KR970048646A - Reaction Torch of Low Temperature Flame Hydrolysis Deposition System - Google Patents

Reaction Torch of Low Temperature Flame Hydrolysis Deposition System Download PDF

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Publication number
KR970048646A
KR970048646A KR1019950050103A KR19950050103A KR970048646A KR 970048646 A KR970048646 A KR 970048646A KR 1019950050103 A KR1019950050103 A KR 1019950050103A KR 19950050103 A KR19950050103 A KR 19950050103A KR 970048646 A KR970048646 A KR 970048646A
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South Korea
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torch
reaction
quartz tube
flame
teflon
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KR1019950050103A
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Korean (ko)
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KR0170194B1 (en
Inventor
이윤학
심재기
박상호
정명영
최태구
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양승택
한국전자통신연구원
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Publication of KR970048646A publication Critical patent/KR970048646A/en
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C03B19/1423—Reactant deposition burners
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/81—Constructional details of the feed line, e.g. heating, insulation, material, manifolds, filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

본 발명은 광통신에 사용되는 수동부품을 별도의 기판위에 도파로를 형성하여 광신호의 흐름을 구성하고 광회로를 구현하기 위한 저온화염가수분해증착장치의 반응토치에 관한 것으로 종래의 FHD 방법은 첫째 기판과 화염이 직접 접촉하는 공정으로 상온의 기판에 일부분을 접촉하기 때문에 열분포의 불균형이 발생할 수 있고, 둘째, 화염의 온도가 산화물 미립자의 녹는 온도와 유사하여 토치에 구성되어 있는 석영관내부에 유리녹음현상이 발생되어 공기중의 이물질과 접촉하여 미립자 증착층에 치명적인 오염을 유발시키는 문제점이 있었다.The present invention relates to a reaction torch of a low-temperature hydrolysis deposition apparatus for forming a waveguide on a separate substrate for a passive component used for optical communication to configure an optical signal flow and to implement an optical circuit. Due to the direct contact between flames and a part of the substrate at room temperature, an imbalance in heat distribution may occur. Second, the temperature of the flame is similar to the melting temperature of oxide fine particles, and the glass is recorded inside the quartz tube of the torch. The phenomenon occurred and there was a problem in contact with the foreign matter in the air causing a fatal contamination of the particulate deposition layer.

본 발명은 종래의 FHD 방법에서 발생되는 손실문제를 근본적으로 개선하고, 향후 광통신망에서 사용될 도파로형 광수동부품의 질적향상을 위한 것으로 도파로형 광부품을 제조하기 위한 FHD 반응시스템에서 화염을 일으키며 화염의 형성점과 종방향의 균일한 성막을 위하여 앵글회전과 상하좌우 이동이 가능하도록 Step Moter에 의해 구동되며 석영관을 정밀 가공된 테프론 홀더블럭에 구성하여 오염여부나 동축형성의 불일치를 실시간에 보수 및 보정하도록 하고, 반응가스의 정밀한 제어와 더불어 중요한 역할을 하며, 원료의 반응온도를 낮추는 기능을 갖도록 한 No Shield 구조로 구성된 저온 화염가수분해증착장치의 반응토치에 관한 것임.The present invention is to fundamentally improve the loss problem caused by the conventional FHD method, and to improve the quality of the waveguide type optical passive components to be used in the optical communication network in the future, causing flame in the FHD reaction system for manufacturing waveguide type optical parts. It is driven by Step Moter to enable angle rotation and vertical, vertical, and even film formation in the longitudinal direction. The quartz tube is formed on a precision-processed Teflon holder block to repair contamination or coaxial formation in real time. And a reaction torch of a low temperature flame hydrolysis deposition apparatus composed of a No Shield structure which has a function of correcting, precisely controlling the reaction gas, and having a function of lowering the reaction temperature of raw materials.

Description

저온 화염가수분해증착 장치의 반응 토치Reaction Torch of Low Temperature Flame Hydrolysis Deposition System

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 화염가수분해법에 의한 실리카성막 공정의 개략도.1 is a schematic diagram of a silica film forming process by flame hydrolysis.

