the preparation of a medicament for cleaning, reducing the number of germs on human skin, and reducing the propagation of gram-negative and gram-positive transient bacteria.

14. The use of a safe and effective amount of the composition according to any of the preceding claims for the preparation of a medicament for treating acne in human skin. SUMMARY OF THE INVENTION The present invention relates to a rinse-off antimicrobial cleaning composition comprising from 0.1% to 5.0% by weight of the cleaning composition, of an antimicrobial active; from about 9% to about 14% by weight of the cleaning composition, of an anionic surfactant, wherein at least about 67% of the anionic surfactant is selected from the group consisting of surfactants of class A, surfactants of class C, and mixtures thereof, wherein the ratio of surfactant of class A to class C surfactant is from about 4: 1 to about 1.5: 1, and wherein the total anionic surfactant comprises less than approximately 50% of the ammonium countercation salt; from about 4% to about 8% by weight of the cleaning composition, of a proton donor agent having a biological activity index, Z, greater than about 0.75; a mildness enhancing agent selected from the group consisting of from about 20% to about 70% by weight of the anionic surfactant, of a mildness enhancing co-surfactant of from about 0.1% to about 1.0% by weight of the cleaning composition 69.4%, of a softness enhancing polymer; and mixtures thereof; and from about 69.4% to about 84.9% by weight of the cleaning composition, of water; wherein the composition is adjusted to a pH of more than about 3.5 to less than about 4.5; The invention also comprises methods for cleaning, removing germs and reducing the propagation of transient gram-positive and gram-positive bacteria using the rinsing, antimicrobial cleaning compositions described herein. P99 / 1620F SR / JJ / alg * mvh * sff * jtc *