KR970051923A - - Google Patents

Info

Publication number
KR970051923A
KR970051923A KR19950066127A KR19950066127A KR970051923A KR 970051923 A KR970051923 A KR 970051923A KR 19950066127 A KR19950066127 A KR 19950066127A KR 19950066127 A KR19950066127 A KR 19950066127A KR 970051923 A KR970051923 A KR 970051923A
Authority
KR
South Korea
Application number
KR19950066127A
Other languages
Korean (ko)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR19950066127A priority Critical patent/KR970051923A/ko
Publication of KR970051923A publication Critical patent/KR970051923A/ko

Links

KR19950066127A 1995-12-29 1995-12-29 KR970051923A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR19950066127A KR970051923A (en) 1995-12-29 1995-12-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR19950066127A KR970051923A (en) 1995-12-29 1995-12-29

Publications (1)

Publication Number Publication Date
KR970051923A true KR970051923A (en) 1997-07-29

Family

ID=85705048

Family Applications (1)

Application Number Title Priority Date Filing Date
KR19950066127A KR970051923A (en) 1995-12-29 1995-12-29

Country Status (1)

Country Link
KR (1) KR970051923A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100452898B1 (en) * 2001-02-16 2004-10-15 가부시끼가이샤 도시바 Pattern forming method and method for disposing a chemical liquid
US7552759B2 (en) * 2005-06-17 2009-06-30 Foxconn Technology Co., Ltd. Loop-type heat exchange device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6132441A (en) * 1984-07-24 1986-02-15 Nec Corp Formation of dielectric isolating region
JPS61228628A (en) * 1985-04-02 1986-10-11 Nec Corp Method for inversion of pattern
KR950004370A (en) * 1993-07-06 1995-02-17 빈센트 비. 인그라시아 Method and structure for forming an integrated circuit pattern on a semiconductor substrate
JPH08306605A (en) * 1995-04-27 1996-11-22 Nec Corp Forming method of resist pattern
JPH09134867A (en) * 1995-11-10 1997-05-20 Hitachi Ltd Forming method of film and pattern

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6132441A (en) * 1984-07-24 1986-02-15 Nec Corp Formation of dielectric isolating region
JPS61228628A (en) * 1985-04-02 1986-10-11 Nec Corp Method for inversion of pattern
KR950004370A (en) * 1993-07-06 1995-02-17 빈센트 비. 인그라시아 Method and structure for forming an integrated circuit pattern on a semiconductor substrate
JPH08306605A (en) * 1995-04-27 1996-11-22 Nec Corp Forming method of resist pattern
JPH09134867A (en) * 1995-11-10 1997-05-20 Hitachi Ltd Forming method of film and pattern

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100452898B1 (en) * 2001-02-16 2004-10-15 가부시끼가이샤 도시바 Pattern forming method and method for disposing a chemical liquid
US7552759B2 (en) * 2005-06-17 2009-06-30 Foxconn Technology Co., Ltd. Loop-type heat exchange device

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application
J201 Request for trial against refusal decision
J121 Written withdrawal of request for trial