LT6070B - Preparation of plastic surface for chemical metallization process - Google Patents

Preparation of plastic surface for chemical metallization process Download PDF

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Publication number
LT6070B
LT6070B LT2012110A LT2012110A LT6070B LT 6070 B LT6070 B LT 6070B LT 2012110 A LT2012110 A LT 2012110A LT 2012110 A LT2012110 A LT 2012110A LT 6070 B LT6070 B LT 6070B
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LT
Lithuania
Prior art keywords
solution
etching
chemical metallization
plastic surface
plastics
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Application number
LT2012110A
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Lithuanian (lt)
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LT2012110A (en
Inventor
Leonas NARUŠKEVIČIUS
Danas Budilovskis
Ona GYLIENĖ
TAMAŠIŪNAITĖ Loreta TAMAŠAUSKAITĖ
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Atotech Deutschland Gmbh
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Publication date
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Priority to LT2012110A priority Critical patent/LT6070B/en
Priority to KR1020157018064A priority patent/KR20150093214A/en
Priority to KR1020177009056A priority patent/KR20170039775A/en
Priority to US14/647,499 priority patent/US20150307992A1/en
Priority to JP2015546043A priority patent/JP2015537122A/en
Priority to BR112015012930A priority patent/BR112015012930A2/en
Priority to EP13799621.1A priority patent/EP2928984A1/en
Priority to CN201380063675.4A priority patent/CN104854216A/en
Priority to PCT/EP2013/075863 priority patent/WO2014087004A1/en
Priority to CA2893664A priority patent/CA2893664C/en
Publication of LT2012110A publication Critical patent/LT2012110A/en
Publication of LT6070B publication Critical patent/LT6070B/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22Roughening, e.g. by etching
    • C23C18/24Roughening, e.g. by etching using acid aqueous solutions
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/044Forming conductive coatings; Forming coatings having anti-static properties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/06Coating with compositions not containing macromolecular substances
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • C09K13/04Etching, surface-brightening or pickling compositions containing an inorganic acid
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073Multistep pretreatment
    • C23C18/2086Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22Roughening, e.g. by etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/285Sensitising or activating with tin based compound or composition
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • C23C18/40Coating with copper using reducing agents
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34Pretreatment of metallic surfaces to be electroplated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1653Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • C23C18/40Coating with copper using reducing agents
    • C23C18/405Formaldehyde
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    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/18Heterocyclic compounds
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    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • C25D5/50After-treatment of electroplated surfaces by heat-treatment

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

The invention relates to the plastic surface preparation for chemical metallization and can be used in various industries, which provide a decorative or functional metallic coatings on plastics. It aims the high-quality plastic surface preparation for chemical metallization using hot chlorate etching solution and thereby saving high adhesion values of nickel coatings with plastics. The aim is achieved by the fact that the plastic surface preparation for chemical metallization process comprises etching the surface with sulfuric acid, containing chlorate iones and an additional oxidant and following treatment with a solution containing alkali metal hydroxide, activation in palladium salt solution and treatment with reducing or accelerating solution, it added to the etching solution 0.1 to 8 g/l vanadium compound and etching performs at 20-65 oC.

Description

Išradimas priskiriamas prie plastikų paviršiaus paruošimo prieš cheminį metalizavimą ir gali būti panaudotas įvairiose pramones srityse, kur reikalingos dekoratyvinės arba funkcinės metalų dangos ant plastikinių detalių.The invention relates to the surface preparation of plastics prior to chemical metallization and can be used in a variety of industrial applications where decorative or functional metal coatings on plastic parts are required.

Tradicinį plastikų paviršiaus paruošimo prieš cheminį metalizavimą būdą, dažniausiai cheminį nikeliavimą, sudaro ėsdinimas chromo rūgšties tirpale, po to sekantis aktyvinimas paladžio junginių joniniame arba koloidiniame tirpale ir adsorbuotų ant plastiko paviršiaus paladžio jonų arba paladžio koloidinių dalelių atitinkamai redukavimas dažniausiai natrio hipofosfito tirpale arba akceleracija rūgščiame, dažniausiai druskos rūgšties, tirpale.The conventional method of surface preparation of plastics prior to chemical metallization, usually chemical nickelization, involves etching in a solution of chromic acid followed by activation in an ionic or colloidal solution of palladium compounds and appropriate reduction of palladium or palladium colloidal particles adsorbed on the plastic surface usually in a solution of hydrochloric acid.

