MX2007015027A - Detector de silicio que extiende la sensibilidad de silicio desde 200 y hasta 1100 nm con alta eficiencia. - Google Patents
Detector de silicio que extiende la sensibilidad de silicio desde 200 y hasta 1100 nm con alta eficiencia.Info
- Publication number
- MX2007015027A MX2007015027A MX2007015027A MX2007015027A MX2007015027A MX 2007015027 A MX2007015027 A MX 2007015027A MX 2007015027 A MX2007015027 A MX 2007015027A MX 2007015027 A MX2007015027 A MX 2007015027A MX 2007015027 A MX2007015027 A MX 2007015027A
- Authority
- MX
- Mexico
- Prior art keywords
- silicon
- high efficiency
- cost effective
- sensibility
- sro
- Prior art date
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title abstract 10
- 229910052710 silicon Inorganic materials 0.000 title abstract 10
- 239000010703 silicon Substances 0.000 title abstract 10
- 238000005516 engineering process Methods 0.000 abstract 3
- 238000004519 manufacturing process Methods 0.000 abstract 3
- 238000012512 characterization method Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 238000001228 spectrum Methods 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02322—Optical elements or arrangements associated with the device comprising luminescent members, e.g. fluorescent sheets upon the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier
- H01L31/103—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier the potential barrier being of the PN homojunction type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by at least one potential-jump barrier or surface barrier, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier
- H01L31/105—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier or surface barrier the potential barrier being of the PIN type
Abstract
La tecnología de silicio es sin lugar a dudas la más económica y madura, y por tanto los foto-detectores de silicio son los más económicos y simples de fabricar. Sin embargo, el silicio tiene limitaciones para detectar radiación debajo de 400 nm (UV). Aquí se presenta el desarrollo y caracterización de un sensor de Silicio con SRO que presenta una alta eficiencia en la región Ultravioleta del espectro electromagnético en el rango de 200-400 nm. El dispositivo desarrollado es una integración de una película de SRO (óxido de silicio rico en silicio) con un fotodiodo de silicio y donde el proceso de fabricación es totalmente compatible con la tecnología de silicio. Tiene como principales ventajas su compatibilidad con el silicio, su proceso de fabricación muy simple y su costo muy económico .
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
MX2007015027A MX2007015027A (es) | 2007-11-21 | 2007-11-21 | Detector de silicio que extiende la sensibilidad de silicio desde 200 y hasta 1100 nm con alta eficiencia. |
US12/322,429 US20090218649A1 (en) | 2007-11-21 | 2009-01-31 | Highly efficient silicon detector with wide spectral range |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
MX2007015027A MX2007015027A (es) | 2007-11-21 | 2007-11-21 | Detector de silicio que extiende la sensibilidad de silicio desde 200 y hasta 1100 nm con alta eficiencia. |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2007015027A true MX2007015027A (es) | 2009-05-21 |
Family
ID=41012526
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2007015027A MX2007015027A (es) | 2007-11-21 | 2007-11-21 | Detector de silicio que extiende la sensibilidad de silicio desde 200 y hasta 1100 nm con alta eficiencia. |
Country Status (2)
Country | Link |
---|---|
US (1) | US20090218649A1 (es) |
MX (1) | MX2007015027A (es) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010272577A (ja) * | 2009-05-19 | 2010-12-02 | Takehisa Sasaki | 放射線検出素子、及び、放射線検出装置 |
JP2019047037A (ja) * | 2017-09-05 | 2019-03-22 | 株式会社東芝 | 光検出器 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5093576A (en) * | 1991-03-15 | 1992-03-03 | Cree Research | High sensitivity ultraviolet radiation detector |
IT1277856B1 (it) * | 1995-02-09 | 1997-11-12 | Univ Roma | Rivelatore di radiazione ultravioletta in film sottile, con opzione di elevata selettivita' spettrale. |
US20080139004A1 (en) * | 2006-12-12 | 2008-06-12 | Massachusetts Institute Of Technology | Light emission from silicon-based nanocrystals by sequential thermal annealing approaches |
US7569864B2 (en) * | 2006-05-03 | 2009-08-04 | Atomic Energy Council-Institute Of Nuclear Energy Research | Silicon-rich-oxide white light photodiode |
US7611922B2 (en) * | 2006-11-13 | 2009-11-03 | Dongbu Hitek Co., Ltd. | Image sensor and method for manufacturing the same |
-
2007
- 2007-11-21 MX MX2007015027A patent/MX2007015027A/es active IP Right Grant
-
2009
- 2009-01-31 US US12/322,429 patent/US20090218649A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20090218649A1 (en) | 2009-09-03 |
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Legal Events
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FG | Grant or registration |