KR970048673A - Scanning electron microscope - Google Patents
Scanning electron microscope Download PDFInfo
- Publication number
- KR970048673A KR970048673A KR1019950059382A KR19950059382A KR970048673A KR 970048673 A KR970048673 A KR 970048673A KR 1019950059382 A KR1019950059382 A KR 1019950059382A KR 19950059382 A KR19950059382 A KR 19950059382A KR 970048673 A KR970048673 A KR 970048673A
- Authority
- KR
- South Korea
- Prior art keywords
- scanning electron
- electron microscope
- lens unit
- inspecting
- manufacturing process
- Prior art date
Links
Abstract
본 발명은 반도체소자의 제조공정중 웨이퍼를 검사하기 위한 검사장비에 관한 것으로 특히 주사형 전자현미경에 대한 것이다. 종래의 주사형 전자현미경은 정밀측정을 위하여 저배율에서 위치를 파악한 후 저배율로 검사하는 단계에서 관찰자가 원하는 위치가 벗어나게 되어 사용법에 미숙한 관찰자의 경우에는 관찰하기 곤란한 문제점이 있었다. 본 발명은 상술한 문제점을 극복하기 위한 것으로, 반도체소자의 제조공정중 광학렌즈부를 이용하여 검사할 위치를 선택한 후 전자빔을 이용하여 웨이퍼를 정밀 검사하는 주사형 전자현미경(SEM)에 있어서, 상기 광학 렌즈부는 줌의 비율을 조절할 수 구조로 적어도 1개 이상 설치하여 저배율에서 고배율로 전환시 조작에 따른 번거럼을 방지하고자 한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to inspection equipment for inspecting wafers during the manufacturing process of semiconductor devices, and more particularly to scanning electron microscopes. Conventional scanning electron microscope has a problem that is difficult to observe in the case of an observer unfamiliar with the use of the position at the low magnification and then inspecting at a low magnification to determine the position for precision measurement. The present invention is to overcome the above-mentioned problems, in the scanning electron microscope (SEM) for precisely inspecting the wafer using an electron beam after selecting the position to be inspected using the optical lens unit during the manufacturing process of the semiconductor device, the optical The lens unit is designed to adjust the ratio of zoom to at least one installed to prevent the hassle of operation when switching from low to high magnification.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2도는 본 발명의 광학렌즈부의 확대도.2 is an enlarged view of the optical lens unit of the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950059382A KR970048673A (en) | 1995-12-27 | 1995-12-27 | Scanning electron microscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950059382A KR970048673A (en) | 1995-12-27 | 1995-12-27 | Scanning electron microscope |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970048673A true KR970048673A (en) | 1997-07-29 |
Family
ID=66619870
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950059382A KR970048673A (en) | 1995-12-27 | 1995-12-27 | Scanning electron microscope |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970048673A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140117766A (en) * | 2013-03-26 | 2014-10-08 | 삼성디스플레이 주식회사 | Inspection system using scanning electron microscope |
-
1995
- 1995-12-27 KR KR1019950059382A patent/KR970048673A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140117766A (en) * | 2013-03-26 | 2014-10-08 | 삼성디스플레이 주식회사 | Inspection system using scanning electron microscope |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Withdrawal due to no request for examination |