MD357G2 - Method of regeneration of worked-out solution for copper etching - Google Patents
Method of regeneration of worked-out solution for copper etchingInfo
- Publication number
- MD357G2 MD357G2 MD95-0198A MD950198A MD357G2 MD 357 G2 MD357 G2 MD 357G2 MD 950198 A MD950198 A MD 950198A MD 357 G2 MD357 G2 MD 357G2
- Authority
- MD
- Moldova
- Prior art keywords
- worked
- etching solution
- copper
- regeneration
- out etching
- Prior art date
Links
- 238000005530 etching Methods 0.000 title abstract 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title abstract 3
- 229910052802 copper Inorganic materials 0.000 title abstract 3
- 239000010949 copper Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- 230000008929 regeneration Effects 0.000 title 1
- 238000011069 regeneration method Methods 0.000 title 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 abstract 6
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- 235000006408 oxalic acid Nutrition 0.000 abstract 2
- 230000001376 precipitating effect Effects 0.000 abstract 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 229910001431 copper ion Inorganic materials 0.000 abstract 1
- 229910052500 inorganic mineral Inorganic materials 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 239000011707 mineral Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
The invention relates to metals chemical treatment, particularly to copper etching.The summary of the invention consists in the fact that the worked out etching solution is treated with oxalic acid, which is a precipitating agent of copper ions. The oxalic acid is introduced in the worked-out etching solution in a quantity of 1,96-2,00 grams for each gram of the precipitated copper.The implementation of the above-mentioned method gives the possibility to regenerate more than 9 times the worked-out etching solution, to reduce the mineral acid and precipitating agent consumption, as well as to diminish the ecological danger.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MD95-0198A MD357G2 (en) | 1995-03-17 | 1995-03-17 | Method of regeneration of worked-out solution for copper etching |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MD95-0198A MD357G2 (en) | 1995-03-17 | 1995-03-17 | Method of regeneration of worked-out solution for copper etching |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| MD357F1 MD357F1 (en) | 1995-12-31 |
| MD357G2 true MD357G2 (en) | 1996-09-30 |
Family
ID=19738648
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MD95-0198A MD357G2 (en) | 1995-03-17 | 1995-03-17 | Method of regeneration of worked-out solution for copper etching |
Country Status (1)
| Country | Link |
|---|---|
| MD (1) | MD357G2 (en) |
-
1995
- 1995-03-17 MD MD95-0198A patent/MD357G2/en active IP Right Grant
Non-Patent Citations (2)
| Title |
|---|
| 107. 460092. 004. 01-86.Платы печатные.Типовые технологические процессы.Часть 1,1987, с.234,288. * |
| de autor nr. 1280045,SU,Int . Cl6. C 23 F1/46,C 23 G1/36. * |
Also Published As
| Publication number | Publication date |
|---|---|
| MD357F1 (en) | 1995-12-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG3A | Granted patent for invention | ||
| IF99 | Valid patent on 19990615 |
Free format text: EXPIRES: 20150317 |