KR970057648A - Test pattern structure for optical path control - Google Patents
Test pattern structure for optical path control Download PDFInfo
- Publication number
- KR970057648A KR970057648A KR1019950052107A KR19950052107A KR970057648A KR 970057648 A KR970057648 A KR 970057648A KR 1019950052107 A KR1019950052107 A KR 1019950052107A KR 19950052107 A KR19950052107 A KR 19950052107A KR 970057648 A KR970057648 A KR 970057648A
- Authority
- KR
- South Korea
- Prior art keywords
- test
- pattern structure
- optical path
- pads
- lower electrode
- Prior art date
Links
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- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Short-Circuits, Discontinuities, Leakage, Or Incorrect Line Connections (AREA)
Abstract
본 발명의 하부 전극을 화소 단위로 형성시키기 위한 이소 컷팅부의 전기적 단선 여부를 확인하기 위한 테스트 패턴 구조에 관한 것으로, 상기 테스트 패턴 구조는 시험 패드에 의하여 전기적으로 연결된 2개의 하부 전극 단자와, 상기 시험 패드의 중앙부를 가로 질러서 상기 2개의 하부 전극 단자를 연결시키는 절연층과, 상기 시험 패드와 복수개의 분기 단자에 의해서 전기적으로 연결된 2개의 보조 패드와, 그리고 상기 시험 패드상에 형성된 복수개의 절단부로 구성되며 이에 의해서 상기 액츄에티티드 미러 어레이에 형성된 이소 컷팅부의 전기적 단락 여부를 용이하게 확인할 수 있다.The test pattern structure for confirming whether the iso-cutting part for the electrical disconnection for forming the lower electrode of the present invention in a pixel unit, the test pattern structure is two lower electrode terminals electrically connected by a test pad, and the test An insulating layer connecting the two lower electrode terminals across the center of the pad, two auxiliary pads electrically connected by the test pad and the plurality of branch terminals, and a plurality of cutout portions formed on the test pad. Accordingly, it is possible to easily check whether an electrical short is formed in the iso cut portion formed in the actuated mirror array.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제3도는 본 발명의 일실시예에 따른 테스트 패턴을 개략적으로 도시한 평면도3 is a plan view schematically showing a test pattern according to an embodiment of the present invention
제4도는 본 발명의 다른 실시예에 따라서 패턴이 형성된 실리콘 기판을 도시한 평면도4 is a plan view showing a silicon substrate on which a pattern is formed according to another embodiment of the present invention.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950052107A KR970057648A (en) | 1995-12-19 | 1995-12-19 | Test pattern structure for optical path control |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950052107A KR970057648A (en) | 1995-12-19 | 1995-12-19 | Test pattern structure for optical path control |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970057648A true KR970057648A (en) | 1997-07-31 |
Family
ID=66645861
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950052107A KR970057648A (en) | 1995-12-19 | 1995-12-19 | Test pattern structure for optical path control |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970057648A (en) |
-
1995
- 1995-12-19 KR KR1019950052107A patent/KR970057648A/en not_active Application Discontinuation
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Withdrawal due to no request for examination |