Ėsdinimas reikalingas suteikti paviršiui hidrofiliškumą, kad kitose proceso stadijose jis drėkintųsi vandeniniais tirpalais, adsorbuodamas pakankamus paladžio druskų kiekius, ir užtikrinti gerą metalo dangos sukibimą su plastiku. Aktyvavimas su po to sekančiu redukavimu arba akceleracija atliekamas tam, kad inicijuoti cheminio metalo nusėdimo ant plastiko pradžią. Po to dengimasis metalu cheminio metalizavimo tirpale jau vyksta autokatalitiškai, t.y. išsėdęs iš tirpalo metalas katalizuoja tolimesnį metalo nusėdimą.Etching is required to give the surface hydrophilicity so that, at other stages of the process, it is wetted with aqueous solutions by adsorbing sufficient amounts of palladium salts and ensuring good adhesion of the metal coating to the plastic. Activation with subsequent reduction or acceleration is performed to initiate the chemical deposition of the metal on the plastic. After that, the metal plating in the chemical metallization solution is already autocatalytic, i.e. the precipitated metal from the solution catalyzes further metal deposition.

Pagrindiniai tradicinio būdo trūkumai yra chromo rūgšties ėsdinimo tirpale kancerogeniškumas bei dažnai pasitaikantis cheminis metalo, dažniausiai nikelio, nusėdimas ant izoliuotų plastizoliu pakabos dalių, dėl ko patiriami metalų nuostoliai toliau sekančio galvaninio dangos formavimo tirpaluose. Artimiausias siūlomam išradimui yra plastikų paviršiaus paruošimo būdas (žiūr. LR išradimo paraiška 2012 042, padavimo data 2012-06-05), apimantis plastiko ėsdinimą kambario temperatūros 0,5-5 g/l tirpaus chlorato tirpale 50-80 tūrio % sieros rūgštyje ir po to sekantį apdorojimą šarminių metalų hidroksidų tirpale. Ėsdinimo tirpalas papildomai turi, be chlorato, kito oksidatoriaus, kurio standartinis oksidacinis potencialas viršija chlorato jonų potencialą. Po apdorojimo šarminių metalų hidroksidų tirpale plastikas aktyvuojamas paladžio junginių tirpale, toliau išlaikomas redukuojančiame arba akseleruojančiame tirpale ir nikeliuojamas cheminio nikeliavimo tirpale. Būdo teigiami bruožai yra didelės nikelio dangos su plastiku sukibimo reikšmės ir tai, kad plastizoliu padengta plastikų detalizavimo įranga išlieka nepasidengusi nikelio danga.The main disadvantages of the conventional method are the carcinogenicity of the etching solution of chromic acid and the frequent chemical deposition of metal, usually nickel, on the insulated plastisol suspension parts, which results in metal losses in subsequent electroplating solutions. The closest embodiment of the present invention is a method of surface preparation of plastics (see LR Application 2012 042, filed June 5, 2012), which comprises etching plastic at room temperature in a solution of 0.5-5 g / l soluble chlorate in 50-80 vol% sulfuric acid and followed by treatment with an alkali metal hydroxide solution. The etching solution additionally contains, in addition to chlorate, another oxidizing agent whose standard oxidative potential is greater than that of chlorate ions. After treatment with an alkali metal hydroxide solution, the plastic is activated in a solution of palladium compounds, further retained in a reducing or accelerating solution, and nickelized in a chemical nickel solution. Positive features of the process are the high adhesion values of the nickel coating to the plastic and the fact that the plastisol coated plastic detailing equipment remains uncoated with the nickel coating.

Būdo trūkumas - ėsdinimo tirpalo savybė absorbuoti iš aplinkos oro vandens garus ir tokiu būdu prasiskiedžiant, praranda efektyvaus ėsdinimo savybes. Šios problemos sprendimas būtų ėsdinimo tirpalo temperatūros didinimas iki lygio, kai oro drėgmės absorbciją kompensuoja vandens garavimas iš tirpalo. Tačiau tais atvejais, kai ėsdinimo tirpalo temperatūra viršija 30 °C, gaunamos nikelio dangos sukibimo su plastiku reikšmės yra žymiai mažesnės ir netgi gali kristi iki nulio.The disadvantage of the method is the ability of the etching solution to absorb water vapor from the ambient air and thereby dilute it, losing its effective etching properties. The solution to this problem would be to increase the temperature of the etching solution to a level where the moisture absorption of the air is offset by evaporation of water from the solution. However, where the temperature of the etching solution is above 30 ° C, the resulting values of plastic bonding for the nickel coating are significantly lower and may even drop to zero.

