LU64738A1 - - Google Patents

Info

Publication number
LU64738A1
LU64738A1 LU64738DA LU64738A1 LU 64738 A1 LU64738 A1 LU 64738A1 LU 64738D A LU64738D A LU 64738DA LU 64738 A1 LU64738 A1 LU 64738A1
Authority
LU
Luxembourg
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of LU64738A1 publication Critical patent/LU64738A1/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
LU64738D 1971-02-09 1972-02-07 LU64738A1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE762681A BE762681A (nl) 1971-02-09 1971-02-09 Inrichting voor het opdampen van een metalen deklaag op een langwerpig substraat met behulp van tenminste een elektronenkanon.

Publications (1)

Publication Number Publication Date
LU64738A1 true LU64738A1 (https=) 1972-07-03

Family

ID=3857695

Family Applications (1)

Application Number Title Priority Date Filing Date
LU64738D LU64738A1 (https=) 1971-02-09 1972-02-07

Country Status (9)

Country Link
US (1) US3777704A (https=)
JP (1) JPS5019519B1 (https=)
BE (1) BE762681A (https=)
DE (1) DE2204467A1 (https=)
FR (1) FR2124467B1 (https=)
GB (1) GB1344432A (https=)
IT (1) IT948377B (https=)
LU (1) LU64738A1 (https=)
NL (1) NL151138B (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4153005A (en) * 1977-07-06 1979-05-08 United Technologies Corporation Multiple electron beam vacuum vapor deposition apparatus
EP0241721B1 (en) * 1986-03-18 1992-09-23 Sumitomo Electric Industries, Ltd. Conductor and method of producing the same
DE3634598C2 (de) * 1986-10-10 1994-06-16 Leybold Ag Verfahren und Vorrichtung zum reaktiven Aufdampfen von Metallverbindungen
EP0392082B1 (en) * 1989-04-14 1996-01-31 Katayama Special Industries, Ltd. Method for manufacturing a metallic porous sheet
JPH089774B2 (ja) * 1990-06-25 1996-01-31 三菱電機株式会社 薄膜形成装置
AT400040B (de) * 1993-06-02 1995-09-25 Andritz Patentverwaltung Verfahren und vorrichtung zur beschichtung von metallsubstraten, insbesondere stahl- oder aluminiumbblechen in bandform
DE102013104086B3 (de) * 2013-04-23 2014-10-23 Von Ardenne Anlagentechnik Gmbh Elektronenstrahl-Verdampfungsanordnung und Verfahren zum Elektronenstrahl-Verdampfen
DE102013107454B4 (de) * 2013-07-15 2020-02-06 VON ARDENNE Asset GmbH & Co. KG Elektronenstrahlprozessanordnung, mobile Auswertevorrichtung, Verfahren zum Betreiben eines Elektronenstrahlverdampfers; und Verfahren zum Kalibrieren einer Elektronenstrahlprozessanordnung
JP7058499B2 (ja) * 2017-12-08 2022-04-22 住友化学株式会社 蒸着源、電子ビーム真空蒸着装置及び電子デバイスの製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046936A (en) * 1958-06-04 1962-07-31 Nat Res Corp Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof
US3432335A (en) * 1966-03-15 1969-03-11 Lokomotivbau Elektrotech Cyclically moving electron beam for uniform vapor deposited coating
US3502499A (en) * 1967-05-22 1970-03-24 Texas Instruments Inc Cladding method and apparatus
US3576670A (en) * 1969-02-19 1971-04-27 Gulf Energy & Environ Systems Method for making a superconducting material

Also Published As

Publication number Publication date
FR2124467B1 (https=) 1977-04-01
BE762681A (nl) 1971-07-16
GB1344432A (en) 1974-01-23
NL151138B (nl) 1976-10-15
JPS5019519B1 (https=) 1975-07-08
US3777704A (en) 1973-12-11
IT948377B (it) 1973-05-30
DE2204467A1 (de) 1972-09-14
FR2124467A1 (https=) 1972-09-22
NL7201042A (https=) 1972-08-11

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