KR970052686A - Wafer Surface Cleaner - Google Patents

Wafer Surface Cleaner Download PDF

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Publication number
KR970052686A
KR970052686A KR1019950062044A KR19950062044A KR970052686A KR 970052686 A KR970052686 A KR 970052686A KR 1019950062044 A KR1019950062044 A KR 1019950062044A KR 19950062044 A KR19950062044 A KR 19950062044A KR 970052686 A KR970052686 A KR 970052686A
Authority
KR
South Korea
Prior art keywords
nitrogen gas
flow rate
deionized water
cleaning
porous plate
Prior art date
Application number
KR1019950062044A
Other languages
Korean (ko)
Inventor
조영민
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950062044A priority Critical patent/KR970052686A/en
Publication of KR970052686A publication Critical patent/KR970052686A/en

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  • Cleaning Or Drying Semiconductors (AREA)

Abstract

본 발명은 수세공정시 질소개스의 유속차이를 제거하여 웨이퍼를 신속하게 세정할 수 있는 웨이퍼 표면의 세정장치에 관한 것이다.The present invention relates to a wafer surface cleaning apparatus capable of quickly cleaning a wafer by removing a flow rate difference of nitrogen gas during a washing process.

탈이온수 및 질소개스가 유입되어 바닥에 설치된 다공판(2)에 의해 공기방울 및 탈이온수 웨이퍼를 세정하는 세정조(1), 세정조(1)에 탈이온수를 공급하는 탈이온수 공급부(3), 질소 개스의 유속을 증가시켜 배관통로(5)을 통해 세정조(1)의 다공판(2)내에 질소개스의 유속차이를 제거한 유속차이를 제거한 질소개스의 가속장치(4)로 구성된다.Deionized water supply unit (3) for supplying deionized water to the cleaning tank (1) for cleaning air bubbles and deionized water wafers by the porous plate (2) installed at the bottom by the introduction of deionized water and nitrogen gas (3) And a nitrogen gas accelerator (4) in which the flow rate difference of the nitrogen gas is removed by removing the flow rate difference of the nitrogen gas in the porous plate (2) of the cleaning tank (1) by increasing the flow rate of the nitrogen gas.

상기의 배관통로(5)는 배관길이에 관계없이 질소개스의 가속장치(4)로부터 다공판(2)까지 질소개스의 유속을 유지시키기 위한 4조우선의 나사형태를 가진다.The pipe passage 5 has a four-priority screw type for maintaining the flow rate of nitrogen gas from the accelerator 4 of the nitrogen gas to the porous plate 2 regardless of the pipe length.

Description

웨이퍼 표면의 세정장치Wafer Surface Cleaner

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도는 본 발명의 웨이퍼 표면의 세정장치1 is an apparatus for cleaning a wafer surface of the present invention.

Claims (2)

반도체 웨이퍼를 세정하는 세정장치에 있어서, 탈이온수 및 질소개스가 유입되어 바닥에 설치된 다공관에 의해 공기방울 및 탈이온수 웨이퍼를 세정하는 세정조; 상기의 세정조에 탈이온수를 공급하는 탈이온수 공급부; 및 질소 개스의 유속을 증가시켜 배관통로을 통해 상기의 세정조의 다공판내에 질소 개스의 유속 차이를 제거한 질소 개스의 가속장치를 구비한 것을 특징으로 하는 웨이퍼 표면의 세정 장치.CLAIMS 1. A cleaning apparatus for cleaning a semiconductor wafer, comprising: a cleaning tank for cleaning air bubbles and deionized water wafers by a porous tube installed at a bottom by introducing deionized water and nitrogen gas; Deionized water supply unit for supplying deionized water to the washing tank; And a nitrogen gas accelerator which increases the flow rate of the nitrogen gas and removes the difference in the flow rate of the nitrogen gas in the porous plate of the cleaning tank through the pipe passage. 제1항에 있어서, 상기의 배관통로는 상기의 질소 개스의 가속장치로부터 다공판까지 질소 개스의 유속을 유지시키기 위한 4조우선의 나사형태인 것을 특징으로 하는 웨이퍼 표면의 세정 장치.2. The apparatus for cleaning a wafer surface according to claim 1, wherein said pipe passage is in the form of four-priority screws for maintaining the flow rate of nitrogen gas from said accelerator of nitrogen gas to said porous plate. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950062044A 1995-12-28 1995-12-28 Wafer Surface Cleaner KR970052686A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950062044A KR970052686A (en) 1995-12-28 1995-12-28 Wafer Surface Cleaner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950062044A KR970052686A (en) 1995-12-28 1995-12-28 Wafer Surface Cleaner

Publications (1)

Publication Number Publication Date
KR970052686A true KR970052686A (en) 1997-07-29

Family

ID=66620661

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950062044A KR970052686A (en) 1995-12-28 1995-12-28 Wafer Surface Cleaner

Country Status (1)

Country Link
KR (1) KR970052686A (en)

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