KR970063658A - Substrate Processing Equipment - Google Patents
Substrate Processing Equipment Download PDFInfo
- Publication number
- KR970063658A KR970063658A KR1019970002502A KR19970002502A KR970063658A KR 970063658 A KR970063658 A KR 970063658A KR 1019970002502 A KR1019970002502 A KR 1019970002502A KR 19970002502 A KR19970002502 A KR 19970002502A KR 970063658 A KR970063658 A KR 970063658A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- unit
- processing
- processing apparatus
- cassette
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
본 발명은 기판을 수납하는 카셋의 이동 거리를 작게 할 수 있으며, 카셋의 자동반송장치의 배치를 용이하게 할 수 있는 기판처리장치에 관한 것으로, 본 발명은 기판반송부(18)와 처리부(12)가 평행하게 배치되고, 기판 수입부(10)와 기판배출부(14)가 인접한 위치에 일체적으로 배치된다. 기판수입부(10)에 반입된 카셋으로부터 취출된 기판(20)은 기판수수 수단(22a)을 통해 기판반송부(18)에 받아들여져서 기판반송부(18)의 타단까지 반송되고, 기판반송부(18)의 타단에서 반송방향이 180도 변경된 후에 처리부(12)에 투입된다. 처리부(12)에서 반송되면서 소정의 처리가 이루어진 기판(20)은 기판수수 수단(22b)을 통해 기판배출부(14)에 배출되어 카셋에 수납되며, 기판배출부(14)로부터 다음 공정으로 반송된다.The present invention relates to a substrate processing apparatus capable of reducing the moving distance of a cassette for storing a substrate and facilitating the arrangement of the automatic transfer device of the cassette. The present invention relates to a substrate transfer unit 18 and a processing unit 12. ) Are arranged in parallel, and the substrate importing portion 10 and the substrate ejecting portion 14 are integrally disposed at adjacent positions. The substrate 20 taken out from the cassette carried into the substrate import section 10 is received by the substrate transport section 18 through the substrate transport means 22a and transported to the other end of the substrate transport section 18, and the substrate transport is carried out. After the conveyance direction is changed 180 degrees at the other end of the unit 18, it is fed into the processing unit 12. The substrate 20 which has been subjected to the predetermined processing while being conveyed by the processing unit 12 is discharged to the substrate discharge unit 14 through the substrate receiving unit 22b and stored in the cassette, and is transferred from the substrate discharge unit 14 to the next step. do.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제1도는 본 발명에 관한 기판처리장치의 일실시 형태의 구성도이다.1 is a configuration diagram of an embodiment of a substrate processing apparatus according to the present invention.
Claims (7)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8016882A JPH09213763A (en) | 1996-02-01 | 1996-02-01 | Substrate processing device |
JP96-16882 | 1996-02-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970063658A true KR970063658A (en) | 1997-09-12 |
KR100272652B1 KR100272652B1 (en) | 2000-12-01 |
Family
ID=11928553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019970002502A KR100272652B1 (en) | 1996-02-01 | 1997-01-28 | Apparatus for wafer treatment |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH09213763A (en) |
KR (1) | KR100272652B1 (en) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06120318A (en) * | 1992-10-08 | 1994-04-28 | Fuji Electric Co Ltd | Wafer washer |
JP3151582B2 (en) * | 1993-04-28 | 2001-04-03 | 東京エレクトロン株式会社 | Vacuum processing equipment |
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1996
- 1996-02-01 JP JP8016882A patent/JPH09213763A/en active Pending
-
1997
- 1997-01-28 KR KR1019970002502A patent/KR100272652B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100272652B1 (en) | 2000-12-01 |
JPH09213763A (en) | 1997-08-15 |
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