KR980001971A - Functional multilayer coating product and its manufacturing method - Google Patents

Functional multilayer coating product and its manufacturing method Download PDF

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Publication number
KR980001971A
KR980001971A KR1019960023011A KR19960023011A KR980001971A KR 980001971 A KR980001971 A KR 980001971A KR 1019960023011 A KR1019960023011 A KR 1019960023011A KR 19960023011 A KR19960023011 A KR 19960023011A KR 980001971 A KR980001971 A KR 980001971A
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KR
South Korea
Prior art keywords
tin
chromium
aluminum
metal
multilayer coating
Prior art date
Application number
KR1019960023011A
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Korean (ko)
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KR0158538B1 (en
Inventor
허명수
Original Assignee
한철우
주식회사 고진공산업
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 한철우, 주식회사 고진공산업 filed Critical 한철우
Priority to KR1019960023011A priority Critical patent/KR0158538B1/en
Publication of KR980001971A publication Critical patent/KR980001971A/en
Application granted granted Critical
Publication of KR0158538B1 publication Critical patent/KR0158538B1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)

Abstract

본 발명은 플라즈마 스퍼터링기술을 이용하여 투명한 비금속 내화물질로 된 기판 표면에 태양열 제어, 색도 제어 및 반사율 및 투과율제어를 위하여 금속층과 질화물층을 균일하게 피복시켜 제조되는 다층피복제품 및 그 제조방법에 관한 것이다.The present invention relates to a multilayer coating product manufactured by uniformly coating a metal layer and a nitride layer for solar thermal control, chromaticity control and reflectance and transmittance control on a substrate surface made of a transparent nonmetallic refractory material using plasma sputtering technology and a method of manufacturing the same. will be.

Description

기능성 다층 피복제품 및 그의 제조방법Functional multilayer coating product and its manufacturing method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

Claims (4)

비금속 투명내화물질에 크롬, 불수강, 알루미늄, 인듐-주석 중에서 선택되는 1종 이상의 금속층과 질화크롬 및 질화알루미늄 중에서 선택되는 1종 이상의 질화물층 및/또는 산화크롬, 산화주석, 알루미나 및 산화인듐-주석 중에서 선택되는 1종 이상의 산화물층이 피복되어 이루어진 다층피복제품.At least one metal layer selected from chromium, hydrophobic steel, aluminum, indium-tin and at least one nitride layer selected from chromium nitride and aluminum nitride and / or chromium oxide, tin oxide, alumina and indium oxide-tin in the nonmetal transparent refractory material A multilayer coating product comprising at least one oxide layer selected from among them. 제1항에 있어서, 비금속 투명 내화물질은 유리인 것을 특징으로 하는 다층피복제품.The multilayer coating article of claim 1, wherein the non-metal transparent refractory material is glass. 제1항에 있어서, 비금속 투명 내화물질은 플라스틱인 것을 특징으로 하는 다층피복제품.The multilayer coating article of claim 1, wherein the non-metal transparent refractory material is plastic. 비금속 투명내화물질로 된 기판을 진공챔버내에 위치시키고, 불활성기체 분위기하에서 크롬, 불수강, 알루미늄, 인듐-주석, 구리 및 주석 중에서 선택되는 1종 이상의 금속 음극타겟을 스퍼터링하여 기판상에 금속층을 피복한 다음, 불활성기체 및 질소분위기하에서 크롬 및 알루미늄 중에서 선택되는 1종 이상의 금속 음극타겟을 스퍼티링하여 질화물층을 피복하고/또는 불활성기체 및 산소분위기하에서 크롬, 주석, 알루미늄 및 인듐-주석 중에서 선택되는 1종 이상의 금속 음극타겟을 스퍼터링하여 산화물층을 피복하는 것을 특징으로 하는 다층피복제품을 제조방법.A substrate made of a non-metallic transparent refractory material was placed in a vacuum chamber, and sputtered one or more metal cathode targets selected from chromium, hydrophobic steel, aluminum, indium-tin, copper, and tin under an inert gas atmosphere to coat the metal layer on the substrate. Next, the nitride layer is coated by sputtering at least one metal cathode target selected from chromium and aluminum under inert gas and nitrogen atmosphere and / or selected from chromium, tin, aluminum and indium tin under inert gas and oxygen atmosphere. A method for producing a multilayer coated product, comprising sputtering one or more metal cathode targets to coat an oxide layer. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019960023011A 1996-06-21 1996-06-21 Multilayered coating material KR0158538B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960023011A KR0158538B1 (en) 1996-06-21 1996-06-21 Multilayered coating material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960023011A KR0158538B1 (en) 1996-06-21 1996-06-21 Multilayered coating material

Publications (2)

Publication Number Publication Date
KR980001971A true KR980001971A (en) 1998-03-30
KR0158538B1 KR0158538B1 (en) 1998-11-16

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960023011A KR0158538B1 (en) 1996-06-21 1996-06-21 Multilayered coating material

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KR (1) KR0158538B1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100268103B1 (en) * 1996-10-11 2000-10-16 윤종용 Lines using crnx and the method for manufacturing the same
KR100817107B1 (en) * 2005-11-17 2008-03-26 박옥순 Method for manufacturing color tile using thin film deposition method

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100324435B1 (en) * 1999-09-18 2002-02-16 김덕중 Plasma of use nitriding aluminum formative and apparatus
KR102222570B1 (en) * 2013-11-01 2021-03-08 삼성전자주식회사 Method of manufacturing multilayer thin film and electronic product

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100268103B1 (en) * 1996-10-11 2000-10-16 윤종용 Lines using crnx and the method for manufacturing the same
KR100817107B1 (en) * 2005-11-17 2008-03-26 박옥순 Method for manufacturing color tile using thin film deposition method

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Publication number Publication date
KR0158538B1 (en) 1998-11-16

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