MX2016008957A - Espectroscopia in situ para el monitoreo de la fabricacion de elementos computacionales integrados. - Google Patents

Espectroscopia in situ para el monitoreo de la fabricacion de elementos computacionales integrados.

Info

Publication number
MX2016008957A
MX2016008957A MX2016008957A MX2016008957A MX2016008957A MX 2016008957 A MX2016008957 A MX 2016008957A MX 2016008957 A MX2016008957 A MX 2016008957A MX 2016008957 A MX2016008957 A MX 2016008957A MX 2016008957 A MX2016008957 A MX 2016008957A
Authority
MX
Mexico
Prior art keywords
probe
computational elements
integrated computational
time interval
light
Prior art date
Application number
MX2016008957A
Other languages
English (en)
Other versions
MX359196B (es
Inventor
M Price James
B Nayak Aditya
l perkins David
Original Assignee
Halliburton Energy Services Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Halliburton Energy Services Inc filed Critical Halliburton Energy Services Inc
Publication of MX2016008957A publication Critical patent/MX2016008957A/es
Publication of MX359196B publication Critical patent/MX359196B/es

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
    • G05B19/4097—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by using design data to control NC machines, e.g. CAD/CAM
    • G05B19/4099—Surface or curve machining, making 3D objects, e.g. desktop manufacturing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0073—Optical laminates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/266—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by an apertured layer, the apertures going through the whole thickness of the layer, e.g. expanded metal, perforated layer, slit layer regular cells B32B3/12
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0264—Electrical interface; User interface
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0286—Constructional arrangements for compensating for fluctuations caused by temperature, humidity or pressure, or using cooling or temperature stabilization of parts of the device; Controlling the atmosphere inside a spectrometer, e.g. vacuum
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/08—Beam switching arrangements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/45—Interferometric spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G02B5/287—Interference filters comprising deposited thin solid films comprising at least one layer of organic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/418—Refractive
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/732—Dimensional properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2551/00—Optical elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J2003/1226—Interference filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G01N2021/8438—Mutilayers
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/49—Nc machine tool, till multiple
    • G05B2219/49023—3-D printing, layer of powder, add drops of binder in layer, new powder

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Human Computer Interaction (AREA)
  • Mathematical Physics (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)

Abstract

Se describen tecnologías para el monitoreo de características de capas de elementos computacionales integrados (ICE) durante la fabricación mediante el uso de un espectrómetro in situ operado en un modo de análisis por pasos en combinación con detección restringida por tiempo o fija. Como parte del modo de análisis por etapas, se analiza de forma separada un elemento de selección de longitud de onda del espectrómetro para proporcionar instancias espectralmente diferentes de la luz de sonda, de manera que cada instancia espectralmente diferente de la luz de onda se proporcione durante un intervalo de tiempo finito. De manera adicional, una instancia de la luz de sonda que interactuó durante el intervalo de tiempo finito con las capas de ICE incluye una modulación que es detectada por la detección restringida por tiempo o fija durante el intervalo de tiempo finito.
MX2016008957A 2014-02-14 2014-02-14 Espectroscopía in situ para el monitoreo de la fabricación de elementos computacionales integrados. MX359196B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2014/016603 WO2015122923A1 (en) 2014-02-14 2014-02-14 In-situ spectroscopy for monitoring fabrication of integrated computational elements

Publications (2)

Publication Number Publication Date
MX2016008957A true MX2016008957A (es) 2016-10-04
MX359196B MX359196B (es) 2018-09-19

Family

ID=53800503

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2016008957A MX359196B (es) 2014-02-14 2014-02-14 Espectroscopía in situ para el monitoreo de la fabricación de elementos computacionales integrados.

Country Status (5)

Country Link
US (1) US9727052B2 (es)
EP (1) EP2946197A4 (es)
BR (1) BR112016015543A2 (es)
MX (1) MX359196B (es)
WO (1) WO2015122923A1 (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015005905A1 (en) * 2013-07-09 2015-01-15 Halliburton Energy Services, Inc. Integrated computational elements with laterally-distributed spectral filters
JP5938155B1 (ja) * 2015-04-24 2016-06-22 大塚電子株式会社 光学測定装置および光学測定方法
US20210085186A1 (en) * 2018-05-09 2021-03-25 National Institutes For Quantum And Radiological Science And Technology Tissue identification device, tissue identification system, method of identifying tissue, and storage medium
CN110515198B (zh) * 2019-08-29 2021-08-24 河南师范大学 一种高真空低温环境下的光学斩波器

