KR980005351U - Heating tube for semiconductor cleaning equipment. - Google Patents

Heating tube for semiconductor cleaning equipment.

Info

Publication number
KR980005351U
KR980005351U KR2019960015357U KR19960015357U KR980005351U KR 980005351 U KR980005351 U KR 980005351U KR 2019960015357 U KR2019960015357 U KR 2019960015357U KR 19960015357 U KR19960015357 U KR 19960015357U KR 980005351 U KR980005351 U KR 980005351U
Authority
KR
South Korea
Prior art keywords
heating tube
cleaning equipment
semiconductor cleaning
semiconductor
equipment
Prior art date
Application number
KR2019960015357U
Other languages
Korean (ko)
Other versions
KR200142850Y1 (en
Inventor
곽명수
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019960015357U priority Critical patent/KR200142850Y1/en
Publication of KR980005351U publication Critical patent/KR980005351U/en
Application granted granted Critical
Publication of KR200142850Y1 publication Critical patent/KR200142850Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019960015357U 1996-06-11 1996-06-11 A tube for raising temperature of semiconductor cleaning apparatus KR200142850Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019960015357U KR200142850Y1 (en) 1996-06-11 1996-06-11 A tube for raising temperature of semiconductor cleaning apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019960015357U KR200142850Y1 (en) 1996-06-11 1996-06-11 A tube for raising temperature of semiconductor cleaning apparatus

Publications (2)

Publication Number Publication Date
KR980005351U true KR980005351U (en) 1998-03-30
KR200142850Y1 KR200142850Y1 (en) 1999-06-01

Family

ID=19458236

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019960015357U KR200142850Y1 (en) 1996-06-11 1996-06-11 A tube for raising temperature of semiconductor cleaning apparatus

Country Status (1)

Country Link
KR (1) KR200142850Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100626345B1 (en) * 1999-01-14 2006-09-20 삼성전자주식회사 Cleaning liquid thermal treatment apparatus and cleaning apparatus for using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100626345B1 (en) * 1999-01-14 2006-09-20 삼성전자주식회사 Cleaning liquid thermal treatment apparatus and cleaning apparatus for using the same

Also Published As

Publication number Publication date
KR200142850Y1 (en) 1999-06-01

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