Siūlomo išradimo tikslas yra kokybiškas plastikų paviršiaus paruošimas prieš cheminį metalizavimą, naudojant karštą chloratinj ėsdinimo tirpalą, ir tuo išsaugant aukštas nikelio dangos sukibimo su plastiku reikšmes.The object of the present invention is to provide a high quality surface preparation of plastics prior to chemical metallization using a hot chlorinated etching solution while maintaining high values of adhesion of the nickel coating to the plastic.

Tikslas pasiekiamas tuo, kad plastikų paviršiaus paruošimo prieš jų cheminj metalizavimą būdas, apimantis paviršiaus ėsdinimą chlorato jonų ir papildomo oksidatoriaus turinčiame sieros rūgšties tirpale ir po jo sekantį apdorojimą šarminio metalo hidroksidų turinčiame tirpale, aktyvavimą paladžio druskos tirpale bei apdorojimą redukuojančiame arba akceleruojančiame tirpale, papildomai į ėsdinimo tirpalą įveda 0,1-8 g/l vanadžio junginio, o ėsdinimą atlieka 20-65 °C temperatūroje.The object is achieved by a method of surface preparation of plastics prior to their chemical metallization, comprising surface etching in a solution of sulfuric acid containing a chlorate ion and an additional oxidant followed by treatment in a solution containing an alkali metal hydroxide, activation in a palladium salt solution and treatment in a reducing or accelerating solution. the etching solution is introduced at 0.1-8 g / l of vanadium compound and etched at 20-65 ° C.

Įeinantis j ėsdinimo tirpalo sudėtj vanadžio junginys dalyvauja plastiko ėsdinimo procese tiek kaip papildomas plastiko paviršių oksiduojantis agentas, tiek kaip katalizatorius chlorato jonų oksiduojamajam veikimui. Turintį vanadžio junginio ėsdinimo tirpalą naudoja esant 20-65 °C temperatūrai, o gaunamų ant plastiko nikelio dangų adhezijos reikšmės yra ne žemesnės, negu prototipo. Be to, toks tirpalas, naudojant jį aukštesnės temperatūros, gali būti labiau praskiestas sieros rūgšties atžvilgiu ir todėl pigesnis ir saugesnis darbe.The incoming vanadium compound in the etching solution is involved in the etching process of the plastic both as an additional oxidizing agent on the plastic surface and as a catalyst for the oxidative action of the chlorate ions. The vanadium-containing etching solution is used at temperatures between 20-65 ° C and the resulting adhesion values on nickel-plated plastic coatings are not lower than those of the prototype. In addition, such a solution, when used at higher temperatures, may be more dilute with respect to sulfuric acid and thus cheaper and safer at work.

Svarbus siūlomo būdo bruožas, besiskiriantis nuo prototipo, yra galimybė efektyviau ėsdinti liedinimo alyvomis užterštus plastikų paviršius, kadangi aukštoje temperatūroje liedinimo alyvas chemiškai suardo (oksiduoja) ėsdinimo tirpalo komponentai ir alyvos nebetrukdo ėsdinimo procesui.An important feature of the proposed process, which differs from the prototype, is the ability to more effectively etch the surfaces of plastics contaminated with soldering oils, since at high temperatures, lubricating oils are chemically degraded (oxidised) by etching solution components and no longer interfere with the etching process.

