KR970052686A - Wafer Surface Cleaner - Google Patents
Wafer Surface Cleaner Download PDFInfo
- Publication number
- KR970052686A KR970052686A KR1019950062044A KR19950062044A KR970052686A KR 970052686 A KR970052686 A KR 970052686A KR 1019950062044 A KR1019950062044 A KR 1019950062044A KR 19950062044 A KR19950062044 A KR 19950062044A KR 970052686 A KR970052686 A KR 970052686A
- Authority
- KR
- South Korea
- Prior art keywords
- nitrogen gas
- flow rate
- deionized water
- cleaning
- porous plate
- Prior art date
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
본 발명은 수세공정시 질소개스의 유속차이를 제거하여 웨이퍼를 신속하게 세정할 수 있는 웨이퍼 표면의 세정장치에 관한 것이다.The present invention relates to a wafer surface cleaning apparatus capable of quickly cleaning a wafer by removing a flow rate difference of nitrogen gas during a washing process.
탈이온수 및 질소개스가 유입되어 바닥에 설치된 다공판(2)에 의해 공기방울 및 탈이온수 웨이퍼를 세정하는 세정조(1), 세정조(1)에 탈이온수를 공급하는 탈이온수 공급부(3), 질소 개스의 유속을 증가시켜 배관통로(5)을 통해 세정조(1)의 다공판(2)내에 질소개스의 유속차이를 제거한 유속차이를 제거한 질소개스의 가속장치(4)로 구성된다.Deionized water supply unit (3) for supplying deionized water to the cleaning tank (1) for cleaning air bubbles and deionized water wafers by the porous plate (2) installed at the bottom by the introduction of deionized water and nitrogen gas (3) And a nitrogen gas accelerator (4) in which the flow rate difference of the nitrogen gas is removed by removing the flow rate difference of the nitrogen gas in the porous plate (2) of the cleaning tank (1) by increasing the flow rate of the nitrogen gas.
상기의 배관통로(5)는 배관길이에 관계없이 질소개스의 가속장치(4)로부터 다공판(2)까지 질소개스의 유속을 유지시키기 위한 4조우선의 나사형태를 가진다.The pipe passage 5 has a four-priority screw type for maintaining the flow rate of nitrogen gas from the accelerator 4 of the nitrogen gas to the porous plate 2 regardless of the pipe length.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제1도는 본 발명의 웨이퍼 표면의 세정장치1 is an apparatus for cleaning a wafer surface of the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950062044A KR970052686A (en) | 1995-12-28 | 1995-12-28 | Wafer Surface Cleaner |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950062044A KR970052686A (en) | 1995-12-28 | 1995-12-28 | Wafer Surface Cleaner |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970052686A true KR970052686A (en) | 1997-07-29 |
Family
ID=66620661
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950062044A KR970052686A (en) | 1995-12-28 | 1995-12-28 | Wafer Surface Cleaner |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970052686A (en) |
-
1995
- 1995-12-28 KR KR1019950062044A patent/KR970052686A/en not_active Application Discontinuation
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
N231 | Notification of change of applicant | ||
WITN | Withdrawal due to no request for examination |