KR970063390A - Substrate Processing Equipment - Google Patents

Substrate Processing Equipment Download PDF

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Publication number
KR970063390A
KR970063390A KR1019970001055A KR19970001055A KR970063390A KR 970063390 A KR970063390 A KR 970063390A KR 1019970001055 A KR1019970001055 A KR 1019970001055A KR 19970001055 A KR19970001055 A KR 19970001055A KR 970063390 A KR970063390 A KR 970063390A
Authority
KR
South Korea
Prior art keywords
substrate
conveyance
board
roller
upper side
Prior art date
Application number
KR1019970001055A
Other languages
Korean (ko)
Inventor
이와오 다나카
요시히코 마쯔시타
Original Assignee
이시다 아키라
다이닛뽕 스크린 세이조오 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이시다 아키라, 다이닛뽕 스크린 세이조오 가부시키가이샤 filed Critical 이시다 아키라
Publication of KR970063390A publication Critical patent/KR970063390A/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706Mechanical details, e.g. roller, belt
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection

Abstract

구조가 간단하고 동시에, 기판의 폭치수에 관계없이 적량의 처리액을 기판에 공급하여 처리가 가능하도록 한다.The structure is simple and at the same time, an appropriate amount of processing liquid is supplied to the substrate to enable processing regardless of the width dimension of the substrate.

반송방향으로 소정의 간격으로 경사진 회전축을 가지는 반송롤러(50)가 병설된 기판반송장치(5)와, 상기 병설된 반송롤러(50)의 사이에서 기판(B)의 반송방향과 직교하는 방향으로 설치된 지지축(61)으로 회전가능하게 지지됨과 동시에 반송되는 기판(B)의 하위 가장자리를 지지하는 사이드롤러(64)를 구비한 위치유지수단(6)과, 상기 기판(B)의 상위측 위치에서 기판(B)의 반송방향을 따라 배치되고 기판(B)의 표면에 처리액을 공급하는 리퀴드나이프(31b)를 구비하고 있다. 위치유지수단(6)은 기판반송장치(5)에 의해 반송되는 기판(B)의 폭치수에 따라 기판(B)의 상위측위치를 일치시키기 위해, 반송롤러(50)와 평행한 방향으로 이동가능하게 설치되어있다.The direction orthogonal to the conveyance direction of the board | substrate B between the board | substrate conveying apparatus 5 with the conveyance roller 50 which has the rotating shaft inclined at predetermined intervals in the conveyance direction, and the said conveyance roller 50. A position holding means (6) having a side roller (64) supporting a lower edge of the substrate (B) which is rotatably supported by the support shaft (61) installed at the same time and conveyed, and an upper side of the substrate (B). The liquid knife 31b which is arrange | positioned along the conveyance direction of the board | substrate B at a position, and supplies a process liquid to the surface of the board | substrate B is provided. The position holding means 6 moves in a direction parallel to the conveying roller 50 in order to match the position of the upper side of the substrate B according to the width dimension of the substrate B conveyed by the substrate conveying apparatus 5. It is possibly installed.

Description

기판처리장치Substrate Processing Equipment

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도는 본 발명에 관한 기판처리장치의 일실시형태를 나타내는 개략구성도.1 is a schematic configuration diagram showing an embodiment of a substrate processing apparatus according to the present invention.

Claims (2)

반송방향으로 소정의 간격으로 경사진 회전축을 가지는 반송롤러가 병설된 기판반송수단과, 상기 병설된 반송롤러의 사이에서 기판의 반송방향과 직교하는 방향으로 설치된 지지축으로 회전가능하게 지지됨과 동시에 반송되는 기판의 하위가장자리를 지지하는 회전체를 구비한 위치 유지수단과, 상기 기판의 상위측위치에서 기판의 반송방향을 따라 배치되고 기판의 표면에 처리액을 공급하는 처리액공급수단을 구비한 것을 특징으로 하흔 기판처리장치.The substrate conveying means which has the conveyance roller which has the rotating shaft inclined at the predetermined | prescribed interval in the conveyance direction, and is supported rotatably by the support shaft provided in the direction orthogonal to the conveyance direction of the board | substrate between the said conveyance rollers, and conveyance A position holding means having a rotating body for supporting a lower edge of the substrate, and a processing liquid supplying means arranged along the conveying direction of the substrate at an upper side position of the substrate and supplying the processing liquid to the surface of the substrate. Characteristic substrate processing apparatus. 제1항에 있어서, 상기 위치유지수단은 기판반송수단에 의해 반송되는 기판의 폭치수에 따라 기판의 상위측 위치를 일치시키기 위해, 반송롤러와 평행한 방향으로 이동가능하게 설치되어 있는 것을 특징으로 하는 기판 처리장치.2. The position holding means is provided so as to be movable in a direction parallel to the conveying roller so as to match the position of the upper side of the substrate in accordance with the width dimension of the substrate conveyed by the substrate conveying means. Substrate processing apparatus. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019970001055A 1996-02-19 1997-01-15 Substrate Processing Equipment KR970063390A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8031034A JPH09232268A (en) 1996-02-19 1996-02-19 Substrate treatment device
JP96-31034 1996-02-19

Publications (1)

Publication Number Publication Date
KR970063390A true KR970063390A (en) 1997-09-12

Family

ID=12320229

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019970001055A KR970063390A (en) 1996-02-19 1997-01-15 Substrate Processing Equipment

Country Status (2)

Country Link
JP (1) JPH09232268A (en)
KR (1) KR970063390A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100484061B1 (en) * 2001-09-14 2005-04-19 다이닛뽕스크린 세이조오 가부시키가이샤 Substrate processing apparatus

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001284310A (en) * 2000-03-31 2001-10-12 Shibaura Mechatronics Corp Apparatus and method for treating substrate
JP4602567B2 (en) * 2000-12-15 2010-12-22 芝浦メカトロニクス株式会社 Substrate cleaning device
KR100547440B1 (en) * 2003-01-27 2006-01-31 주식회사 디엠에스 Substrate processing apparatus having a substrate transfer shaft
KR100729430B1 (en) * 2005-11-22 2007-06-15 주식회사 디엠에스 Apparatus capable of transporting works in vertical direction
JP6113966B2 (en) * 2012-06-29 2017-04-12 安瀚視特股▲ふん▼有限公司AvanStrate Taiwan Inc. Glass substrate transport method and glass substrate transport apparatus
JP6315547B2 (en) * 2013-12-17 2018-04-25 芝浦メカトロニクス株式会社 Substrate processing equipment
CN103878136B (en) * 2014-04-10 2016-08-17 苏州创峰光电科技有限公司 The roller devices of vertical transport
CN105013739A (en) * 2015-06-24 2015-11-04 江苏华尚汽车玻璃工业有限公司 Washing technology of original automobile glass sheets

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100484061B1 (en) * 2001-09-14 2005-04-19 다이닛뽕스크린 세이조오 가부시키가이샤 Substrate processing apparatus

Also Published As

Publication number Publication date
JPH09232268A (en) 1997-09-05

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A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application