KR970048944A - Semiconductor mask for metal pattern - Google Patents
Semiconductor mask for metal pattern Download PDFInfo
- Publication number
- KR970048944A KR970048944A KR1019950050966A KR19950050966A KR970048944A KR 970048944 A KR970048944 A KR 970048944A KR 1019950050966 A KR1019950050966 A KR 1019950050966A KR 19950050966 A KR19950050966 A KR 19950050966A KR 970048944 A KR970048944 A KR 970048944A
- Authority
- KR
- South Korea
- Prior art keywords
- metal pattern
- pattern
- light
- metal
- semiconductor
- Prior art date
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- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
본 발명은 하부 금속층의 패턴형성시빛의 회절형상에 의한 감광막의 불균일성을 방지하여 양호한 하부 금속층을 형성할 수 있는 금속 패턴 형성용 반도체 포토 마스크에 관한 것이다.The present invention relates to a semiconductor pattern mask for forming a metal pattern which can form a favorable lower metal layer by preventing the non-uniformity of the photosensitive film due to the diffraction pattern of light when forming the lower metal layer.
본 발명의 반도체 포코 마스크는 금속 패턴이 라인과 스페이스 형태로 반복배열된 반도체 포토 마스크에 있어서, 금속패턴중 에지부분에서의 금속패턴을 따라 하부 금속막을 형성하기 위한 노광시 빛의 회절영향을 감소시켜 주기 위한 수단을 구비한다.In the semiconductor photomask of the present invention, a semiconductor photomask in which a metal pattern is repeatedly arranged in a line and a space form reduces the diffraction effect of light upon exposure to form a lower metal film along a metal pattern at an edge portion of the metal pattern. And means for giving.
상기에서, 빛의 회절 영향을 감소시켜 주기 위한 수단은 금속패턴을 따라 형성된 다수 개의 스포트로서, 스텝퍼 장비에서 인식되지 않은 크기를 갖는다.In the above, the means for reducing the diffraction effect of the light is a number of spots formed along the metal pattern, having a size not recognized by the stepper equipment.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제3도는 본 발명의 실시예에 따른 금속 패턴 형성용 반도체 마스크의 평면도.3 is a plan view of a semiconductor mask for forming a metal pattern according to an embodiment of the present invention.
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950050966A KR970048944A (en) | 1995-12-16 | 1995-12-16 | Semiconductor mask for metal pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950050966A KR970048944A (en) | 1995-12-16 | 1995-12-16 | Semiconductor mask for metal pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970048944A true KR970048944A (en) | 1997-07-29 |
Family
ID=66595096
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950050966A KR970048944A (en) | 1995-12-16 | 1995-12-16 | Semiconductor mask for metal pattern |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970048944A (en) |
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1995
- 1995-12-16 KR KR1019950050966A patent/KR970048944A/en not_active IP Right Cessation
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SUBM | Submission of document of abandonment before or after decision of registration |