KR970023749A - 터릿 구조 - Google Patents
터릿 구조 Download PDFInfo
- Publication number
- KR970023749A KR970023749A KR1019950037765A KR19950037765A KR970023749A KR 970023749 A KR970023749 A KR 970023749A KR 1019950037765 A KR1019950037765 A KR 1019950037765A KR 19950037765 A KR19950037765 A KR 19950037765A KR 970023749 A KR970023749 A KR 970023749A
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- turret
- wing
- wing portion
- turret structure
- Prior art date
Links
- 239000010419 fine particle Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
- H01L21/28518—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table the conductive layers comprising silicides
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Dicing (AREA)
Abstract
신규한 터릿 구조가 개시되어 있다. 그 위에 웨이퍼가 올려지거나 낙하되는 터릿 면과, 상기 터릿 면에 붙어있는 날개 부위를 구비하며, 상기 날개 부위의 상부를 절단하여 날개의 간격을 증가시킨다. 웨이퍼의 이동시 날개와 닿지 않아 스크래치가 유발되지 않음으로써, 미립자를 감소시킬 수 있다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 본 발명에 의한 터릿 구조를 나타내는 개략적인 입체도.
Claims (1)
- 그 위에 웨이퍼가 올려지거나 낙하되는 터릿 면; 및 상기 터릿 면에 붙어있는 날개 부위를 구비하며, 상기 날개 부위의 상부를 절단하여 날개의 간격을 증가시킨 것을 특징으로 하는 터릿 구조.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950037765A KR0165460B1 (ko) | 1995-10-28 | 1995-10-28 | 터릿 구조 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950037765A KR0165460B1 (ko) | 1995-10-28 | 1995-10-28 | 터릿 구조 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970023749A true KR970023749A (ko) | 1997-05-30 |
KR0165460B1 KR0165460B1 (ko) | 1999-02-01 |
Family
ID=19431703
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950037765A KR0165460B1 (ko) | 1995-10-28 | 1995-10-28 | 터릿 구조 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0165460B1 (ko) |
-
1995
- 1995-10-28 KR KR1019950037765A patent/KR0165460B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0165460B1 (ko) | 1999-02-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20060830 Year of fee payment: 9 |
|
LAPS | Lapse due to unpaid annual fee |