KR970048673A - Scanning electron microscope - Google Patents

Scanning electron microscope Download PDF

Info

Publication number
KR970048673A
KR970048673A KR1019950059382A KR19950059382A KR970048673A KR 970048673 A KR970048673 A KR 970048673A KR 1019950059382 A KR1019950059382 A KR 1019950059382A KR 19950059382 A KR19950059382 A KR 19950059382A KR 970048673 A KR970048673 A KR 970048673A
Authority
KR
South Korea
Prior art keywords
scanning electron
electron microscope
lens unit
inspecting
manufacturing process
Prior art date
Application number
KR1019950059382A
Other languages
Korean (ko)
Inventor
김응천
황용운
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950059382A priority Critical patent/KR970048673A/en
Publication of KR970048673A publication Critical patent/KR970048673A/en

Links

Abstract

본 발명은 반도체소자의 제조공정중 웨이퍼를 검사하기 위한 검사장비에 관한 것으로 특히 주사형 전자현미경에 대한 것이다. 종래의 주사형 전자현미경은 정밀측정을 위하여 저배율에서 위치를 파악한 후 저배율로 검사하는 단계에서 관찰자가 원하는 위치가 벗어나게 되어 사용법에 미숙한 관찰자의 경우에는 관찰하기 곤란한 문제점이 있었다. 본 발명은 상술한 문제점을 극복하기 위한 것으로, 반도체소자의 제조공정중 광학렌즈부를 이용하여 검사할 위치를 선택한 후 전자빔을 이용하여 웨이퍼를 정밀 검사하는 주사형 전자현미경(SEM)에 있어서, 상기 광학 렌즈부는 줌의 비율을 조절할 수 구조로 적어도 1개 이상 설치하여 저배율에서 고배율로 전환시 조작에 따른 번거럼을 방지하고자 한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to inspection equipment for inspecting wafers during the manufacturing process of semiconductor devices, and more particularly to scanning electron microscopes. Conventional scanning electron microscope has a problem that is difficult to observe in the case of an observer unfamiliar with the use of the position at the low magnification and then inspecting at a low magnification to determine the position for precision measurement. The present invention is to overcome the above-mentioned problems, in the scanning electron microscope (SEM) for precisely inspecting the wafer using an electron beam after selecting the position to be inspected using the optical lens unit during the manufacturing process of the semiconductor device, the optical The lens unit is designed to adjust the ratio of zoom to at least one installed to prevent the hassle of operation when switching from low to high magnification.

Description

주사형 전자현미경Scanning electron microscope

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 본 발명의 광학렌즈부의 확대도.2 is an enlarged view of the optical lens unit of the present invention.

Claims (2)

반도체소자의 제조공정중 광학렌즈부를 이용하여 검사할 위치를 선택한 후 전자빔을 이용하여 웨이퍼를 정밀검사하는 주사형 전자현미경(SEM)에 있어서, 상기 광학 렌즈부는 줌의 비율을 조절할 수 구조로 형성한 것을 특징으로 하는 주사형 전자현미경.In a scanning electron microscope (SEM) which selects a position to be inspected by using an optical lens unit during a manufacturing process of a semiconductor device and precisely inspects a wafer by using an electron beam, the optical lens unit has a structure capable of adjusting a zoom ratio. Scanning electron microscope, characterized in that. 제1항에 있어서, 상기 광학렌즈부는 적어도 1개 이상 설치되는 것을 특징으로 하는 주사형 전자현미경.The scanning electron microscope of claim 1, wherein at least one optical lens unit is provided. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950059382A 1995-12-27 1995-12-27 Scanning electron microscope KR970048673A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950059382A KR970048673A (en) 1995-12-27 1995-12-27 Scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950059382A KR970048673A (en) 1995-12-27 1995-12-27 Scanning electron microscope

Publications (1)

Publication Number Publication Date
KR970048673A true KR970048673A (en) 1997-07-29

Family

ID=66619870

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950059382A KR970048673A (en) 1995-12-27 1995-12-27 Scanning electron microscope

Country Status (1)

Country Link
KR (1) KR970048673A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140117766A (en) * 2013-03-26 2014-10-08 삼성디스플레이 주식회사 Inspection system using scanning electron microscope

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140117766A (en) * 2013-03-26 2014-10-08 삼성디스플레이 주식회사 Inspection system using scanning electron microscope

Similar Documents

Publication Publication Date Title
US7514681B1 (en) Electrical process monitoring using mirror-mode electron microscopy
EP0928950B1 (en) Method for detecting and examining slightly irregular surface states, and its use for fabricating liquid crystal display devices
US9436990B2 (en) Defect observation method and device therefor
US11003942B2 (en) Electron channeling pattern acquisition from small crystalline areas
KR100269244B1 (en) Depth of focus enhancement method and its device using optical component made birefringent matrial lithographt tools
KR20170015249A (en) Pattern inspection apparatus and pattern inspection method
US6903338B2 (en) Method and apparatus for reducing substrate edge effects in electron lenses
CN208366872U (en) A kind of device of detection and identification glass defect
KR970048673A (en) Scanning electron microscope
US6559937B2 (en) Inspection apparatus and method
McDonald Optical microscopy
KR100852177B1 (en) Method for surface inspection on wafer
CN215340690U (en) Optical device
CN215340689U (en) Optical equipment with optical filter
JPH01197951A (en) Scanning type electron microscope
KR20040070733A (en) Scanning electronic microscope changeable optic microscope
JP2010160079A (en) Defect inspection device and method therefor
JPH06147831A (en) Apparatus and method for inspecting substrate
KR100271648B1 (en) Apparatus for checking wafer-chuck of optical exposure system in semiconductor
Pang et al. Semiconductor applications of the scanning optical microscope
Wang et al. Wafer charging quantification using image distortion
van Veenhuizen et al. The Use of a Fresnel Lens on an Actual Failure
JPS61148312A (en) Inspection
CN115825086A (en) Method for improving microscopic defect recognition rate after epitaxy
KR970053219A (en) Semiconductor device for surface property inspection and manufacturing method thereof

Legal Events

Date Code Title Description
WITN Withdrawal due to no request for examination