KR970028841A - Base resin for chemically amplified resist and its manufacturing method - Google Patents
Base resin for chemically amplified resist and its manufacturing method Download PDFInfo
- Publication number
- KR970028841A KR970028841A KR1019950040748A KR19950040748A KR970028841A KR 970028841 A KR970028841 A KR 970028841A KR 1019950040748 A KR1019950040748 A KR 1019950040748A KR 19950040748 A KR19950040748 A KR 19950040748A KR 970028841 A KR970028841 A KR 970028841A
- Authority
- KR
- South Korea
- Prior art keywords
- base resin
- chemically amplified
- amplified resist
- represented
- manufacturing
- Prior art date
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- Materials For Photolithography (AREA)
Abstract
본 발명은 화학 증폭형 레지스트용 베이스 수지 및 그 제조 방법에 관한 것으로서, 아래에 나타나 있는 바와 같이 본 발명의 방법에 케탈기가 측쇄기에 치환되어 있는 공중합체는 에칭 내성이 뛰어날 뿐만 아니라, 193nm에서 투명하다. 따라서, 반도체 칩의 고집적화에 따라 새롭게 이용하는 ArF 엑시머 레이저의 파장(193nm)을 이용하는 리소그래피 공정에서 본 발명의 공중합체를 사용할 수 있다.The present invention relates to a base resin for chemically amplified resists and a method for manufacturing the same. As shown below, a copolymer in which a ketal group is substituted with a side chain group in the method of the present invention is not only excellent in etching resistance but also transparent at 193 nm. Do. Therefore, the copolymer of the present invention can be used in the lithography process using the wavelength (193 nm) of the ArF excimer laser newly used according to the high integration of the semiconductor chip.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950040748A KR970028841A (en) | 1995-11-10 | 1995-11-10 | Base resin for chemically amplified resist and its manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950040748A KR970028841A (en) | 1995-11-10 | 1995-11-10 | Base resin for chemically amplified resist and its manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970028841A true KR970028841A (en) | 1997-06-24 |
Family
ID=66587633
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950040748A KR970028841A (en) | 1995-11-10 | 1995-11-10 | Base resin for chemically amplified resist and its manufacturing method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970028841A (en) |
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1995
- 1995-11-10 KR KR1019950040748A patent/KR970028841A/en not_active Application Discontinuation
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WITN | Withdrawal due to no request for examination |