KR970025780U - Ion source head insulator - Google Patents

Ion source head insulator

Info

Publication number
KR970025780U
KR970025780U KR2019950035344U KR19950035344U KR970025780U KR 970025780 U KR970025780 U KR 970025780U KR 2019950035344 U KR2019950035344 U KR 2019950035344U KR 19950035344 U KR19950035344 U KR 19950035344U KR 970025780 U KR970025780 U KR 970025780U
Authority
KR
South Korea
Prior art keywords
ion source
source head
head insulator
insulator
ion
Prior art date
Application number
KR2019950035344U
Other languages
Korean (ko)
Other versions
KR200202978Y1 (en
Inventor
송호기
주영병
윤수한
손영상
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR2019950035344U priority Critical patent/KR200202978Y1/en
Publication of KR970025780U publication Critical patent/KR970025780U/en
Application granted granted Critical
Publication of KR200202978Y1 publication Critical patent/KR200202978Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
KR2019950035344U 1995-11-23 1995-11-23 Insulator of ion source head KR200202978Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950035344U KR200202978Y1 (en) 1995-11-23 1995-11-23 Insulator of ion source head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950035344U KR200202978Y1 (en) 1995-11-23 1995-11-23 Insulator of ion source head

Publications (2)

Publication Number Publication Date
KR970025780U true KR970025780U (en) 1997-06-20
KR200202978Y1 KR200202978Y1 (en) 2000-12-01

Family

ID=19430139

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950035344U KR200202978Y1 (en) 1995-11-23 1995-11-23 Insulator of ion source head

Country Status (1)

Country Link
KR (1) KR200202978Y1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030094999A (en) * 2002-06-11 2003-12-18 삼성전자주식회사 Aline jig of manipulator for implater

Also Published As

Publication number Publication date
KR200202978Y1 (en) 2000-12-01

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Legal Events

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A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20060830

Year of fee payment: 7

LAPS Lapse due to unpaid annual fee