KR970051923A - - Google Patents
Info
- Publication number
- KR970051923A KR970051923A KR19950066127A KR19950066127A KR970051923A KR 970051923 A KR970051923 A KR 970051923A KR 19950066127 A KR19950066127 A KR 19950066127A KR 19950066127 A KR19950066127 A KR 19950066127A KR 970051923 A KR970051923 A KR 970051923A
- Authority
- KR
- South Korea
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR19950066127A KR970051923A (en) | 1995-12-29 | 1995-12-29 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR19950066127A KR970051923A (en) | 1995-12-29 | 1995-12-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970051923A true KR970051923A (en) | 1997-07-29 |
Family
ID=85705048
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR19950066127A KR970051923A (en) | 1995-12-29 | 1995-12-29 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970051923A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100452898B1 (en) * | 2001-02-16 | 2004-10-15 | 가부시끼가이샤 도시바 | Pattern forming method and method for disposing a chemical liquid |
US7552759B2 (en) * | 2005-06-17 | 2009-06-30 | Foxconn Technology Co., Ltd. | Loop-type heat exchange device |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6132441A (en) * | 1984-07-24 | 1986-02-15 | Nec Corp | Formation of dielectric isolating region |
JPS61228628A (en) * | 1985-04-02 | 1986-10-11 | Nec Corp | Method for inversion of pattern |
KR950004370A (en) * | 1993-07-06 | 1995-02-17 | 빈센트 비. 인그라시아 | Method and structure for forming an integrated circuit pattern on a semiconductor substrate |
JPH08306605A (en) * | 1995-04-27 | 1996-11-22 | Nec Corp | Forming method of resist pattern |
JPH09134867A (en) * | 1995-11-10 | 1997-05-20 | Hitachi Ltd | Forming method of film and pattern |
-
1995
- 1995-12-29 KR KR19950066127A patent/KR970051923A/ko not_active Application Discontinuation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6132441A (en) * | 1984-07-24 | 1986-02-15 | Nec Corp | Formation of dielectric isolating region |
JPS61228628A (en) * | 1985-04-02 | 1986-10-11 | Nec Corp | Method for inversion of pattern |
KR950004370A (en) * | 1993-07-06 | 1995-02-17 | 빈센트 비. 인그라시아 | Method and structure for forming an integrated circuit pattern on a semiconductor substrate |
JPH08306605A (en) * | 1995-04-27 | 1996-11-22 | Nec Corp | Forming method of resist pattern |
JPH09134867A (en) * | 1995-11-10 | 1997-05-20 | Hitachi Ltd | Forming method of film and pattern |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100452898B1 (en) * | 2001-02-16 | 2004-10-15 | 가부시끼가이샤 도시바 | Pattern forming method and method for disposing a chemical liquid |
US7552759B2 (en) * | 2005-06-17 | 2009-06-30 | Foxconn Technology Co., Ltd. | Loop-type heat exchange device |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application | ||
J201 | Request for trial against refusal decision | ||
J121 | Written withdrawal of request for trial |