KR980003666A - Manufacturing method of thin film type optical path control device - Google Patents

Manufacturing method of thin film type optical path control device Download PDF

Info

Publication number
KR980003666A
KR980003666A KR1019960026155A KR19960026155A KR980003666A KR 980003666 A KR980003666 A KR 980003666A KR 1019960026155 A KR1019960026155 A KR 1019960026155A KR 19960026155 A KR19960026155 A KR 19960026155A KR 980003666 A KR980003666 A KR 980003666A
Authority
KR
South Korea
Prior art keywords
layer
forming
adhesive layer
oxide
thin film
Prior art date
Application number
KR1019960026155A
Other languages
Korean (ko)
Other versions
KR100212538B1 (en
Inventor
김화년
Original Assignee
배순훈
대우전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 배순훈, 대우전자 주식회사 filed Critical 배순훈
Priority to KR1019960026155A priority Critical patent/KR100212538B1/en
Priority to US08/879,370 priority patent/US5991064A/en
Priority to GB9713423A priority patent/GB2314938B/en
Priority to CN97111910A priority patent/CN1177110A/en
Priority to JP9172240A priority patent/JPH1082960A/en
Publication of KR980003666A publication Critical patent/KR980003666A/en
Application granted granted Critical
Publication of KR100212538B1 publication Critical patent/KR100212538B1/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0858Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)

Abstract

본 발명은 상부 전극을 이루는 상부 전극층과 상부 접착층 사이에 국부적으로 형성되는 산화 돌기에 의해서 불균일하게 형성되는 상부 전극의 모폴러지를 향상시키기 위한 박막형 광로 조절 장치의 제조 방법에 관한 것으로서, 상기 상부 접착층을 티타늄(Ti)이나 탄탈륨(Ta)으로 형성하는 대신에, 산화 티타늄(Ti-Oxide) 또는 산화 탄탈륨(Ta-Oxide)와 같은 산화층을 형성하여, 상부 메탈층의 표면이나 상부 메탈층과 상부 접착층의 계면에 국부적으로 발생되는 산화 돌기의 형성을 방지하므로써, 미러면으로 작용하는 상부 전극의 표면을 평탄하게 형성하여 박광효율을 높은 박막형 광로 조절 장치를 제조 할 수 있다.The present invention relates to a method of fabricating a thin film type optical path adjusting device for improving the morphology of an upper electrode formed by unevenly formed oxidized protrusions formed locally between an upper electrode layer and an upper adhesive layer forming an upper electrode, An oxide layer such as titanium oxide (Ti-Oxide) or tantalum oxide (Ta-Oxide) may be formed instead of titanium (Ti) or tantalum (Ta) to form the upper metal layer, the upper metal layer, By preventing the formation of oxidized protrusions locally generated at the interface, the surface of the upper electrode acting as a mirror surface can be formed flat to manufacture a thin film type optical path adjusting device with high luminous efficiency.

Description

박막형 광로 조절 장치의 제조 방법Manufacturing method of thin film type optical path control device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

제4a도 내지 제4i도는 본 발명에 따른 박막형 광로 조절 장치의 제조 방법을 순차적으로 도시한 단면도.4a to 4i are sectional views sequentially showing a manufacturing method of a thin film type optical path adjusting apparatus according to the present invention.

Claims (5)

