KR970046746U - 트랜스퍼 커플드 플라즈마에 칭장비의 가스 분사장치 - Google Patents

트랜스퍼 커플드 플라즈마에 칭장비의 가스 분사장치

Info

Publication number
KR970046746U
KR970046746U KR2019950045676U KR19950045676U KR970046746U KR 970046746 U KR970046746 U KR 970046746U KR 2019950045676 U KR2019950045676 U KR 2019950045676U KR 19950045676 U KR19950045676 U KR 19950045676U KR 970046746 U KR970046746 U KR 970046746U
Authority
KR
South Korea
Prior art keywords
ching
equipment
injection device
gas injection
coupled plasma
Prior art date
Application number
KR2019950045676U
Other languages
English (en)
Other versions
KR200181399Y1 (ko
Inventor
박신승
박선동
Original Assignee
현대전자산업주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대전자산업주식회사 filed Critical 현대전자산업주식회사
Priority to KR2019950045676U priority Critical patent/KR200181399Y1/ko
Publication of KR970046746U publication Critical patent/KR970046746U/ko
Application granted granted Critical
Publication of KR200181399Y1 publication Critical patent/KR200181399Y1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
KR2019950045676U 1995-12-22 1995-12-22 트랜스퍼 커플드 플라즈마에 칭장비의 가스 분사장치 KR200181399Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950045676U KR200181399Y1 (ko) 1995-12-22 1995-12-22 트랜스퍼 커플드 플라즈마에 칭장비의 가스 분사장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950045676U KR200181399Y1 (ko) 1995-12-22 1995-12-22 트랜스퍼 커플드 플라즈마에 칭장비의 가스 분사장치

Publications (2)

Publication Number Publication Date
KR970046746U true KR970046746U (ko) 1997-07-31
KR200181399Y1 KR200181399Y1 (ko) 2000-05-15

Family

ID=19437093

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950045676U KR200181399Y1 (ko) 1995-12-22 1995-12-22 트랜스퍼 커플드 플라즈마에 칭장비의 가스 분사장치

Country Status (1)

Country Link
KR (1) KR200181399Y1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000025271A (ko) * 1998-10-09 2000-05-06 윤종용 반도체 건식 식각설비

Also Published As

Publication number Publication date
KR200181399Y1 (ko) 2000-05-15

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