KR980005353U - 웨이퍼 냉각시스템의 냉각 가스 누출 방지 장치 - Google Patents

웨이퍼 냉각시스템의 냉각 가스 누출 방지 장치

Info

Publication number
KR980005353U
KR980005353U KR2019960015742U KR19960015742U KR980005353U KR 980005353 U KR980005353 U KR 980005353U KR 2019960015742 U KR2019960015742 U KR 2019960015742U KR 19960015742 U KR19960015742 U KR 19960015742U KR 980005353 U KR980005353 U KR 980005353U
Authority
KR
South Korea
Prior art keywords
prevention device
gas leak
leak prevention
wafer
cooling system
Prior art date
Application number
KR2019960015742U
Other languages
English (en)
Other versions
KR200143052Y1 (ko
Inventor
임태형
정연해
박진호
이승형
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR2019960015742U priority Critical patent/KR200143052Y1/ko
Publication of KR980005353U publication Critical patent/KR980005353U/ko
Application granted granted Critical
Publication of KR200143052Y1 publication Critical patent/KR200143052Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
KR2019960015742U 1996-06-13 1996-06-13 웨이퍼 냉각시스템의 냉각 가스 누출 방지 장치 KR200143052Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019960015742U KR200143052Y1 (ko) 1996-06-13 1996-06-13 웨이퍼 냉각시스템의 냉각 가스 누출 방지 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019960015742U KR200143052Y1 (ko) 1996-06-13 1996-06-13 웨이퍼 냉각시스템의 냉각 가스 누출 방지 장치

Publications (2)

Publication Number Publication Date
KR980005353U true KR980005353U (ko) 1998-03-30
KR200143052Y1 KR200143052Y1 (ko) 1999-06-01

Family

ID=19458468

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019960015742U KR200143052Y1 (ko) 1996-06-13 1996-06-13 웨이퍼 냉각시스템의 냉각 가스 누출 방지 장치

Country Status (1)

Country Link
KR (1) KR200143052Y1 (ko)

Also Published As

Publication number Publication date
KR200143052Y1 (ko) 1999-06-01

Similar Documents

Publication Publication Date Title
BR9703541A (pt) Dispositivo de refrigeração
DE69637769D1 (de) Halbleitervorrichtung
DE69738008D1 (de) Halbleiterbauelement
DE69739242D1 (de) Halbleitervorrichtung
DE69727373D1 (de) Halbleitervorrichtung
DE69637698D1 (de) Halbleitervorrichtung
BR9701588A (pt) Aparelho de resfriamento
DE69637809D1 (de) Halbleiteranordnung
DE69728850T2 (de) Halbleiteranordnung
KR980005353U (ko) 웨이퍼 냉각시스템의 냉각 가스 누출 방지 장치
NO301670B1 (no) Anordning ved kjöleanlegg
DE69725295D1 (de) Gasentladungsvorrichtung
KR980004017U (ko) 가스배관 연결장치
KR970059820U (ko) 반도체 제조용 확산설비의 배기장치
KR940018071U (ko) 발전기 냉각용 수소가스누출방지장치
KR970056045U (ko) 반도체용 가스의 벨브장치
ITBO960108A0 (it) Apparecchio per rilevare le fughe di gas
DE69713658D1 (de) Halbleiterbauelement
KR980005305U (ko) 반도체 설비의 가스압력 확인장치
KR960023783U (ko) 가스배관 폐색방지용 실(seal)장치
KR970050339U (ko) 반도체 장치의 가스 공급 시스템
KR980005322U (ko) 반도체 설비의 배기가스량 확인장치
KR940021334U (ko) 웨이퍼 냉각 장치
KR970055649U (ko) 가스 미터기의 가스누설 방지 장치
KR970014919U (ko) 가스누설 경보장치

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20080102

Year of fee payment: 10

LAPS Lapse due to unpaid annual fee