매트릭스 형태로 형성된 능동 소자, 패시베이션층 및 식각 스톱층을 구비한 구동 기판과 상기 구동 기판상에 복수개의 층이 캔틸레버 구조로 형성된 액츄에이터를 구비한 투사형 화상 표시 장치에 사용되는 박막형 광로 조절 장치의 제조 방법에 있어서, 상기 구동 기판의 상부에 소정 두께의 절연물질을 적층하여 회생층을형성하는 공정과, 상기 회생층을 소정 형상으로 패터닝하여 그 일부를 부분적으로 제거하는 공정과, 상기 회생층의 부분적 제거에 의해 노출된 구동 기판 및 회생층의 상부에 소정 두께의 절연 물질을 적층하여 멤브레인을 형성하는 공정과, 상기 멤브레인에 비아홀을 형성하여 컨택트 메탈을 노출시키는 공정과, 상기 비아홀에 도전성 물질로 이루어진 플러그 메탈을 형성시키는 공정과, 상기 플러그 메탈 및 멤브레인의 상부에 소정 두께의 하부 접착층을 형성하는 공정과, 상기 하부 접착층의 상부에 소정 두께의 하부 메탈충을 형성하는 공정과, 상기 하부 메탈충의 상부에 소정 두께의 변형부를 형성하는 공정과, 상기 변형부의 상부에 상부 접착층을 형성하는 공정과, 상기 상부 접착층의 상부에 상부 메탈층을 형성하는 공정과, 상기 상부 메탈충, 상부 접착층, 변형부, 하부 메탈층, 하부 접착층, 멤브레인을 순차적으로 식각하여 픽셀 단위의 액츄에이터를 이루는 공정과, 상기 액츄에이터의 전면에 식각 보호층을 도포하는 공정과, 상기 희생층을 제거하여 상기 액츄에이터를 캔틸레버 구조로 형성시키는 공정과, 상기 식각 보호층을 제거하는 공정으로 이루어진 박막형 광로 조절 장치의 제조 방법.A manufacturing method of a thin film type optical path adjusting device used in a projection type image display apparatus including a driving substrate having an active element formed in the form of a matrix, a passivation layer and an etching stop layer, and an actuator having a plurality of layers formed on the driving substrate in a cantilever structure A step of forming a regenerative layer by laminating an insulating material having a predetermined thickness on the driving substrate; patterning the regenerative layer in a predetermined shape to partially remove the regenerative layer; and partially removing the regenerative layer A step of forming a via hole in the membrane to expose a contact metal, and a step of forming a via hole in the via hole by a plug made of a conductive material, Forming a metal on the plug metal and the membrane; Forming a lower metal layer having a predetermined thickness on the lower adhesive layer; forming a deformation portion having a predetermined thickness on the lower metal layer; Forming an upper adhesive layer on the upper adhesive layer, forming an upper metal layer on the upper adhesive layer, etching the upper metal layer, the upper adhesive layer, the deformed portion, the lower metal layer, the lower adhesive layer, A step of forming an actuator, a step of applying an etching protection layer to the front surface of the actuator, a step of forming the actuator in a cantilever structure by removing the sacrificial layer, and a step of removing the etching protection layer, ≪ / RTI > 제1항에 있어서, 상기 상부 접착층은, 산화 티타늄(Ti-Oxide)으로 이루어지는 것을 특징으로 하는 박막형 광로 조절 장치의 제조 방법.The method according to claim 1, wherein the upper adhesive layer is made of titanium oxide (Ti-Oxide). 제1항에 있어서, 상기 상부 접착층은, 산화 탄탈륨(Ta-Oxide)으로 이루어지는 것을 특징으로 하는 박막형 광로 조절 장치의 제조 방법.The method according to claim 1, wherein the upper adhesive layer is made of tantalum oxide (Ta-Oxide). 제1항 내지 3항의 어느 한 항에 있어서, 상기 상부 접착층은, 화학적 기상 증착법(CVD)으로 형성하는 것을 특징으로 하는 박막형 광로 조절 장치의 제조 방법.The method of manufacturing a thin film type optical path adjusting apparatus according to any one of claims 1 to 3, wherein the upper adhesive layer is formed by chemical vapor deposition (CVD). 제4항에 있어서, 상기 상부 접착층은, 그 두께를 200∼500A으로 형성하는 것을 특징으로 하는 박막형 광로 조절 장치.The thin film type optical path adjustment apparatus according to claim 4, wherein the upper adhesive layer has a thickness of 200 to 500 A. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960026155A 1996-06-29 1996-06-29 A fabrication method of thin film actuated mirror array KR100212538B1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1019960026155A KR100212538B1 (en) 1996-06-29 1996-06-29 A fabrication method of thin film actuated mirror array
US08/879,370 US5991064A (en) 1996-06-29 1997-06-20 Thin film actuated mirror array and a method for the manufacture thereof
GB9713423A GB2314938B (en) 1996-06-29 1997-06-25 Thin film actuated mirror array and a method for the manufacture thereof
CN97111910A CN1177110A (en) 1996-06-29 1997-06-25 Thin film actuated mirror array and method for mfg. it
JP9172240A JPH1082960A (en) 1996-06-29 1997-06-27 Thin-film actuated mirror array and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960026155A KR100212538B1 (en) 1996-06-29 1996-06-29 A fabrication method of thin film actuated mirror array

Publications (2)

Publication Number Publication Date
KR980003666A true KR980003666A (en) 1998-03-30
KR100212538B1 KR100212538B1 (en) 1999-08-02

Family

ID=19464962

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960026155A KR100212538B1 (en) 1996-06-29 1996-06-29 A fabrication method of thin film actuated mirror array

Country Status (1)

Country Link
KR (1) KR100212538B1 (en)

Also Published As

Publication number Publication date
KR100212538B1 (en) 1999-08-02

Similar Documents

Publication Publication Date Title
KR101168353B1 (en) Thin film precursor stack for mems manufacturing
US7098577B2 (en) Piezoelectric switch for tunable electronic components
JP4234219B2 (en) Thin film actuated mirror array and manufacturing method thereof
US7348535B2 (en) Metal line structure of optical scanner and method of fabricating the same
KR980003666A (en) Manufacturing method of thin film type optical path control device
JPH11326950A (en) Production of active matrix substrate
KR920013712A (en) PZT capacitors to be integrated circuit memory elements and manufacturing method thereof
JP2000502496A (en) Electric switching device and display device using the switching device
US5991064A (en) Thin film actuated mirror array and a method for the manufacture thereof
KR100212564B1 (en) A fabrication method and actuator of the optical projection system
JPH06132536A (en) Film transistor
KR100212562B1 (en) A fabrication method for actuator of the optical projection system
KR0150547B1 (en) Optical path control apparatus and fabricating method thereof
KR970077763A (en) Manufacturing method of optical path control device
KR0177226B1 (en) Method for fabricating on optical projection system
KR100200234B1 (en) Method for fabricating an optical projection system
KR100243860B1 (en) Method for manufacturing thin film actuated mirror arrray
KR0160905B1 (en) Method for fabricating an optical porjection system
KR100257238B1 (en) Advanced tma and manufacturing method
KR100257237B1 (en) Improved tma and manufacturing method thereof
KR0177228B1 (en) Method for fabricating an optical projection system
JPH02137826A (en) Active matrix substrate
JPH06120578A (en) Thick film actuator
KR0164186B1 (en) Fabrication method for optical path control apparatus
KR970077708A (en) Manufacturing method of optical path control device

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20040428

Year of fee payment: 6

LAPS Lapse due to unpaid annual fee