KR970046719U - Semiconductor manufacturing coating device - Google Patents

Semiconductor manufacturing coating device

Info

Publication number
KR970046719U
KR970046719U KR2019950041933U KR19950041933U KR970046719U KR 970046719 U KR970046719 U KR 970046719U KR 2019950041933 U KR2019950041933 U KR 2019950041933U KR 19950041933 U KR19950041933 U KR 19950041933U KR 970046719 U KR970046719 U KR 970046719U
Authority
KR
South Korea
Prior art keywords
semiconductor manufacturing
coating device
manufacturing coating
semiconductor
manufacturing
Prior art date
Application number
KR2019950041933U
Other languages
Korean (ko)
Other versions
KR200141179Y1 (en
Inventor
정태성
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950041933U priority Critical patent/KR200141179Y1/en
Publication of KR970046719U publication Critical patent/KR970046719U/en
Application granted granted Critical
Publication of KR200141179Y1 publication Critical patent/KR200141179Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02082—Cleaning product to be cleaned
    • H01L21/02087—Cleaning of wafer edges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
KR2019950041933U 1995-12-15 1995-12-15 A coater for semiconductor process KR200141179Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950041933U KR200141179Y1 (en) 1995-12-15 1995-12-15 A coater for semiconductor process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950041933U KR200141179Y1 (en) 1995-12-15 1995-12-15 A coater for semiconductor process

Publications (2)

Publication Number Publication Date
KR970046719U true KR970046719U (en) 1997-07-31
KR200141179Y1 KR200141179Y1 (en) 1999-04-15

Family

ID=19434496

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950041933U KR200141179Y1 (en) 1995-12-15 1995-12-15 A coater for semiconductor process

Country Status (1)

Country Link
KR (1) KR200141179Y1 (en)

Also Published As

Publication number Publication date
KR200141179Y1 (en) 1999-04-15

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