MX377486B - SIMULTANEOUS ELECTRODEPOSITION PROCESS TO FORM FILMS WITH HOMOGENEOUS COMPOSITION AND UNIFORM MORPHOLOGY. - Google Patents

SIMULTANEOUS ELECTRODEPOSITION PROCESS TO FORM FILMS WITH HOMOGENEOUS COMPOSITION AND UNIFORM MORPHOLOGY.

Info

Publication number
MX377486B
MX377486B MX2014015117A MX2014015117A MX377486B MX 377486 B MX377486 B MX 377486B MX 2014015117 A MX2014015117 A MX 2014015117A MX 2014015117 A MX2014015117 A MX 2014015117A MX 377486 B MX377486 B MX 377486B
Authority
MX
Mexico
Prior art keywords
solution
elements
electrodeposit
ions
deposited
Prior art date
Application number
MX2014015117A
Other languages
Spanish (es)
Other versions
MX2014015117A (en
Inventor
Madrigal Arturo Fernández
Lara Baudel Lara
Original Assignee
Univ Mexico Nac Autonoma
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Mexico Nac Autonoma filed Critical Univ Mexico Nac Autonoma
Priority to MX2014015117A priority Critical patent/MX377486B/en
Publication of MX2014015117A publication Critical patent/MX2014015117A/en
Publication of MX377486B publication Critical patent/MX377486B/en

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)

Abstract

The present invention refers to an electrodeposition process for forming films from a simultaneous electrodeposit or element of one or more elements with homogeneous composition and uniform morphology, which is performed in an electrolytic cell with electrodes arranged in a horizontal position, said process comprising the following steps: (a) selecting a working electrode (WE) with resistivity of p=1x10-2 0)cm or less; (b) preparing a solution containing the ions of the element or elements to be deposited, where the concentration and pH of the solution will depend on the element or elements to be deposited, so that performing the reduction of ions with the desired composition over the WE upon applying an electrodeposit potential; (c) locating the solution prepared in stage (b) inside an electrolytic cell, selecting the power source that will cause the reduction of the cations in the WE; (d) selecting the form of the potential signal to be applied to the WE; and (e) performing the elec tric connection to the electrodes and power the electrolytic cell, maintaining the cell energized until reaching the desired film thickness, where the time may vary from few seconds to several hours and the current density of the electrodeposit will depend on the following parameters: (i) the elements to be deposited; (ii) the density of the ions in the solution; (iii) the temperature of the solution; and (iv) the resistivity of the WE.
MX2014015117A 2014-12-10 2014-12-10 SIMULTANEOUS ELECTRODEPOSITION PROCESS TO FORM FILMS WITH HOMOGENEOUS COMPOSITION AND UNIFORM MORPHOLOGY. MX377486B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
MX2014015117A MX377486B (en) 2014-12-10 2014-12-10 SIMULTANEOUS ELECTRODEPOSITION PROCESS TO FORM FILMS WITH HOMOGENEOUS COMPOSITION AND UNIFORM MORPHOLOGY.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MX2014015117A MX377486B (en) 2014-12-10 2014-12-10 SIMULTANEOUS ELECTRODEPOSITION PROCESS TO FORM FILMS WITH HOMOGENEOUS COMPOSITION AND UNIFORM MORPHOLOGY.

Publications (2)

Publication Number Publication Date
MX2014015117A MX2014015117A (en) 2016-06-09
MX377486B true MX377486B (en) 2025-03-07

Family

ID=57217071

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2014015117A MX377486B (en) 2014-12-10 2014-12-10 SIMULTANEOUS ELECTRODEPOSITION PROCESS TO FORM FILMS WITH HOMOGENEOUS COMPOSITION AND UNIFORM MORPHOLOGY.

Country Status (1)

Country Link
MX (1) MX377486B (en)

Also Published As

Publication number Publication date
MX2014015117A (en) 2016-06-09

Similar Documents

Publication Publication Date Title
TW200643226A (en) Plating of a thin metal seed layer
BR112015024061A2 (en) metallic coating film forming apparatus and method
WO2014071127A3 (en) Three electrode electrolytic cell and method for making hypochlorous acid
ATE505438T1 (en) METHOD FOR ACTIVATING A DIAMOND-BASED ELECTRODE
EP2905361A8 (en) Electroplating cell, metal coating and method of forming the same
PL421072A1 (en) Method for depositing metal nanoparticles on a surface in the eloctrochemical process, surface obtained by this method and its application
EP3536664A4 (en) METHOD FOR PRODUCING AN ELECTRODE, ELECTRODE PRODUCED BY THIS, MEMBRANE ELECTRODE ARRANGEMENT WITH THE ELECTRODE, AND FUEL CELL WITH THE MEMBRANE ELECTRODE ARRANGEMENT
HK1263321A1 (en) Method for producing a lithium film
BR112015025230A2 (en) cell for electroextraction of metal; anodic device for metal electroextraction cells; electrolyser for the primary extraction of metal from an electrolytic bath; and process for manufacturing copper from a solution containing cuprous and / or cupric ions
KR102415739B9 (en) Asymmetric electrolyte membrane membrane electrode assembly comprising the same water electrolysis apparatus comprising the same and method for manufacturing the same
RU2015128877A (en) SOLUTION FOR FORMING A METAL FILM AND METHOD FOR FORMING A METAL FILM
WO2015025211A3 (en) Film formation system and film formation method for forming metal film
EP2940194A8 (en) Anodic oxide film and method for sealing same
MY190427A (en) Copper-nickel alloy electroplating apparatus
MX2016001847A (en) Multi-layered coating film formation method.
MX377486B (en) SIMULTANEOUS ELECTRODEPOSITION PROCESS TO FORM FILMS WITH HOMOGENEOUS COMPOSITION AND UNIFORM MORPHOLOGY.
MX2020011189A (en) GROWTH INHIBITOR.
WO2015019152A3 (en) Film deposition device of metal film and film deposition method
AU2015296905A8 (en) System and method for the sterilization by electrolysis of the content of closed receptacles in closed receptacles and corresponding post-packaging sterilization receptacle
WO2015162306A8 (en) Method for the surface treatment of a biocorrodable implant
CN105432156B8 (en) Micro-manufacturing group electroplating technology
WO2016094336A3 (en) Method of treating a ceramic body
RU2015146338A (en) METHOD OF ELECTROLYTE-PLASMA TREATMENT OF PRODUCTS PRODUCED WITH THE APPLICATION OF ADDITIVE TECHNOLOGIES AND DEVICE FOR ITS IMPLEMENTATION
CL2018002558A1 (en) Electrode structure provided with resistors
MY180984A (en) Method for removing adhered metals from metal plate

Legal Events

Date Code Title Description
FG Grant or registration