PavyzdžiaiExamples

Plastikus ABS (akrilo-nitril-butadien-stirolo kopolimeras) ir PC/ABS (55 % akrilo-nitril-butadien-stirolo kopolimero ir 45 % polikarbonato mišinys) ėsdina 5 min 120 g/l KCIO3 ir 10 g/l papildomo oksidatoriaus KJO4 turinčioje 30-70 tūrio % sieros rūgštyje 20 °C, 40 °C ir 65 °C temperatūroje arba ėsdina tokios pat kompozicijos tirpale tomis pat sąlygomis, tačiau į tirpalą papildomai įvedus 0,1-10 g/l tirpaus vanadžio junginio. Po ėsdinimo plastikus pamerkia 2 min. j kambario temperatūros neutralizavimo tirpalą, turintį 10 g/l NaOH ir toliau aktyvuoja tikrajame (5 min esant 20 °C temperatūrai) paladžio junginių tirpale. Tikrajame tirpale PdCI2 koncentracija yra 0,1 g/l, tirpalo pH 2,7. Po aktyvacijos tikrajame Pd tirpale plastikus išlaiko 5 min, esant 60 °C temperatūrai bei turinčiame 20 g/l natrio hipofosfito, pH 9. Po to plastikus dengia cheminiu nikeliu pagal kompanijos D0W Chemicals technologiją NipositPM. Dengimosi kokybę vertina pagal dangos sukibimo su plastiku stiprumą (adheziją). Adhezijai įvertinti Ni dangos sluoksnis storinamas galvaninėje variavimo vonioje ir matuojama jėga, reikalinga atplėšti 1 cm pločio dangos juostelei nuo plastiko (kg/cm). Plastikų paruošimo metalizacijai sąlygos ir metalizacijos (cheminio nikeliavimo) rezultatai pateikti Lentelėje.Corrosion of plastic ABS (acrylic-nitrile-butadiene-styrene copolymer) and PC / ABS (55% acrylic-nitrile-butadiene-styrene copolymer and 45% polycarbonate) corrodes for 5 min in 120 g / l KCIO3 and 10 g / l KJO4 containing oxidant 30-70% by volume in sulfuric acid at 20 ° C, 40 ° C and 65 ° C or corrosive solution of the same formulation under the same conditions but with addition of 0.1 to 10 g / l soluble vanadium compound. Soak the plastics for 2 minutes after etching. to room temperature neutralization solution containing 10 g / l NaOH and further activated in real (5 min at 20 ° C) solution of palladium compounds. The stock solution has a concentration of 0.1 g / l PdCl 2 and a pH of 2.7. After activation in true Pd solution, the plastics are retained for 5 min at 60 ° C and 20 g / l sodium hypophosphite, pH 9. The plastics are then coated with chemical nickel according to Dipw Chemicals NipositPM. The coating quality is evaluated by the adhesion strength of the coating to the plastic. To assess adhesion, the Ni coating layer is thickened in a galvanic immersion bath and the force required to tear a 1 cm wide coating strip from the plastic (kg / cm) is measured. Preparation conditions of plastics for metallization and results of metallization (chemical nickel plating) are shown in the Table.

Iš pateiktų 1 ir 2 pavyzdžių matosi, kad ėsdinimo tirpalas, neturintis savo sudėtyje vanadžio junginių, ABS plastiko ėsdinimui gali būti naudojamas tik kambario temperatūroje. Esant aukštesnei ėsdinimo tirpalo temperatūrai, pavyzdžiui 40 oC, gaunamų ant ABS Ni dangų adhezija yra artima nuliui. Tuo atveju, jeigu ėsdinimo tirpale yra vanadžio junginio (3 ir 4 pavyzdžiai) Ni dangos adhezija su ABS ėsdinant aukštesnės temperatūros tirpale yra ne mažesnė negu nesant tirpale vanadžio junginio ir ėsdinant kambario temperatūroje. Iš pateiktų 5, 6 ir 7 pavyzdžių matosi, kad tie patys dėsningumai esant arba nesant ėsdinimo tirpale vanadžio junginio, pasireiškia ir ėsdinant PC/ABS plastiką. Iš 8, 9, 10 ir 11 pavyzdžių duomenų matosi, kad sieros rūgšties koncentracija ėsdinimo tirpale gali būti sumažinta iki 30 tūrio %, jeigu ėsdinama 65 °C temperatūroje. Tačiau sieros rūgšties koncentraciją mažinti labiau negu iki 30 tūrio % neverta, nes Ni dangos adhezija ant plastikų, net ir esant 30 tūrio %, pastebimai mažesnė. 12 ir 13 pavyzdžiai liudija, kad vanadžio junginio koncentraciją ėsdinimo tirpale mažinti labiau negu 0,1 g/l arba didinti labiau negu 8 g/l netikslinga, nes gaunamos pastebimai mažesnės Ni dangos adhezijos reikšmės.Examples 1 and 2 show that etching solution containing no vanadium compounds can only be used for etching ABS at room temperature. At higher temperatures of the etching solution, for example 40 oC, the adhesion of ABS Ni coatings is close to zero. In the case of etching solution containing vanadium compound (Examples 3 and 4), the Ni coating adhesion to ABS by etching in higher temperature solution is not less than in the absence of vanadium solution in solution and at room temperature etching. Examples 5, 6 and 7 show that the same patterns in the presence or absence of etching solution in vanadium compound also occur in the etching of PC / ABS plastic. The data of Examples 8, 9, 10 and 11 show that the sulfuric acid concentration in the etching solution can be reduced to 30% by volume when etched at 65 ° C. However, reducing sulfuric acid concentration to less than 30% by volume is not worthwhile, since the adhesion of Ni coating to plastics, even at 30% by volume, is noticeably lower. Examples 12 and 13 show that reducing the concentration of vanadium compound in etching solution by more than 0.1 g / l or increasing it by more than 8 g / l is not appropriate because of significantly lower Ni coating adhesion values.

