KR970048944A - Semiconductor mask for metal pattern - Google Patents

Semiconductor mask for metal pattern Download PDF

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Publication number
KR970048944A
KR970048944A KR1019950050966A KR19950050966A KR970048944A KR 970048944 A KR970048944 A KR 970048944A KR 1019950050966 A KR1019950050966 A KR 1019950050966A KR 19950050966 A KR19950050966 A KR 19950050966A KR 970048944 A KR970048944 A KR 970048944A
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KR
South Korea
Prior art keywords
metal pattern
pattern
light
metal
semiconductor
Prior art date
Application number
KR1019950050966A
Other languages
Korean (ko)
Inventor
조찬섭
길명군
이두희
Original Assignee
김주용
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김주용, 현대전자산업 주식회사 filed Critical 김주용
Priority to KR1019950050966A priority Critical patent/KR970048944A/en
Publication of KR970048944A publication Critical patent/KR970048944A/en

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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

본 발명은 하부 금속층의 패턴형성시빛의 회절형상에 의한 감광막의 불균일성을 방지하여 양호한 하부 금속층을 형성할 수 있는 금속 패턴 형성용 반도체 포토 마스크에 관한 것이다.The present invention relates to a semiconductor pattern mask for forming a metal pattern which can form a favorable lower metal layer by preventing the non-uniformity of the photosensitive film due to the diffraction pattern of light when forming the lower metal layer.

본 발명의 반도체 포코 마스크는 금속 패턴이 라인과 스페이스 형태로 반복배열된 반도체 포토 마스크에 있어서, 금속패턴중 에지부분에서의 금속패턴을 따라 하부 금속막을 형성하기 위한 노광시 빛의 회절영향을 감소시켜 주기 위한 수단을 구비한다.In the semiconductor photomask of the present invention, a semiconductor photomask in which a metal pattern is repeatedly arranged in a line and a space form reduces the diffraction effect of light upon exposure to form a lower metal film along a metal pattern at an edge portion of the metal pattern. And means for giving.

상기에서, 빛의 회절 영향을 감소시켜 주기 위한 수단은 금속패턴을 따라 형성된 다수 개의 스포트로서, 스텝퍼 장비에서 인식되지 않은 크기를 갖는다.In the above, the means for reducing the diffraction effect of the light is a number of spots formed along the metal pattern, having a size not recognized by the stepper equipment.

Description

금속 패턴용 반도체 마스크Semiconductor mask for metal pattern

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제3도는 본 발명의 실시예에 따른 금속 패턴 형성용 반도체 마스크의 평면도.3 is a plan view of a semiconductor mask for forming a metal pattern according to an embodiment of the present invention.

Claims (3)

금속 패턴(31)이 라인과 스페이스 형태로 반복배열된 반도체 포토 마스크에 있어서, 금속패턴 중 에지부분에서의 금속패턴(31-1-31-4)을 따라 하부 금속막을 형성하기 위한 노광시 빛의 회절영향을 감소시키셔주기 위한 수단을 구비하는 것을 특징으로 하는 반도체 포토 마스크.In a semiconductor photomask in which the metal patterns 31 are repeatedly arranged in a line and space form, light is exposed during exposure to form a lower metal film along the metal patterns 31-1-31-4 at the edges of the metal patterns. And a means for reducing the diffraction effect. 제1항에 있어서, 빛의 회절 영향을 감소시켜 주기 위한 수단은 금속패턴(31)을 따라 형성된 다수 개의 스포트(33)인 것을 특징으로 하는 반도체 포토 마스크.2. A semiconductor photomask according to claim 1, wherein the means for reducing the diffraction effect of light is a plurality of spots (33) formed along the metal pattern (31). 제2항에 있어서, 각 스포트(33)는 스텝퍼 장비에서 인식되지 않는 크기를 갖는 것을 특징으로 하는 반도체 포토 마스크.3. A semiconductor photomask according to claim 2, wherein each spot (33) has a size that is not recognized by the stepper equipment. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950050966A 1995-12-16 1995-12-16 Semiconductor mask for metal pattern KR970048944A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950050966A KR970048944A (en) 1995-12-16 1995-12-16 Semiconductor mask for metal pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950050966A KR970048944A (en) 1995-12-16 1995-12-16 Semiconductor mask for metal pattern

Publications (1)

Publication Number Publication Date
KR970048944A true KR970048944A (en) 1997-07-29

Family

ID=66595096

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950050966A KR970048944A (en) 1995-12-16 1995-12-16 Semiconductor mask for metal pattern

Country Status (1)

Country Link
KR (1) KR970048944A (en)

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