제4도는 5라인 저온 테프론 토치의 구성 개략도로서,4 is a schematic of the configuration of a 5-line low temperature Teflon torch,

(a)는 단면도이고,(a) is a sectional view,

(b)는 A-A′선 단면도.(b) is sectional drawing A-A '.

제5도는 4라인 저온 테프론 토치의 구성 개략도.5 is a schematic of the construction of a four-line low temperature teflon torch.

(a)는 단면도이고,(a) is a sectional view,

(b)는 A-A′선 단면도.(b) is sectional drawing A-A '.

Claims (10)

도파로형 광부품을 제조하기 위한 FHD반응시스템에서 화염을 일으키며 화염의 형성점과 종방향의 균일한 성막을 위하여 앵글회전과 상하좌우 이동이 가능하도록 Step Moter에 의해 구동되며 석영관을 정밀 가공된 테프론 홀더블럭에 구성하여 오염여부나 동축형성의 불일치를 실시간에 보수 및 보정하도록 하고, 반응가스의 정밀한 제어와 더불어 중요한 역할을 하며, 원료의 반응온도를 낮추는 기능을 갖도록 한 No Shield구조로 구성된 저온 화염가수분해증착장치의 반응토치.Teflon, which is driven by Step Moter to rotate angle, move up, down, left and right for uniform formation of flame formation point and longitudinal direction in FHD reaction system for manufacturing waveguide optical parts Low-temperature flame composed of No Shield structure that is configured in the holder block to repair and correct inconsistency of contaminants or coaxial formation in real time, play an important role with precise control of reaction gas, and lower the reaction temperature of raw materials. Reaction torch of hydrolysis deposition apparatus. 제1항에 있어서, 토치(5)는 석영관의 동심원을 구성하기 위하여 테프론 블럭을 정밀 가공하여 석영관을 고정시켜 구성함을 특징으로 하는 저온 화염가수분해증착장치의 반응토치.The torch (5) of claim 1, wherein the torch (5) is configured to fix the quartz tube by precisely processing the Teflon block to form a concentric circle of the quartz tube. 제1항에 있어서, 토치(5)는 테프론블럭중 3, 4, 5, 7라인등 다양한 형태의 토치 석영관을 용이하게 탈착이 가능하게 별도의 기구를 사용하지 않고 테프론블럭 상, 하단에 직접 나사산을 형성시켜 결합 구성됨을 특징으로 하는 저온 화염가수분해증착장치의 반응토치.According to claim 1, the torch 5 can be easily detachable to various types of torch quartz tube, such as 3, 4, 5, 7 lines of the teflon block directly on the top of the teflon block, without using a separate mechanism Reaction torch of low-temperature hydrolysis deposition apparatus characterized in that the coupling is formed by forming a thread. 제1항 또는 제3항에 있어서, 토치(5)는 테프론블럭중 상부 블럭에 원료인입의 Conductance를 향상시키기 위하여 인입배관 결합부와 테프론 블럭 내부 구조를 단일화 시키도록 함을 특징으로 하는 저온 화염가수분해증착장치의 반응토치.4. The low temperature flame singer according to claim 1, wherein the torch 5 unitizes the inlet pipe coupling part and the internal structure of the Teflon block to improve the conductance of the raw material introduction to the upper block of the Teflon block. Reaction Torch of Decomposition Deposition System. 제1항 또는 제3항에 있어서, 토치(5)는 테프론블럭중 석영관의 고정을 돕는 턱을 석영관의 두께인 1mm로 가공하여 석영관을 고정시키도록 함을 특징으로 하는 저온 화염가수분해증착장치의 반응토치.4. The low temperature flame hydrolysis according to claim 1 or 3, wherein the torch 5 fixes the jaw to help fix the quartz tube in the Teflon block to 1 mm, which is the thickness of the quartz tube, to fix the quartz tube. Reaction Torch of Deposition System. 제1항 또는 제3항에 있어서, 토치(5)는 테프론블럭중 석영관의 고정턱이 끝난 지점에 120° 각도로 경질테프론 나사를 구성하여 석영관의 축어긋남을 결합후에도 조절할 수 있도록 함을 특징으로 하는 저온 화염가수분해증착장치의 반응토치.4. The torch 5 according to claim 1 or 3, wherein the torch 5 constitutes a hard Teflon screw at a 120 ° angle at the end of the fixing jaw of the quartz tube in the Teflon block so that the axial displacement of the quartz tube can be adjusted even after the coupling. Reaction torch of low-temperature flame hydrolysis deposition apparatus characterized in that. 