Family Cites Families (73)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5075550A (en) 1990-07-12 1991-12-24 Amoco Corporation Infrared detector for hydrogen fluoride gas
JPH06214169A (ja) 1992-06-08 1994-08-05 Texas Instr Inc <Ti> 制御可能な光学的周期的表面フィルタ
US5399229A (en) 1993-05-13 1995-03-21 Texas Instruments Incorporated System and method for monitoring and evaluating semiconductor wafer fabrication
US5453716A (en) 1993-11-22 1995-09-26 Chrysler Corporation Adjustable clip detection system
FR2716531B1 (fr) * 1994-02-18 1996-05-03 Saint Gobain Cinematique Contr Procédé de mesure d'épaisseur d'un matériau transparent.
US5537479A (en) 1994-04-29 1996-07-16 Miller And Kreisel Sound Corp. Dual-driver bass speaker with acoustic reduction of out-of-phase and electronic reduction of in-phase distortion harmonics
DE19640132B4 (de) 1996-09-28 2015-06-03 Volkswagen Ag Verfahren zur automatischen Begrenzung von Verzerrungen an Audio-Geräten und Schaltungsanordnung zur Durchführung des Verfahrens
US6217720B1 (en) 1997-06-03 2001-04-17 National Research Council Of Canada Multi-layer reactive sputtering method with reduced stabilization time
US6198531B1 (en) 1997-07-11 2001-03-06 University Of South Carolina Optical computational system
US6905578B1 (en) 1998-04-27 2005-06-14 Cvc Products, Inc. Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure
US6395563B1 (en) * 1998-12-28 2002-05-28 Matsushita Electric Industrial Co., Ltd. Device for manufacturing semiconductor device and method of manufacturing the same
FR2780778B3 (fr) * 1998-07-03 2000-08-11 Saint Gobain Vitrage Procede et dispositif pour la mesure de l'epaisseur d'un materiau transparent
US6213250B1 (en) 1998-09-25 2001-04-10 Dresser Industries, Inc. Transducer for acoustic logging
US6529276B1 (en) 1999-04-06 2003-03-04 University Of South Carolina Optical computational system
US6163259A (en) 1999-06-04 2000-12-19 Research Electronics International Pulse transmitting non-linear junction detector
US6078389A (en) 1999-08-18 2000-06-20 Zetter; Mark S. Multivariate spectroscopy with optical computation
US6777684B1 (en) 1999-08-23 2004-08-17 Rose Research L.L.C. Systems and methods for millimeter and sub-millimeter wave imaging
JP2001110806A (ja) * 1999-10-12 2001-04-20 Matsushita Electric Ind Co Ltd 半導体装置の製造方法及びその製造装置
US20020090650A1 (en) 2000-04-06 2002-07-11 Quantum Dot Corporation Two-dimensional spectral imaging system
US7138156B1 (en) * 2000-09-26 2006-11-21 Myrick Michael L Filter design algorithm for multi-variate optical computing
US6646753B2 (en) 2000-10-05 2003-11-11 Unaxis, Usa, Inc. In-situ thickness and refractive index monitoring and control system for thin film deposition
US6804060B1 (en) 2001-09-28 2004-10-12 Fibera, Inc. Interference filter fabrication
US7163901B2 (en) 2002-03-13 2007-01-16 Varian Semiconductor Equipment Associates, Inc. Methods for forming thin film layers by simultaneous doping and sintering
TWI303090B (en) 2002-08-13 2008-11-11 Lam Res Corp Method for in-situ monitoring of patterned substrate processing using reflectometry
US6965431B2 (en) 2003-02-28 2005-11-15 Ut-Battelle, Llc Integrated tunable optical sensor (ITOS) system
EP1515158B1 (en) 2003-09-09 2013-07-17 Esaote S.p.A. Ultrasound imaging method combined with the presence of contrast media in the body under examination
US7753847B2 (en) 2003-10-03 2010-07-13 Mayo Foundation For Medical Education And Research Ultrasound vibrometry
WO2005093904A1 (en) 2004-01-14 2005-10-06 The Penn State Research Foundation Reconfigurable frequency selective surfaces for remote sensing of chemical and biological agents
WO2005079385A2 (en) 2004-02-13 2005-09-01 Coronado Technology Group, L.L.C. Fabrication of narrow-band thin-film optical filters
WO2006031733A2 (en) 2004-09-13 2006-03-23 The University Of South Carolina Thin film interference filter and bootstrap method for interference filter thin film deposition process control
WO2006063094A1 (en) 2004-12-09 2006-06-15 Caleb Brett Usa Inc. In situ optical computation fluid analysis system and method
US7828929B2 (en) 2004-12-30 2010-11-09 Research Electro-Optics, Inc. Methods and devices for monitoring and controlling thin film processing
US7224540B2 (en) 2005-01-31 2007-05-29 Datalogic Scanning, Inc. Extended depth of field imaging system using chromatic aberration
WO2007015115A1 (en) 2005-08-01 2007-02-08 Stergios Logothetidis In-situ and real-time determination of the thickness, optical properties and quality of transparent coatings
US7545503B2 (en) * 2005-09-27 2009-06-09 Verity Instruments, Inc. Self referencing heterodyne reflectometer and method for implementing
WO2007064579A1 (en) 2005-11-28 2007-06-07 University Of South Carolina Optical analysis system and elements to isolate spectral region
WO2007062202A1 (en) 2005-11-28 2007-05-31 University Of South Carolina Novel multivariate optical elements for optical analysis system
