KR970028914A

KR970028914A - Combined binary phase hologram and method of manufacturing the same

Info

Publication number: KR970028914A
Application number: KR1019950039675A
Authority: KR
Inventors: 서호형; 이일항
Original assignee: 양승택; 한국전자통신연구원
Priority date: 1995-11-03
Filing date: 1995-11-03
Publication date: 1997-06-24
Also published as: KR100194595B1

Abstract

본 발명은 결합형 이진 위상 홀로그램과 그 제조방법에 관한 것으로서, 그 특징은 소정 개수의 이진 위상 홀로그램을 결합하여 다중 위상 홀로그램을 형성하는 결합형 이진 위상 홀로그램에 있어서, 제1상대위상이 0이고 제2상대 위상이 각각 소정의 간격을 두고 정해진 소정 갯수의 이진 위상 홀로그램들이 정확하게 밀착 정렬되어 소정 개수의 위상을 갖는 다중 위상 홀로그램의 특성을 갖는 데에 있으므로 그 효과는 다중 위상 홀로그램의 특성을 가지며 불필요한 역대칭상이 제거되고 종래의 이진 위상 홀로그램보다 회절 효율이 약 2배 정도 향상되고 두개의 이진 위상 홀로그램을 제작하기 때문에 제작이 용이하여 제작비를 절감하는 데에 있다.The present invention relates to a coupled binary phase hologram and a method of manufacturing the same, the characteristics of which is a combined binary phase hologram that combines a predetermined number of binary phase holograms to form a multi-phase hologram, wherein the first relative phase is zero and zero Since the two relative phases each have a predetermined number of binary phase holograms that are precisely aligned and have a characteristic of a multi-phase hologram having a predetermined number of phases, the effect is that of a multi-phase hologram and unnecessary It is to reduce the manufacturing cost because the image is removed, the diffraction efficiency is improved by about 2 times compared to the conventional binary phase hologram, and two binary phase holograms are manufactured.

Description

Combined binary phase hologram and method of manufacturing the same

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도는 두개의 2진 위상 홀로그램(a,b)를 결합하여 새로운 다중 위상 홀로그램(c)이 형성되는 원리도.1 is a principle diagram in which a new multi-phase hologram c is formed by combining two binary phase holograms a and b.

제2도는 결합형 이진 위상 홀로그램 설계과정의 흐름도.2 is a flow diagram of a coupled binary phase hologram design process.

Claims

In a combined binary phase hologram that combines a predetermined number of binary phase holograms to form multiple holograms, a predetermined number of binary phase holograms adhere closely to each other at predetermined intervals with a first relative phase of 0 and a second relative phase. Coupled binary phase holograms characterized in that they are multi-phase holograms that are aligned and have a predetermined number of phases.

2. The combined binary phase hologram of claim 1, wherein said predetermined spacing of said second relative phases approximates pi divided by the number of binary phase holograms.

CLAIMS 1. A combined binary phase hologram manufacturing method that combines two binary phase holograms to form multiple holograms, comprising: a first step of designing a primary binary phase hologram having a first relative phase of zero and a second relative phase of approximately? A second process of designing a multi-phase hologram having a first relative phase of 0, a second relative phase of about π / 2, a third relative phase of about π, and a fourth relative phase of about 3π / 2; A third step of deriving an auxiliary binary phase hologram by subtracting the phase of the main binary phase hologram from the phase of the multi phase hologram; A fourth step of manufacturing a primary binary phase hologram designed in the first step; A fifth process of manufacturing an auxiliary binary phase hologram designed in the third process; And a sixth process of manufacturing the combined binary phase hologram having the characteristics of the multi-phase hologram by precisely aligning the primary binary phase hologram produced in the fourth process and the auxiliary binary phase hologram produced in the fifth process. Combined binary phase hologram, characterized in that.

※ Note: The disclosure is based on the initial application.