제1항 또는 제3항에 있어서, 토치(5)는 테프론블럭중 석영관의 고정가이드의 가공공차를 0.5mm 허용하여 연질테프론으로 실링하고 축조정나사부분에 1mm정도의 조절폭을 두어 석영관의 동심원구성을 얻도록 함을 특징으로 하는 저온 화염가수분해증착장치의 반응토치.The quartz tube according to claim 1 or 3, wherein the torch 5 seals with a soft Teflon, allowing a processing tolerance of the fixing guide of the quartz tube in the Teflon block to 0.5 mm, and has an adjustment width of about 1 mm on the shaft adjusting screw portion. Reaction torch of low-temperature hydrolysis deposition apparatus characterized in that to obtain a concentric configuration of. 제1항에 있어서, 토치(5)의 석영관 구성에서 원료, 헬륨, 수소라인의 석영관을 토치끝부분에서 약 10∼20mm 돌출시켜 수소와의 부분적인 화학반응을 유도하여 원료의 반응성을 높도록 구성함을 특징으로 하는 저온 화염가수분해증착장치의 반응토치.The quartz tube of the torch 5 has a quartz tube of the raw material, helium, and hydrogen line protruding about 10-20 mm from the end of the torch to induce a partial chemical reaction with hydrogen to increase the reactivity of the raw material. Reaction torch of low temperature flame hydrolysis deposition apparatus characterized in that the configuration. 제1항에 있어서, 토치(5)의 석영관 구성에서 헬륨, 산소라인의 화염형성 변형과 오염을 막기 위하여 Dummy 석영관을 60∼100mm 구성하여 화염을 Shielding 시키도록 함을 특징으로 하는 저온 화염가수분해증착장치의 반응토치.The low temperature flame singer according to claim 1, wherein in order to prevent flame formation deformation and contamination of helium and oxygen lines in the quartz tube configuration of the torch 5, a flame flame is constructed by shielding the flame by forming a dummy quartz tube 60 to 100 mm. Reaction Torch of Decomposition Deposition System. 제1항에 있어서, 토치(5)는 공정후에 토치내부의 압력이 낮기 때문에 발생하는 역류를 막기 위하여 연질 테프론으로 가공된 Cap으로 석영관내부와 외부와를 차단시키도록 함을 특징으로 하는 저온 화염가수분해증착장치의 반응토치.The low temperature flame of claim 1, wherein the torch 5 is a cap made of soft Teflon to block the inside and outside of the quartz tube to prevent backflow caused by low pressure inside the torch after the process. Reaction torch of hydrolysis deposition apparatus. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950050103A 1995-12-14 1995-12-14 Torch of low temperature fhd KR0170194B1 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100346220B1 (en) * 2000-09-05 2002-08-01 삼성전자 주식회사 Co-flow diffusion flame burner device for fabricating of optical waveguide
KR100347434B1 (en) * 2000-09-28 2002-08-03 김인하 Reactor and method for auto controling temperature of reactor
KR100347433B1 (en) * 2000-09-28 2002-08-03 김인하 Apparatus for making silica optical wave guide

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100346220B1 (en) * 2000-09-05 2002-08-01 삼성전자 주식회사 Co-flow diffusion flame burner device for fabricating of optical waveguide
KR100347434B1 (en) * 2000-09-28 2002-08-03 김인하 Reactor and method for auto controling temperature of reactor
KR100347433B1 (en) * 2000-09-28 2002-08-03 김인하 Apparatus for making silica optical wave guide

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