US8164061B2 (en) 2006-09-13 2012-04-24 Delphi Technologies, Inc. Method and apparatus for a universal infrared analyzer
WO2008057913A2 (en) * 2006-11-02 2008-05-15 University Of South Carolina Improved signal processing for optical computing system
US7777870B2 (en) 2006-12-12 2010-08-17 Evident Technologies, Inc. Method and system for the recognition of an optical signal
US8106850B1 (en) 2006-12-21 2012-01-31 Hrl Laboratories, Llc Adaptive spectral surface
WO2008106391A1 (en) 2007-02-28 2008-09-04 University Of South Carolina Design of multivariate optical elements for nonlinear calibration
FR2913210B1 (fr) 2007-03-02 2009-05-29 Sidel Participations Perfectionnements a la chauffe des matieres plastiques par rayonnement infrarouge
DE102007034289B3 (de) * 2007-07-20 2009-01-29 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Verfahren zur in-situ-Bestimmung der stofflichen Zusammensetzung von optisch dünnen Schichten, Anordnungen zur Durchführung und Anwendungen des Verfahrens
US8699027B2 (en) 2007-07-27 2014-04-15 Rudolph Technologies, Inc. Multiple measurement techniques including focused beam scatterometry for characterization of samples
US7792644B2 (en) 2007-11-13 2010-09-07 Battelle Energy Alliance, Llc Methods, computer readable media, and graphical user interfaces for analysis of frequency selective surfaces
US20090182693A1 (en) 2008-01-14 2009-07-16 Halliburton Energy Services, Inc. Determining stimulation design parameters using artificial neural networks optimized with a genetic algorithm
US7835005B2 (en) 2008-02-21 2010-11-16 Thermo Fisher Scientific Inc. Gas analyzer system
US20100004773A1 (en) 2008-07-01 2010-01-07 Phystech, Inc Apparatus for characterization of thin film properties and method of using the same
US8216161B2 (en) 2008-08-06 2012-07-10 Mirabilis Medica Inc. Optimization and feedback control of HIFU power deposition through the frequency analysis of backscattered HIFU signals
US8252112B2 (en) 2008-09-12 2012-08-28 Ovshinsky Innovation, Llc High speed thin film deposition via pre-selected intermediate
US8054212B1 (en) 2009-03-27 2011-11-08 The Boeing Company Multi-band receiver using harmonic synchronous detection
US8125641B2 (en) 2009-03-27 2012-02-28 N&K Technology, Inc. Method and apparatus for phase-compensated sensitivity-enhanced spectroscopy (PCSES)
WO2011103066A2 (en) 2010-02-16 2011-08-25 Sky Holdings Company, Llc Systems, methods and apparatuses for remote device detection
TWI547683B (zh) * 2010-12-06 2016-09-01 Univ Nat Central Multi - wavelength optical measurement method for thin film elements
US20120150451A1 (en) 2010-12-13 2012-06-14 Halliburton Energy Services, Inc. Optical Computation Fluid Analysis System and Method
SG192120A1 (en) 2011-02-11 2013-08-30 Halliburton Energy Serv Inc Method for fabrication of a multivariate optical element
US20130032338A1 (en) * 2011-08-05 2013-02-07 Halliburton Energy Services, Inc. Methods for Fluid Monitoring in a Subterranean Formation Using One or More Integrated Computational Elements
US9441149B2 (en) 2011-08-05 2016-09-13 Halliburton Energy Services, Inc. Methods for monitoring the formation and transport of a treatment fluid using opticoanalytical devices
US20130035262A1 (en) 2011-08-05 2013-02-07 Freese Robert P Integrated Computational Element Analytical Methods for Microorganisms Treated with a Pulsed Light Source
CN104114999B (zh) 2011-09-27 2017-06-09 科磊股份有限公司 高吞吐量薄膜特性化及缺陷检测
US9013698B2 (en) 2012-04-26 2015-04-21 Halliburton Energy Services, Inc. Imaging systems for optical computing devices
US9658149B2 (en) 2012-04-26 2017-05-23 Halliburton Energy Services, Inc. Devices having one or more integrated computational elements and methods for determining a characteristic of a sample by computationally combining signals produced therewith
US9013702B2 (en) 2012-04-26 2015-04-21 Halliburton Energy Services, Inc. Imaging systems for optical computing devices
US8941046B2 (en) 2012-04-26 2015-01-27 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9080943B2 (en) 2012-04-26 2015-07-14 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8823939B2 (en) 2012-04-26 2014-09-02 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9383307B2 (en) 2012-04-26 2016-07-05 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9702811B2 (en) 2012-04-26 2017-07-11 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance using integrated computational elements
US9019501B2 (en) 2012-04-26 2015-04-28 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8879053B2 (en) 2012-04-26 2014-11-04 Halliburton Energy Services, Inc. Devices having an integrated computational element and a proximal interferent monitor and methods for determining a characteristic of a sample therewith
US8912477B2 (en) 2012-04-26 2014-12-16 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8780352B2 (en) * 2012-04-26 2014-07-15 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance

