KR970023843A - Film formation method using chemical vapor deposition method - Google Patents
Film formation method using chemical vapor deposition method Download PDFInfo
- Publication number
- KR970023843A KR970023843A KR1019950035193A KR19950035193A KR970023843A KR 970023843 A KR970023843 A KR 970023843A KR 1019950035193 A KR1019950035193 A KR 1019950035193A KR 19950035193 A KR19950035193 A KR 19950035193A KR 970023843 A KR970023843 A KR 970023843A
- Authority
- KR
- South Korea
- Prior art keywords
- film
- psg
- vapor deposition
- chemical vapor
- cvd
- Prior art date
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- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Formation Of Insulating Films (AREA)
Abstract
본 발명은 화학 기상 증착(CVD) 방법으로 형성한 PSG(phosphorus silica glass) 막의 농도 변화를 계측하지 못하는 점을 개선하기 위해서 CVD 방법으로 형성한 PSG막이 농도 변화를 일으키지 않도록 하는 막을 형성하도록 하여 이 특성에 관한 특성 모니터를 불요로 하도록 한 것으로, 반도체 웨이퍼 상에 상기 CVD에 의한 상기 PSG막을 증착 형성하는 단계와, PSG막의 농도 변화를 억제하기 위해서 구조체에 대해서 어닐링을 행하는 단계를 포함하고 있다.In order to improve the failure of measuring the concentration change of the PSG (phosphorus silica glass) film formed by the chemical vapor deposition (CVD) method, the PSG film formed by the CVD method is formed so that the film does not cause the concentration change. In order to eliminate the need for a characteristic monitor relating to the present invention, the method includes depositing and forming the PSG film by the CVD on a semiconductor wafer, and performing annealing on the structure in order to suppress the concentration change of the PSG film.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2도는 본 발명의 방법이 적용된 제1도의 PSG막질에 대한 농도 경년 변화를 나타낸 그래프이다.Figure 2 is a graph showing the change in concentration over time for the PSG film of Figure 1 to which the method of the present invention is applied.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950035193A KR970023843A (en) | 1995-10-12 | 1995-10-12 | Film formation method using chemical vapor deposition method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950035193A KR970023843A (en) | 1995-10-12 | 1995-10-12 | Film formation method using chemical vapor deposition method |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970023843A true KR970023843A (en) | 1997-05-30 |
Family
ID=66583250
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950035193A KR970023843A (en) | 1995-10-12 | 1995-10-12 | Film formation method using chemical vapor deposition method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970023843A (en) |
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1995
- 1995-10-12 KR KR1019950035193A patent/KR970023843A/en not_active Application Discontinuation
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