KR970052710A - Rotary Substrate Dryer - Google Patents

Rotary Substrate Dryer Download PDF

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Publication number
KR970052710A
KR970052710A KR1019960061292A KR19960061292A KR970052710A KR 970052710 A KR970052710 A KR 970052710A KR 1019960061292 A KR1019960061292 A KR 1019960061292A KR 19960061292 A KR19960061292 A KR 19960061292A KR 970052710 A KR970052710 A KR 970052710A
Authority
KR
South Korea
Prior art keywords
substrate
gas
gas supply
supply means
scattering prevention
Prior art date
Application number
KR1019960061292A
Other languages
Korean (ko)
Inventor
다츠미 시모무라
야스마사 시마
Original Assignee
이시다 아키라
다이니폰 스크린세이조우 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이시다 아키라, 다이니폰 스크린세이조우 가부시키가이샤 filed Critical 이시다 아키라
Publication of KR970052710A publication Critical patent/KR970052710A/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/08—Drying solid materials or objects by processes not involving the application of heat by centrifugal treatment

Abstract

본 발명은 기판의 회전중심에 효과적으로 기체를 공급할수 있는 회전식 기판건조장치를 제공하는 것을 목적으로 하며, 회전식 기판건조장치(3)는 모터(26)의 구동에 의해 연직방향을 향하는 회전축(27)을 축심으로서 회전하는 스핀척(13)과, 기판(W)의 표면에 기체를 공급하기 위한 기체공급수단(14)과, 기판(W)으로부터 비산하는 처리액을 받아내는 비산방지용컵(15)를 구비한다. 기체공급수단(14)은 에어실린더(37)의 구동에 의해 비산방지용컵(15)의 외측에 배치된 축(33)을 중심으로 요동가능한 기부(34)와, 비산방지용컵(15)의 상단(40)을 넘어서 기부(34)에 연결되어 질소가스의 공급원에 접속하는 노즐(35)을 가진다. 노즐(35)은 다단으로 굴곡된 형상을 가지고, 그 선단은 스핀척(13)에 지지된 기판(W)의 표면에 수 ㎜정도까지 근접하는 높이로 되어있다.An object of the present invention is to provide a rotary substrate drying apparatus that can effectively supply gas to the center of rotation of the substrate, the rotary substrate drying apparatus 3 is a rotary shaft 27 facing in the vertical direction by the drive of the motor 26 Spin chuck 13 which rotates as a shaft, gas supply means 14 for supplying gas to the surface of the substrate W, and scattering prevention cup 15 for receiving the processing liquid scattered from the substrate W; It is provided. The gas supply means 14 is swingable around the shaft 33 disposed outside the scattering prevention cup 15 by the operation of the air cylinder 37 and the upper end of the scattering prevention cup 15. It has a nozzle 35 beyond 40 which is connected to the base 34 and connected to a source of nitrogen gas. The nozzle 35 has a shape which is bent in multiple stages, and its tip is set to a height close to the surface of the substrate W supported by the spin chuck 13 by several mm.

Description

회전식 기판건조장치Rotary Substrate Dryer

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 본 발명에 관한 회전식 기판건조장치의 측면도.2 is a side view of a rotary substrate drying apparatus according to the present invention.

Claims (2)

기판을 그 표면이 수평이 되는 자세로 지지하는 지지수단을 연직방향의 축심 주위에서 회전시킴으로써 기판을 건조하는 회전식 기판건조장치에 있어서, 상기 기판에 기체를 분출하기 위한 기체공급수단과, 상기 기체공급수단을 그 선단이 상기 기판의 회전중심에 근접하는 기체의 분출위치와 대기위치 사이에서 상기 기판의 표면을 따라 이동시키는 이동수단을 구비한 것을 특징으로 하는 회전식 기판건조장치.A rotary substrate drying apparatus for drying a substrate by rotating support means for supporting the substrate in a posture in which the surface thereof is horizontal, around a vertical axis, comprising: gas supply means for blowing gas to the substrate, and the gas supply And means for moving the means along the surface of the substrate between a jet position and a standby position of the gas whose tip is close to the rotation center of the substrate. 제1항에 있어서, 상기 기판으로부터 비산하는 액적을 받아내는 거의 원통형상의 비산방지용컵이 상기 지지수단의 주위를 둘러싸도록 배설되고, 상기 기체공급수단이 상기 비산방지용컵의 상단부를 넘어 상기 비산방지용컵의 내측과 외측에 걸쳐 배치되어 있고, 상기 이동수단은 상기 기체공급수단을 상기 비산방지용컵의 외측에 배설된 축을 중심으로 회동시킴으로써, 상기 기체공급수단을 그 선단이 상기 기판의 회전중심으로 근접하는 기체의 분출위치와 비산방지용컵에 근접하는 대기위치 사이에서 이동시키는 것을 특징으로 하는 회전식 기판건조장치.2. The shatterproof cup according to claim 1, wherein a substantially cylindrical shatterproof cup for receiving the droplets scattering from the substrate is arranged to surround the support means, and the gas supply means extends over an upper end of the shatterproof cup. And the moving means rotates the gas supply means about an axis disposed outside the scattering prevention cup so that the tip of the gas supply means approaches the center of rotation of the substrate. A rotary substrate drying apparatus, characterized in that it is moved between the gas ejection position and the standby position close to the scattering prevention cup. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019960061292A 1995-12-05 1996-12-03 Rotary Substrate Dryer KR970052710A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP95-344772 1995-12-05
JP7344772A JPH09162159A (en) 1995-12-05 1995-12-05 Rotary substrate dryer

Publications (1)

Publication Number Publication Date
KR970052710A true KR970052710A (en) 1997-07-29

Family

ID=18371866

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960061292A KR970052710A (en) 1995-12-05 1996-12-03 Rotary Substrate Dryer

Country Status (2)

Country Link
JP (1) JPH09162159A (en)
KR (1) KR970052710A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69828592T8 (en) * 1997-09-24 2006-06-08 Interuniversitair Micro-Elektronica Centrum Vzw METHOD FOR REMOVING A LIQUID FROM A SURFACE OF A SUBSTRATE
DE69833847T2 (en) 1997-09-24 2006-12-28 Interuniversitair Micro-Electronica Centrum Vzw Method for removing particles and liquid from the surface of a substrate
US6491764B2 (en) 1997-09-24 2002-12-10 Interuniversitair Microelektronics Centrum (Imec) Method and apparatus for removing a liquid from a surface of a rotating substrate
EP0905746A1 (en) * 1997-09-24 1999-03-31 Interuniversitair Micro-Elektronica Centrum Vzw Method of removing a liquid from a surface of a rotating substrate
DE69832567T2 (en) * 1997-09-24 2007-01-18 Interuniversitair Micro-Electronica Centrum Vzw Method and apparatus for removing liquid from the surface of a rotating substrate
US7527698B2 (en) 1998-09-23 2009-05-05 Interuniversitair Microelektronica Centrum (Imec, Vzw) Method and apparatus for removing a liquid from a surface of a substrate
US7867565B2 (en) 2003-06-30 2011-01-11 Imec Method for coating substrates
CN102652947B (en) * 2011-03-02 2014-05-07 承澔科技股份有限公司 Element cleaner
CN115355680B (en) * 2022-10-19 2023-01-03 四川上特科技有限公司 Automatic wafer spin-drying device

Also Published As

Publication number Publication date
JPH09162159A (en) 1997-06-20

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E601 Decision to refuse application