MD972C2 - Solution for electroless copper plating of dielectrics - Google Patents

Solution for electroless copper plating of dielectrics

Info

Publication number
MD972C2
MD972C2 MD97-0298A MD970298A MD972C2 MD 972 C2 MD972 C2 MD 972C2 MD 970298 A MD970298 A MD 970298A MD 972 C2 MD972 C2 MD 972C2
Authority
MD
Moldova
Prior art keywords
solution
copper plating
dielectrics
electroless copper
copper
Prior art date
Application number
MD97-0298A
Other languages
Romanian (ro)
Russian (ru)
Inventor
Ion Vataman
Валентин ДОЛГИЕРУ
Николае ГЭРБЭЛЭУ
Tudor Jovmir
Original Assignee
Институт Химии Академии Наук Молдовы
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Институт Химии Академии Наук Молдовы filed Critical Институт Химии Академии Наук Молдовы
Priority to MD97-0298A priority Critical patent/MD972C2/en
Publication of MD972C2 publication Critical patent/MD972C2/en

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  • Chemically Coating (AREA)

Abstract

The invention relates to the chemical metallization, particularly, to dielectric surface copper plating.According to the invention the copper plating is realized by using the solution comprising, g/L:copper sulfate pentahydrate 25...50potassium-sodium tartrate 90...150sodium hydroxide 35...45stabilizer: thiosemicarbazoneof 3-formylsalicylic acid 0,01...0,02.Inclusion of said stabilizer in the solution allows to increase the speed of copper plating at the room temperature till 13...20 µm/h. The solution is stable for 6 months, can be multiple corrected, ensures to obtain dense, homogeneous and microcrystalline copper coatings.
MD97-0298A 1997-11-17 1997-11-17 Solution for electroless copper plating of dielectrics MD972C2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
MD97-0298A MD972C2 (en) 1997-11-17 1997-11-17 Solution for electroless copper plating of dielectrics

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MD97-0298A MD972C2 (en) 1997-11-17 1997-11-17 Solution for electroless copper plating of dielectrics

Publications (1)

Publication Number Publication Date
MD972C2 true MD972C2 (en) 1998-11-30

Family

ID=62142669

Family Applications (1)

Application Number Title Priority Date Filing Date
MD97-0298A MD972C2 (en) 1997-11-17 1997-11-17 Solution for electroless copper plating of dielectrics

Country Status (1)

Country Link
MD (1) MD972C2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU456050A1 (en) * 1972-11-29 1975-01-05 Предприятие П/Я А-1120 Solution for chemical copper plating dielectrics
US4301196A (en) * 1978-09-13 1981-11-17 Kollmorgen Technologies Corp. Electroless copper deposition process having faster plating rates

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU456050A1 (en) * 1972-11-29 1975-01-05 Предприятие П/Я А-1120 Solution for chemical copper plating dielectrics
US4301196A (en) * 1978-09-13 1981-11-17 Kollmorgen Technologies Corp. Electroless copper deposition process having faster plating rates

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Øàëêàóñêàñ Ì. è Âàøêàëèñ À. Õèìè÷åñêàÿ ìåòàëëèçàöèÿ ïëàñòìàññ. Ë., Õèìèÿ, 1985 г., ñ. 91-93. *

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