Also Published As

Publication number Publication date
US9727052B2 (en) 2017-08-08
EP2946197A4 (en) 2016-12-21
BR112016015543A2 (pt) 2017-08-08
EP2946197A1 (en) 2015-11-25
MX359196B (es) 2018-09-19
US20160224016A1 (en) 2016-08-04
WO2015122923A1 (en) 2015-08-20

Similar Documents

Publication Publication Date Title
IL282673B (en) Spectroscopic beam profile metrology
ZA201807687B (en) Performing optical measurements on a sample
IL259980A (en) Structure measurements using Raman spectroscopy
EP3197352A4 (en) Integrated terahertz sensor
EP3521809A4 (en) SPECTROGRAPH TO DETECT A FULLY POLARIZED TERAHERTZ STATE
EP3099896A4 (en) Fluid analysis by optical spectroscopy with photoacoustic detection
EP3104165A4 (en) Terahertz wave phase difference measurement device
EP3413021A4 (en) METHOD OF MEASURING SPECTRUM USING A FOURIER TRANSFORM TYPE SPECTROMETER
EP3208605A4 (en) INSPECTION DEVICE USING THz BAND
EP3246675A4 (en) THz BOLOMETER DETECTOR
FR3042272B1 (fr) Bolometre a forte sensibilite spectrale.
EP3722787A4 (en) SPECTROSCOPIC ANALYZER
EP3271705A4 (en) Structures for surface enhanced raman spectroscopy
EP3169969A4 (en) Interferometric encoders using spectral analysis
EP3237944A4 (en) Tdlas architecture for widely spaced wavelengths
EP3367085A4 (en) TIME-RESOLVING SPECTROSCOPY DEVICE TERRAHERTZ
MX2016008957A (es) Espectroscopia in situ para el monitoreo de la fabricacion de elementos computacionales integrados.
GB2547350B (en) Molecular cell imaging using optical spectroscopy
EP3230715A4 (en) Optical spectroscopic measurement system
PL3500865T3 (pl) Optyczny analizator widma rf
DK3173819T3 (da) Borehulsmåling via afstemmelig kildelasere
EP3679385A4 (en) LOOP-GAP RESONATORS FOR SPIN RESONANCE SPECTROSCOPY
EP3523503A4 (en) ADJUSTABLE DIPOLAR MOMENT FOR TRAINING MEASUREMENTS
EP3686568A4 (en) FOURIER SPECTROSCOPIC ANALYZER
EP3133379A4 (en) Terahertz-wave detector

Legal Events

Date Code Title Description
FG Grant or registration