KR980002313A - Silicon film deposition method - Google Patents
Silicon film deposition method Download PDFInfo
- Publication number
- KR980002313A KR980002313A KR1019960023918A KR19960023918A KR980002313A KR 980002313 A KR980002313 A KR 980002313A KR 1019960023918 A KR1019960023918 A KR 1019960023918A KR 19960023918 A KR19960023918 A KR 19960023918A KR 980002313 A KR980002313 A KR 980002313A
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- KR
- South Korea
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- silicon film
- glass
- film deposition
- depositing
- deposited
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- Chemical Vapour Deposition (AREA)
Abstract
박민증착장치의 유리류의 사용주기 및 수명을 연장시킬 수 있는 실리콘막의 증착방법에 관하여 개시한다. 본 발명은 박막증착장치의 내부 튜브(inner tube), 외부 튜브(outer tube) 밑 보트(boat)의 유리류 상에 실리콘막을 증착하는 실리콘막의 증착방법에 있어서, 상기 실리콘막을 증착하기 전에 상기 유리류 상에 질화막을 형성하여 상기 유리류의 열적 스트레스를 방지하는 것을 특징으로 하는 실리콘막의 증착방법을 제공한다. 본 발명은 박막증착장치에 이용되는 유리류 상에 질화막을 먼저 증착한 다음 실리콘막을 증착함으로써, 유리류의 열적 스트레스로 인한 사용주기 및 수명 감소를 방지할 수 있다.Disclosed is a method of depositing a silicon film capable of extending the service life and lifespan of glass in a thin film deposition apparatus. The present invention provides a method for depositing a silicon film on glass of a boat under an inner tube and an outer tube of a thin film deposition apparatus, wherein the glass is deposited before depositing the silicon film. It provides a silicon film deposition method to form a nitride film on the surface to prevent the thermal stress of the glass. According to the present invention, the nitride film is first deposited on the glass used in the thin film deposition apparatus and then the silicon film is deposited, thereby reducing the life cycle and lifespan caused by the thermal stress of the glass.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960023918A KR980002313A (en) | 1996-06-26 | 1996-06-26 | Silicon film deposition method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960023918A KR980002313A (en) | 1996-06-26 | 1996-06-26 | Silicon film deposition method |
Publications (1)
Publication Number | Publication Date |
---|---|
KR980002313A true KR980002313A (en) | 1998-03-30 |
Family
ID=66288399
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960023918A KR980002313A (en) | 1996-06-26 | 1996-06-26 | Silicon film deposition method |
Country Status (1)
Country | Link |
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KR (1) | KR980002313A (en) |
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1996
- 1996-06-26 KR KR1019960023918A patent/KR980002313A/en not_active Application Discontinuation
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