MD20130050A2 - Process and device for producing plasma by electropulse discharges - Google Patents
Process and device for producing plasma by electropulse dischargesInfo
- Publication number
- MD20130050A2 MD20130050A2 MDA20130050A MD20130050A MD20130050A2 MD 20130050 A2 MD20130050 A2 MD 20130050A2 MD A20130050 A MDA20130050 A MD A20130050A MD 20130050 A MD20130050 A MD 20130050A MD 20130050 A2 MD20130050 A2 MD 20130050A2
- Authority
- MD
- Moldova
- Prior art keywords
- electropulse
- discharges
- capacitor bank
- producing plasma
- cathode
- Prior art date
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
The invention relates to the field of general physics, in particular to processes for producing plasma by electropulse discharges and can be used in various devices and methods for metallic material working, for producing films on surfaces, for molecule exciting to produce secondary radiations with wavelengths comprising the whole spectrum of radiation.The process for producing plasma consists in carrying out unipolar electropulse discharges between the anode and the cathode. The anode is connected to the positive terminal of the capacitor bank and the cathode is connected directly to the ground. The capacitor bank with the capacitance C=0,083 µF is charged from a RC type current pulse generator to the voltage of 20…25 kV. Charging of the capacitor bank is provided by the presence of the ballast resistance R=10 MΩ. The pulse discharges of the capacitor bank have the duration τ=0.2…0.25 µs. The peak value of the total discharge current is not less than 150 kA and in the electrode gap is realized a power P=20…30 MW.The device for producing plasma by unipolar electropulse discharges, in order to prevent leakage of charge to the ground, has a connected ballast resistance R=10 MΩ. Between the cathode and the ground is connected an electronic switch D, providing a polarity of the electropulse discharge, and the power supply of the capacitor bank C generates charging pulses with the voltage Ui=20…25 kV and the duration of 1 µs.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MDA20130050A MD20130050A2 (en) | 2013-07-25 | 2013-07-25 | Process and device for producing plasma by electropulse discharges |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| MDA20130050A MD20130050A2 (en) | 2013-07-25 | 2013-07-25 | Process and device for producing plasma by electropulse discharges |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MD20130050A2 true MD20130050A2 (en) | 2015-01-31 |
Family
ID=62142873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MDA20130050A MD20130050A2 (en) | 2013-07-25 | 2013-07-25 | Process and device for producing plasma by electropulse discharges |
Country Status (1)
| Country | Link |
|---|---|
| MD (1) | MD20130050A2 (en) |
-
2013
- 2013-07-25 MD MDA20130050A patent/MD20130050A2/en not_active Application Discontinuation
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FA9A | Abandonment or withdrawal of application (patent for invention) |