Visų 13 pavyzdžių atveju plastiko pavyzdžiai Ni danga pasidengė pilnai, o Ni danga ant plastizolinių įrangos dalių nesiformavo.For all 13 examples, the plastic samples were fully coated with Ni and the Ni coating did not form on the plastisol parts of the equipment.

LentelėTable

Pvz. Nr. For example, No. Plastikas Plastics H2SO4 koncentra cija ėsdinimo tirpale, tūrio %Concentration of H 2 SO 4 in etching solution,% vol KCIO3 koncentra cija ėsdinimo tirpale, tūrio %Concentration of KCIO 3 in etching solution,% vol Ėsdinimo temperai ura,°C Etching temperatures, ° C Vanadžio junginys ir jo koncentracija ėsdinimo tirpale, g/l Vanadium compound and its concentration in etching solution, g / l Gautos adhezijos reikšmės, kg/cm Inbox adhesions meanings, kg / cm 1 1 ABS ABS 66 66 2 2 20 20th - - 1,0-1,3 1.0-1.3

2 2 ABS ABS 66 66 2 2 40 40 - - 0-0,1 0-0.1 3 3 ABS ABS 66 66 2 2 40 40 V2O5, 0,5V 2 O 5 , 0.5 1,1-1,3 1.1-1.3 4 4 ABS ABS 66 66 2 2 65 65 V2O5, 0,5V 2 O 5 , 0.5 1,3-1,4 1.3-1.4 5 5 PC/ABS PC / ABS 66 66 2 2 20 20th - - 0,7-0,9 0.7-0.9 6 6th PC/ABS PC / ABS 66 66 2 2 65 65 - - 0-0,1 0-0.1 7 7th PC/ABS PC / ABS 66 66 2 2 65 65 V2O5, 0,5V 2 O 5 , 0.5 0,9-1,1 0.9-1.1 8 8th ABS ABS 40 40 10 10th 65 65 NaVO3, 1,0NaVO 3 , 1.0 1,0-1,2 1.0-1.2 9 9th PC/ABS PC / ABS 40 40 10 10th 65 65 NaVO3, 1,0NaVO 3 , 1.0 0,7-0,9 0.7-0.9 10 10th ABS ABS 30 30th 10 10th 65 65 NaVO3, 1,0NaVO 3 , 1.0 0,5-0,7 0.5-0.7 11 11th PC/ABS PC / ABS 30 30th 10 10th 65 65 NaVO3, 1,0NaVO 3 , 1.0 0,3-0,5 0.3-0.5 12 12th ABS ABS 66 66 2 2 65 65 V2O5, 0,1V 2 O 5 , 0.1 1,0-1,3 1.0-1.3 13 13th ABS ABS 66 66 2 2 65 65 V2O5, 8,0V 2 O 5 , 8.0 0,8-1,0 0.8-1.0

Claims (1)

IŠRADIMO APIBRĖŽTISDEFINITION OF INVENTION Plastikų paviršiaus paruošimo prieš jų cheminį metalizavimą būdas, apimantis paviršiaus ėsdinimą chlorato jonų ir papildomo oksidatoriaus turinčiame sieros rūgšties tirpale ir po jo sekantį apdorojimą šarminio metalo hidroksidų turinčiame tirpale, aktyvavimą paladžio druskos tirpale bei apdorojimą redukuojančiame arba akceleruojančiame tirpale, besiskiriantis tuo, kad į ėsdinimo tirpalą papildomai įveda 0,1-8 g/l vanadžio junginio, o ėsdinimą atlieka 2065 °C temperatūroje.A method of preparing a surface of plastics prior to chemical metallization comprising etching the surface in a solution of sulfuric acid containing a chlorate ion and auxiliary oxidant, followed by treatment in a solution containing an alkali metal hydroxide, activation in a palladium salt solution and treatment in a reducing or accelerating solution. adds 0.1-8 g / l of vanadium compound and etching at 2065 ° C.
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